Go MIYA

Person

Hachioji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam device
- Patent number 12,106,930
- Issue date Oct 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,735,394
- Issue date Aug 22, 2023
- HITACHI HIGH-TECH CORPORATION
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,872,742
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,128,141
- Issue date Nov 13, 2018
- Hitachi High-Technologies Corporation
- Takumi Tandou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus for measuring surface potential of...
- Patent number 9,799,486
- Issue date Oct 24, 2017
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,704,731
- Issue date Jul 11, 2017
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck mechanism and charged particle beam apparatus
- Patent number 9,401,297
- Issue date Jul 26, 2016
- Hitachi High-Technologies Corporation
- Yasushi Ebizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement or inspecting apparatus
- Patent number 8,921,781
- Issue date Dec 30, 2014
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and evaluation method using the charge...
- Patent number 8,653,455
- Issue date Feb 18, 2014
- Hitachi High-Technologies Corporation
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor inspecting apparatus
- Patent number 8,519,332
- Issue date Aug 27, 2013
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor inspecting apparatus
- Patent number 8,232,522
- Issue date Jul 31, 2012
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,231,759
- Issue date Jul 31, 2012
- Hitachi High-Technologies Corporation
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 8,083,889
- Issue date Dec 27, 2011
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 7,887,669
- Issue date Feb 15, 2011
- Hitachi High-Technologies Corporation
- Kouhei Satou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,744,721
- Issue date Jun 29, 2010
- Hitachi High-Technologies Corporation
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 7,713,756
- Issue date May 11, 2010
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma etching method
- Patent number 7,396,771
- Issue date Jul 8, 2008
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,147,748
- Issue date Dec 12, 2006
- Hitachi High-Technologies Corporation
- Go Miya
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,147,747
- Issue date Dec 12, 2006
- Hitachi High-Technologies Corporation
- Go Miya
- G01 - MEASURING TESTING
Information Patent Grant
Diagnosis method for semiconductor processing apparatus
- Patent number 6,899,766
- Issue date May 31, 2005
- Hitachi High-Technologies Corporation
- Go Miya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing apparatus and a diagnosis method therefor
- Patent number 6,866,744
- Issue date Mar 15, 2005
- Hitachi High-Technologies Corporation
- Go Miya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20240177963
- Publication date May 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Yuki UCHIOKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20230005700
- Publication date Jan 5, 2023
- Hitachi High-Tech Corporation
- Takafumi MIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20220028650
- Publication date Jan 27, 2022
- Hitachi High-Tech Corporation
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20200006032
- Publication date Jan 2, 2020
- Hitachi High-Technologies Corporation
- Takafumi MIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20160013010
- Publication date Jan 14, 2016
- Hitachi High-Technologies Corporation
- Seiichiro KANNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Mechanism and Charged Particle Beam Apparatus
- Publication number 20150262857
- Publication date Sep 17, 2015
- Hitachi High-Technologies Corporation
- Yasushi EBIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150031213
- Publication date Jan 29, 2015
- Hitachi High-Technologies Corporation
- Go MIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140283534
- Publication date Sep 25, 2014
- Hitachi High-Technologies Corporation
- Takumi Tandou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140004706
- Publication date Jan 2, 2014
- Go MIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INSPECTING APPARATUS
- Publication number 20130327939
- Publication date Dec 12, 2013
- Hitachi High-Technologies
- Go MIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20120273136
- Publication date Nov 1, 2012
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INSPECTING APPARATUS
- Publication number 20120261589
- Publication date Oct 18, 2012
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120186745
- Publication date Jul 26, 2012
- Hitachi High-Technologies Corporation
- Go MIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND EVALUATION METHOD USING THE CHARGE...
- Publication number 20120070066
- Publication date Mar 22, 2012
- Hitachi High-Technologies Corporation
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20110120649
- Publication date May 26, 2011
- Kouhei Satou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INSPECTING APPARATUS
- Publication number 20110095185
- Publication date Apr 28, 2011
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100263796
- Publication date Oct 21, 2010
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100078130
- Publication date Apr 1, 2010
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus And Method For Plasma Etching
- Publication number 20090223633
- Publication date Sep 10, 2009
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20090152241
- Publication date Jun 18, 2009
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20090095423
- Publication date Apr 16, 2009
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20080110400
- Publication date May 15, 2008
- Kouhei Satou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20080110569
- Publication date May 15, 2008
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20070209759
- Publication date Sep 13, 2007
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20070184563
- Publication date Aug 9, 2007
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20070056929
- Publication date Mar 15, 2007
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck, wafer processing apparatus and plasma processi...
- Publication number 20060291132
- Publication date Dec 28, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for processing wafer
- Publication number 20060191482
- Publication date Aug 31, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20060169671
- Publication date Aug 3, 2006
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and method
- Publication number 20060043064
- Publication date Mar 2, 2006
- Junichi Tanaka
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Charged particle beam device

Charged particle beam apparatus

Charged particle beam device

Plasma processing apparatus and plasma processing method

Charged particle beam apparatus for measuring surface potential of...

Plasma processing apparatus and plasma processing method

Electrostatic chuck mechanism and charged particle beam apparatus

Measurement or inspecting apparatus

Charged particle beam device and evaluation method using the charge...

Semiconductor inspecting apparatus

Semiconductor inspecting apparatus

Plasma processing apparatus

Apparatus and method for plasma etching

Vacuum processing apparatus

Plasma processing apparatus

Apparatus and method for plasma etching

Plasma etching apparatus and plasma etching method

Plasma processing method

Plasma processing apparatus and plasma processing method

Diagnosis method for semiconductor processing apparatus

Semiconductor processing apparatus and a diagnosis method therefor

Patents Applicationslast 30 patents

Charged Particle Beam Apparatus

Charged Particle Beam Device

CHARGED PARTICLE BEAM APPARATUS

CHARGED PARTICLE BEAM DEVICE

Charged Particle Beam Apparatus

Electrostatic Chuck Mechanism and Charged Particle Beam Apparatus

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SEMICONDUCTOR INSPECTING APPARATUS

Plasma Processing Apparatus

SEMICONDUCTOR INSPECTING APPARATUS

PLASMA PROCESSING APPARATUS

CHARGED PARTICLE BEAM DEVICE AND EVALUATION METHOD USING THE CHARGE...

VACUUM PROCESSING APPARATUS

SEMICONDUCTOR INSPECTING APPARATUS

Plasma Processing Apparatus

Plasma Processing Apparatus

Apparatus And Method For Plasma Etching

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

APPARATUS AND METHOD FOR PLASMA ETCHING

VACUUM PROCESSING APPARATUS

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

Plasma etching apparatus and plasma etching method

APPARATUS AND METHOD FOR PLASMA ETCHING

Plasma etching apparatus and plasma etching method

Electrostatic chuck, wafer processing apparatus and plasma processi...

Apparatus and method for processing wafer

Plasma etching apparatus and plasma etching method

Plasma processing system and method