Go Noya

Person

Kakegawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming composition
- Patent number 11,059,995
- Issue date Jul 13, 2021
- Merck Patent GmbH
- Go Noya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming underlayer and method for forming underlaye...
- Patent number 10,451,971
- Issue date Oct 22, 2019
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Masato Suzuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Void forming composition, semiconductor device provided with voids...
- Patent number 10,435,555
- Issue date Oct 8, 2019
- AZ Electronic Materials (Luxembourg) S.a.r.l.
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming fine resist pattern and pattern formation m...
- Patent number 9,360,756
- Issue date Jun 7, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Kazuma Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming tungsten oxide film and method for producin...
- Patent number 9,152,052
- Issue date Oct 6, 2015
- Merck Patent GmbH
- Go Noya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for formation of top antireflective film, and pattern f...
- Patent number 8,568,955
- Issue date Oct 29, 2013
- Electronic Materials USA Corp.
- Yasushi Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Superfine-patterned mask, method for production thereof, and method...
- Patent number 8,501,394
- Issue date Aug 6, 2013
- AZ Electronic Materials USA Corp.
- Yusuke Takano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for formation of miniaturized pattern and resist substrate t...
- Patent number 8,101,333
- Issue date Jan 24, 2012
- AZ Electronic Materials USA Corp.
- Go Noya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Processing liquid for resist substrate and method of processing res...
- Patent number 7,998,664
- Issue date Aug 16, 2011
- AZ Electronic Materials USA Corp.
- Go Noya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING COMPOSITION AND FILM FORMING METHOD USING THE SAME
- Publication number 20210115253
- Publication date Apr 22, 2021
- Merck Patent GmbH
- Yuki OZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING COMPOSITION
- Publication number 20200377761
- Publication date Dec 3, 2020
- Merck Patent GmbH
- Go NOYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
A POLYMER, COMPOSITION, FORMING SACRIFICIAL LAYER AND METHOD FOR SE...
- Publication number 20190048129
- Publication date Feb 14, 2019
- Shigemasa NAKASUGI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING UNDERLAYER AND METHOD FOR FORMING UNDERLAYE...
- Publication number 20180039178
- Publication date Feb 8, 2018
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Masato SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SACRIFICIAL FILM COMPOSITION, METHOD FOR PREPARING SAME, SEMICONDUC...
- Publication number 20170218227
- Publication date Aug 3, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
VOID FORMING COMPOSITION, SEMICONDUCTOR DEVICE PROVIDED WITH VOIDS...
- Publication number 20170210896
- Publication date Jul 27, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Shigemasa NAKASUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION M...
- Publication number 20150253669
- Publication date Sep 10, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Kazuma Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING TUNGSTEN OXIDE FILM AND METHOD FOR PRODUCIN...
- Publication number 20140356792
- Publication date Dec 4, 2014
- AZ Electronic Materials USA Corp.
- Go Noya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERFINE-PATTERNED MASK, METHOD FOR PRODUCTION THEREOF, AND METHOD...
- Publication number 20100308015
- Publication date Dec 9, 2010
- Yusuke Takano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMATION OF TOP ANTIREFLECTIVE FILM, AND PATTERN F...
- Publication number 20100286318
- Publication date Nov 11, 2010
- Yasushi Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMATION OF TOP ANTI-REFLECTIVE FILM, AND PATTERN...
- Publication number 20100279235
- Publication date Nov 4, 2010
- Go Noya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Processing Liquid for Resist Substrate and Method of Processing Res...
- Publication number 20100233634
- Publication date Sep 16, 2010
- Go Noya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR UPPER SURFACE ANTIREFLECTION FILM, AND METHOD FOR P...
- Publication number 20100062363
- Publication date Mar 11, 2010
- Go Noya
- G02 - OPTICS
Information Patent Application
Solution for treatment of resist substrate after development proces...
- Publication number 20100028817
- Publication date Feb 4, 2010
- Go Noya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for formation of miniaturized pattern and resist substrate t...
- Publication number 20100021700
- Publication date Jan 28, 2010
- Go Noya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming microfined resist pattern
- Publication number 20100003468
- Publication date Jan 7, 2010
- Go Noya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Film forming composition

Composition for forming underlayer and method for forming underlaye...

Void forming composition, semiconductor device provided with voids...

Composition for forming fine resist pattern and pattern formation m...

Composition for forming tungsten oxide film and method for producin...

Composition for formation of top antireflective film, and pattern f...

Superfine-patterned mask, method for production thereof, and method...

Method for formation of miniaturized pattern and resist substrate t...

Processing liquid for resist substrate and method of processing res...

Patents Applicationslast 30 patents

FILM FORMING COMPOSITION AND FILM FORMING METHOD USING THE SAME

FILM FORMING COMPOSITION

A POLYMER, COMPOSITION, FORMING SACRIFICIAL LAYER AND METHOD FOR SE...

COMPOSITION FOR FORMING UNDERLAYER AND METHOD FOR FORMING UNDERLAYE...

SACRIFICIAL FILM COMPOSITION, METHOD FOR PREPARING SAME, SEMICONDUC...

VOID FORMING COMPOSITION, SEMICONDUCTOR DEVICE PROVIDED WITH VOIDS...

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION M...

COMPOSITION FOR FORMING TUNGSTEN OXIDE FILM AND METHOD FOR PRODUCIN...

SUPERFINE-PATTERNED MASK, METHOD FOR PRODUCTION THEREOF, AND METHOD...

COMPOSITION FOR FORMATION OF TOP ANTIREFLECTIVE FILM, AND PATTERN F...

COMPOSITION FOR FORMATION OF TOP ANTI-REFLECTIVE FILM, AND PATTERN...

Processing Liquid for Resist Substrate and Method of Processing Res...

COMPOSITION FOR UPPER SURFACE ANTIREFLECTION FILM, AND METHOD FOR P...

Solution for treatment of resist substrate after development proces...

Method for formation of miniaturized pattern and resist substrate t...

Method of forming microfined resist pattern