Go Saito

Person

Hikari-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 8,580,689
- Issue date Nov 12, 2013
- Hitachi High-Technologies Corporation
- Tomoyoshi Ichimaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of semiconductor processing
- Patent number 8,440,513
- Issue date May 14, 2013
- Hitachi High-Technologies Corporation
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma etching method
- Patent number 7,396,771
- Issue date Jul 8, 2008
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor devices
- Patent number 7,364,956
- Issue date Apr 29, 2008
- Hitachi High-Technologies Corporation
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,224,568
- Issue date May 29, 2007
- Hitachi High-Technologies Corporation
- Hiroaki Ishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 7,098,138
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 6,709,984
- Issue date Mar 23, 2004
- Hitachi High-Technologies Corporation
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 6,620,737
- Issue date Sep 16, 2003
- Hitachi, Ltd.
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 6,617,255
- Issue date Sep 9, 2003
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 5,681,424
- Issue date Oct 28, 1997
- Hitachi, Ltd.
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DRY ETCHING METHOD
- Publication number 20130015158
- Publication date Jan 17, 2013
- Tomoyoshi Ichimaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20120003838
- Publication date Jan 5, 2012
- Hitachi High-Technologies Corporation
- Kazumasa Ookuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20100004795
- Publication date Jan 7, 2010
- Hitachi-Technologies Corporation
- Takehisa IWAKOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SEMICONDUCTOR PROCESSING
- Publication number 20090325388
- Publication date Dec 31, 2009
- Hitachi High-Technologies Corporation
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20070056929
- Publication date Mar 15, 2007
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor devices
- Publication number 20070026611
- Publication date Feb 1, 2007
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20060171093
- Publication date Aug 3, 2006
- Hiroaki Ishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20060048892
- Publication date Mar 9, 2006
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20040175940
- Publication date Sep 9, 2004
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20040048477
- Publication date Mar 11, 2004
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20040033695
- Publication date Feb 19, 2004
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20030022512
- Publication date Jan 30, 2003
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20010055885
- Publication date Dec 27, 2001
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma processing method

Method of semiconductor processing

Plasma etching apparatus and plasma etching method

Method for manufacturing semiconductor devices

Plasma processing method and plasma processing apparatus

Plasma processing method for working the surface of semiconductor d...

Method for manufacturing semiconductor device

Plasma etching method

Plasma processing method for working the surface of semiconductor d...

Plasma processing method

Patents Applicationslast 30 patents

DRY ETCHING METHOD

PLASMA ETCHING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF SEMICONDUCTOR PROCESSING

Plasma etching apparatus and plasma etching method

Method for manufacturing semiconductor devices

Plasma processing method and plasma processing apparatus

Plasma processing method for working the surface of semiconductor d...

Plasma processing method for working the surface of semiconductor d...

Method for manufacturing semiconductor device

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Plasma etching method

Plasma processing method for working the surface of semiconductor d...