Go-Un Kim

Person

Uiwang-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Organic film CMP slurry composition and polishing method using same
- Patent number 10,723,916
- Issue date Jul 28, 2020
- Samsung SDI Co., Ltd.
- Jung Min Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monomer for hardmask composition and hardmask composition including...
- Patent number 10,345,706
- Issue date Jul 9, 2019
- Cheil Industries, Inc.
- Hyun-Ji Song
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
CMP slurry composition for organic film and polishing method using...
- Patent number 10,287,468
- Issue date May 14, 2019
- Samsung SDI Co., Ltd.
- Yong Sik Yoo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Modified hydrogenated polysiloxazane, composition comprising same f...
- Patent number 9,890,255
- Issue date Feb 13, 2018
- Cheil Industries, Inc.
- Hyun-Ji Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning composition after chemical mechanical polishing of organic...
- Patent number 9,845,444
- Issue date Dec 19, 2017
- Samsung Electronics Co., Ltd.
- Ahn-Ho Lee
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Composition for forming silica-based insulating layer, method for p...
- Patent number 9,738,787
- Issue date Aug 22, 2017
- CHEIL INDUSTRY, INC.
- Hui-Chan Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardmask composition, method of forming patterns using the hardmask...
- Patent number 9,665,003
- Issue date May 30, 2017
- Cheil Industries, Inc.
- Yoo-Jeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching method using plasma, and method of fabricating semiconducto...
- Patent number 9,520,301
- Issue date Dec 13, 2016
- Samsung Electronics Co., Ltd.
- Go-jun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rinse liquid for insulating film and method of rinsing insulating film
- Patent number 9,312,122
- Issue date Apr 12, 2016
- Cheil Industries, Inc.
- Jin-Hee Bae
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Process of preparing a gap filler agent, a gap filler agent prepare...
- Patent number 9,240,443
- Issue date Jan 19, 2016
- Cheil Industries, Inc.
- Jin-Hee Bae
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for etching silicon oxide layer, method for etching sem...
- Patent number 8,685,272
- Issue date Apr 1, 2014
- Samsung Electronics Co., Ltd.
- Go-Un Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
Organic Film CMP Slurry Composition and Polishing Method Using Same
- Publication number 20180362807
- Publication date Dec 20, 2018
- Samsung SDI Co., Ltd.
- Jung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP SLURRY COMPOSITION FOR ORGANIC FILM AND POLISHING METHOD USING...
- Publication number 20170204312
- Publication date Jul 20, 2017
- Samsung SDI Co., Ltd.
- Yong Sik YOO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CLEANING COMPOSITION AFTER CHEMICAL MECHANICAL POLISHING OF ORGANIC...
- Publication number 20160137953
- Publication date May 19, 2016
- Samsung Electronics Co., Ltd.
- Ahn-Ho LEE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
ETCHING METHOD USING PLASMA, AND METHOD OF FABRICATING SEMICONDUCTO...
- Publication number 20160111298
- Publication date Apr 21, 2016
- Go-jun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Organic Film CMP Slurry Composition and Polishing Method Using Same
- Publication number 20160068711
- Publication date Mar 10, 2016
- Samsung SDI Co., Ltd.
- Jung Min CHOI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING SILICA-BASED INSULATING LAYER, METHOD FOR P...
- Publication number 20150274980
- Publication date Oct 1, 2015
- CHEIL INDUSTRIES INC.
- Hui-Chan Yun
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHIP ELECTRONIC COMPONENT AND MANUFACTURING METHOD THEREOF
- Publication number 20150255208
- Publication date Sep 10, 2015
- Samsung Electro-Mechanics Co., Ltd.
- Go Eun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFIED HYDROGENATED POLYSILOXAZANE, COMPOSITION COMPRISING SAME F...
- Publication number 20150225508
- Publication date Aug 13, 2015
- CHEIL INDUSTRIES INC.
- Hyun-Ji Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING...
- Publication number 20150001178
- Publication date Jan 1, 2015
- Hyun-Ji SONG
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK...
- Publication number 20150004531
- Publication date Jan 1, 2015
- Yoo-Jeong CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RINSE LIQUID FOR INSULATING FILM AND METHOD OF RINSING INSULATING FILM
- Publication number 20140315367
- Publication date Oct 23, 2014
- Jin-Hee BAE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PROCESS OF PREPARING A GAP FILLER AGENT, A GAP FILLER AGENT PREPARE...
- Publication number 20140187017
- Publication date Jul 3, 2014
- Jin-Hee BAE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CLEANING COMPOSITION FOR SEMICONDUCTOR DEVICE AND METHOD OF CLEANIN...
- Publication number 20120172272
- Publication date Jul 5, 2012
- Yong Yeop PARK
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Composition for etching silicon oxide layer, method for etching sem...
- Publication number 20100035436
- Publication date Feb 11, 2010
- Go-Un Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Organic film CMP slurry composition and polishing method using same

Monomer for hardmask composition and hardmask composition including...

CMP slurry composition for organic film and polishing method using...

Modified hydrogenated polysiloxazane, composition comprising same f...

Cleaning composition after chemical mechanical polishing of organic...

Composition for forming silica-based insulating layer, method for p...

Hardmask composition, method of forming patterns using the hardmask...

Etching method using plasma, and method of fabricating semiconducto...

Rinse liquid for insulating film and method of rinsing insulating film

Process of preparing a gap filler agent, a gap filler agent prepare...

Composition for etching silicon oxide layer, method for etching sem...

Patents Applicationslast 30 patents

Organic Film CMP Slurry Composition and Polishing Method Using Same

CMP SLURRY COMPOSITION FOR ORGANIC FILM AND POLISHING METHOD USING...

CLEANING COMPOSITION AFTER CHEMICAL MECHANICAL POLISHING OF ORGANIC...

ETCHING METHOD USING PLASMA, AND METHOD OF FABRICATING SEMICONDUCTO...

Organic Film CMP Slurry Composition and Polishing Method Using Same

COMPOSITION FOR FORMING SILICA-BASED INSULATING LAYER, METHOD FOR P...

CHIP ELECTRONIC COMPONENT AND MANUFACTURING METHOD THEREOF

MODIFIED HYDROGENATED POLYSILOXAZANE, COMPOSITION COMPRISING SAME F...

MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING...

HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK...

RINSE LIQUID FOR INSULATING FILM AND METHOD OF RINSING INSULATING FILM

PROCESS OF PREPARING A GAP FILLER AGENT, A GAP FILLER AGENT PREPARE...

CLEANING COMPOSITION FOR SEMICONDUCTOR DEVICE AND METHOD OF CLEANIN...

Composition for etching silicon oxide layer, method for etching sem...