Goh Matsuura

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Hartsdale, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Etch rate enhancement for a silicon etch process through etch chamb...
- Patent number 9,711,365
- Issue date Jul 18, 2017
- International Business Machines Corporation
- Eric A. Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio and reduced undercut trench etch process for a se...
- Patent number 8,928,124
- Issue date Jan 6, 2015
- International Business Machines Corporation
- Nicholas C. M. Fuller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio and reduced undercut trench etch process for a se...
- Patent number 8,652,969
- Issue date Feb 18, 2014
- International Business Machines Corporation
- Nicholas C. M. Fuller
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCH RATE ENHANCEMENT FOR A SILICON ETCH PROCESS THROUH ETCH CHAMBE...
- Publication number 20150318182
- Publication date Nov 5, 2015
- Zeon Corporation
- Eric A. Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO AND REDUCED UNDERCUT TRENCH ETCH PROCESS FOR A SE...
- Publication number 20130328173
- Publication date Dec 12, 2013
- Zeon Corporation
- Nicholas C. M. Fuller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO AND REDUCED UNDERCUT TRENCH ETCH PROCESS FOR A SE...
- Publication number 20130105947
- Publication date May 2, 2013
- Zeon Corporation
- Nicholas C. M. Fuller
- H01 - BASIC ELECTRIC ELEMENTS