Goji WAKAMATSU

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,320,739
- Issue date May 3, 2022
- JSR Corporation
- Goji Wakamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,243,468
- Issue date Feb 8, 2022
- JSR Corporation
- Naoya Nosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,126,084
- Issue date Sep 21, 2021
- JSR Corporation
- Naoya Nosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition, resist underlayer film,...
- Patent number 10,520,814
- Issue date Dec 31, 2019
- JSR Corporation
- Masayuki Miyake
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern-forming method, resin, and composition
- Patent number 10,078,265
- Issue date Sep 18, 2018
- JSR Corporation
- Shun Aoki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for film formation, film, production method of patterne...
- Patent number 10,053,539
- Issue date Aug 21, 2018
- JSR Corporation
- Shin-ya Nakafuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-forming method, resin, and composition
- Patent number 10,036,954
- Issue date Jul 31, 2018
- JSR Corporation
- Shun Aoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for film formation, and pattern-forming method
- Patent number 9,958,781
- Issue date May 1, 2018
- JSR Corporation
- Yuushi Matsumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for film formation, film, production method of patterne...
- Patent number 9,620,378
- Issue date Apr 11, 2017
- JSR Corporation
- Shin-ya Nakafuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for film formation, resist underlayer film and forming...
- Patent number 9,581,905
- Issue date Feb 28, 2017
- JSR Corporation
- Shin-ya Nakafuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for film formation, resist underlayer film, and forming...
- Patent number 9,412,593
- Issue date Aug 9, 2016
- JSR Corporation
- Hayato Namai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for forming pattern
- Patent number 8,883,023
- Issue date Nov 11, 2014
- JSR Corporation
- Goji Wakamatsu
- B44 - DECORATIVE ARTS

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20200012193
- Publication date Jan 9, 2020
- JSR Corporation
- Naoya NOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20190243247
- Publication date Aug 8, 2019
- JSR Corporation
- Naoya NOSAKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20180348633
- Publication date Dec 6, 2018
- JSR Corporation
- Goji Wakamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...
- Publication number 20180114698
- Publication date Apr 26, 2018
- JSR Corporation
- Shin-ya NAKAFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...
- Publication number 20180046081
- Publication date Feb 15, 2018
- JSR Corporation
- Masayuki MIYAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...
- Publication number 20170154782
- Publication date Jun 1, 2017
- JSR Corporation
- Shin-ya NAKAFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20170137663
- Publication date May 18, 2017
- JSR Corporation
- Goji WAKAMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20160314984
- Publication date Oct 27, 2016
- JSR Corporation
- Yuushi MATSUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20160257842
- Publication date Sep 8, 2016
- JSR Corporation
- Goji WAKAMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING...
- Publication number 20160085152
- Publication date Mar 24, 2016
- JSR Corporation
- Shin-ya NAKAFUJI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM, AND FORMING...
- Publication number 20150267046
- Publication date Sep 24, 2015
- JSR Corporation
- Hayato NAMAI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20130098870
- Publication date Apr 25, 2013
- JSR Corporation
- Goji WAKAMATSU
- B44 - DECORATIVE ARTS
Information Patent Application
RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...
- Publication number 20110223544
- Publication date Sep 15, 2011
- JSR Corporation
- Yuji YADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Goji WAKAMATSU

Person

Patents Grantslast 30 patents

Composition for resist underlayer film formation, resist underlayer...

Composition for resist underlayer film formation, resist underlayer...

Composition for resist underlayer film formation, resist underlayer...

Resist underlayer film-forming composition, resist underlayer film,...

Pattern-forming method, resin, and composition

Composition for film formation, film, production method of patterne...

Pattern-forming method, resin, and composition

Method for film formation, and pattern-forming method

Composition for film formation, film, production method of patterne...

Composition for film formation, resist underlayer film and forming...

Composition for film formation, resist underlayer film, and forming...

Method for forming pattern

Patents Applicationslast 30 patents

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...

RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...

COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING...

COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM, AND FORMING...

METHOD FOR FORMING PATTERN

RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...