Gonzalo Antonio Monroy

Person

San Francisco, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,651,966
- Issue date May 16, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma deposition of carbon hardmask
- Patent number 11,043,375
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Yang Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,043,387
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for electron beam etching process
- Patent number 10,790,153
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching methods
- Patent number 10,707,086
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition or treatment of diamond-like carbon in a plasma reactor
- Patent number 10,544,505
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- Yang Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diamond like carbon layer formed by an electron beam plasma process
- Patent number 10,249,495
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Yang Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron beam plasma source with reduced metal contamination
- Patent number 9,721,760
- Issue date Aug 1, 2017
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process using a plasma source hav...
- Patent number 7,700,465
- Issue date Apr 20, 2010
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to drive spatially separate resonant structure with spatiall...
- Patent number 7,430,984
- Issue date Oct 7, 2008
- Applied Materials, Inc.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation system including a plasma source...
- Patent number 7,320,734
- Issue date Jan 22, 2008
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process using an inductively coup...
- Patent number 7,303,982
- Issue date Dec 4, 2007
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process using a capacitively coup...
- Patent number 7,291,545
- Issue date Nov 6, 2007
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation apparatus including a plasma sour...
- Patent number 7,137,354
- Issue date Nov 21, 2006
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process using a capacitively coup...
- Patent number 7,037,813
- Issue date May 2, 2006
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING APPARATUS
- Publication number 20230162996
- Publication date May 25, 2023
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210296131
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210287907
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210134599
- Publication date May 6, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR ELECTRON BEAM ETCHING PROCESS
- Publication number 20200006036
- Publication date Jan 2, 2020
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS
- Publication number 20190393053
- Publication date Dec 26, 2019
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS
- Publication number 20190228970
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING APPARATUS AND METHODS
- Publication number 20190221437
- Publication date Jul 18, 2019
- Applied Materials, Inc.
- Yang YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DEPOSITION OF CARBON HARDMASK
- Publication number 20190057862
- Publication date Feb 21, 2019
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OR TREATMENT OF DIAMOND-LIKE CARBON IN A PLASMA REACTOR
- Publication number 20180274089
- Publication date Sep 27, 2018
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING BETWEEN DEPOSITION AND TREATMENT OF DIAMOND-LIKE CARBON
- Publication number 20180274100
- Publication date Sep 27, 2018
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH ELECTRON BEAM OF SECONDARY ELECTRONS
- Publication number 20180277340
- Publication date Sep 27, 2018
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS
- Publication number 20170372899
- Publication date Dec 28, 2017
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRON BEAM PLASMA SOURCE WITH REDUCED METAL CONTAMINATION
- Publication number 20140338835
- Publication date Nov 20, 2014
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation apparatus including a capacitivel...
- Publication number 20070119546
- Publication date May 31, 2007
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation process using a capacitively coup...
- Publication number 20060073683
- Publication date Apr 6, 2006
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation system including an inductively c...
- Publication number 20050051271
- Publication date Mar 10, 2005
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation process using an inductively coup...
- Publication number 20050051272
- Publication date Mar 10, 2005
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation system including a capacitively c...
- Publication number 20040149217
- Publication date Aug 5, 2004
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation process using a capacitively coup...
- Publication number 20040149218
- Publication date Aug 5, 2004
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation apparatus including a capacitivel...
- Publication number 20040112542
- Publication date Jun 17, 2004
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation apparatus including a plasma sour...
- Publication number 20040107906
- Publication date Jun 10, 2004
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation system including a plasma source...
- Publication number 20040107907
- Publication date Jun 10, 2004
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation apparatus including an inductivel...
- Publication number 20040107908
- Publication date Jun 10, 2004
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation process using a plasma source hav...
- Publication number 20040107909
- Publication date Jun 10, 2004
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low loss RF bias electrode for a plasma reactor with enhanced wafer...
- Publication number 20040027781
- Publication date Feb 12, 2004
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to drive spatially separate resonant structure with spatiall...
- Publication number 20030047449
- Publication date Mar 13, 2003
- APPLIED MATERIALS, INC.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS

Gonzalo Antonio Monroy

Person

Patents Grantslast 30 patents

Methods and apparatus for processing a substrate

Plasma deposition of carbon hardmask

Methods and apparatus for processing a substrate

Methods and apparatus for electron beam etching process

Etching methods

Deposition or treatment of diamond-like carbon in a plasma reactor

Diamond like carbon layer formed by an electron beam plasma process

Electron beam plasma source with reduced metal contamination

Plasma immersion ion implantation process using a plasma source hav...

Method to drive spatially separate resonant structure with spatiall...

Plasma immersion ion implantation system including a plasma source...

Plasma immersion ion implantation process using an inductively coup...

Plasma immersion ion implantation process using a capacitively coup...

Plasma immersion ion implantation apparatus including a plasma sour...

Plasma immersion ion implantation process using a capacitively coup...

Patents Applicationslast 30 patents

ETCHING APPARATUS

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR ELECTRON BEAM ETCHING PROCESS

ETCHING APPARATUS

DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS

ETCHING APPARATUS AND METHODS

PLASMA DEPOSITION OF CARBON HARDMASK

DEPOSITION OR TREATMENT OF DIAMOND-LIKE CARBON IN A PLASMA REACTOR

ALTERNATING BETWEEN DEPOSITION AND TREATMENT OF DIAMOND-LIKE CARBON

PLASMA REACTOR WITH ELECTRON BEAM OF SECONDARY ELECTRONS

DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS

ELECTRON BEAM PLASMA SOURCE WITH REDUCED METAL CONTAMINATION

Plasma immersion ion implantation apparatus including a capacitivel...

Plasma immersion ion implantation process using a capacitively coup...

Plasma immersion ion implantation system including an inductively c...

Plasma immersion ion implantation process using an inductively coup...

Plasma immersion ion implantation system including a capacitively c...

Plasma immersion ion implantation process using a capacitively coup...

Plasma immersion ion implantation apparatus including a capacitivel...

Plasma immersion ion implantation apparatus including a plasma sour...

Plasma immersion ion implantation system including a plasma source...

Plasma immersion ion implantation apparatus including an inductivel...

Plasma immersion ion implantation process using a plasma source hav...

Low loss RF bias electrode for a plasma reactor with enhanced wafer...

Method to drive spatially separate resonant structure with spatiall...