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Gouji Wakamatsu
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last 30 patents
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Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
Patent number
11,681,222
Issue date
Jun 20, 2023
JSR Corporation
Hiroki Nakagawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
Patent number
11,036,133
Issue date
Jun 15, 2021
JSR Corporation
Hiroki Nakagawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for film formation, film, resist underlayer film-formin...
Patent number
11,003,079
Issue date
May 11, 2021
JSR Corporation
Naoya Nosaka
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
Patent number
10,620,534
Issue date
Apr 14, 2020
JSR Corporation
Hiroki Nakagawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Composition, method for producing patterned substrate, film and for...
Patent number
10,146,131
Issue date
Dec 4, 2018
JSR Corporation
Shin-ya Nakafuji
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
Patent number
10,082,733
Issue date
Sep 25, 2018
JSR Corporation
Hiroki Nakagawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for forming a resist underlayer film, and pattern-formi...
Patent number
9,696,626
Issue date
Jul 4, 2017
JSR Corporation
Fumihiro Toyokawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
Patent number
9,500,950
Issue date
Nov 22, 2016
JSR Corporation
Hiroki Nakagawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for forming a resist underlayer film, and pattern-formi...
Patent number
9,400,429
Issue date
Jul 26, 2016
JSR Corporation
Fumihiro Toyokawa
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
Patent number
9,213,236
Issue date
Dec 15, 2015
JSR Corporation
Hiroki Nakagawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resin composition for making resist pattern insoluble, and method f...
Patent number
9,029,067
Issue date
May 12, 2015
JSR Corporation
Gouji Wakamatsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resin composition for making resist pattern insoluble, and method f...
Patent number
8,877,429
Issue date
Nov 4, 2014
JSR Corporation
Gouji Wakamatsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for forming pattern
Patent number
8,808,974
Issue date
Aug 19, 2014
JSR Corporation
Yukio Nishimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for forming upper layer film for immersion exposure, up...
Patent number
8,697,344
Issue date
Apr 15, 2014
JSR Corporation
Daita Kouno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
Patent number
8,697,343
Issue date
Apr 15, 2014
JSR Corporation
Hiroki Nakagawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive-type radiation-sensitive composition, and resist pattern f...
Patent number
8,501,385
Issue date
Aug 6, 2013
JSR Corporation
Yusuke Anno
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Composition for forming upper layer film for immersion exposure, up...
Patent number
8,431,332
Issue date
Apr 30, 2013
JSR Corporation
Daita Kouno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist pattern-forming method and resist pattern miniaturizing resi...
Patent number
8,206,894
Issue date
Jun 26, 2012
Takayoshi Abe
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
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Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20220137508
Publication date
May 5, 2022
JSR Corporation
Hiroki NAKAGAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20210278764
Publication date
Sep 9, 2021
JSR Corporation
Hiroki NAKAGAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20200124961
Publication date
Apr 23, 2020
JSR Corporation
Hiroki NAKAGAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20190278175
Publication date
Sep 12, 2019
JSR Corporation
Hiroki NAKAGAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMIN...
Publication number
20190094695
Publication date
Mar 28, 2019
JSR Corporation
Naoya NOSAKA
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20190025695
Publication date
Jan 24, 2019
JSR Corporation
Hiroki NAKAGAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20170199453
Publication date
Jul 13, 2017
JSR Corporation
Hiroki NAKAGAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM, AND PATTERN-FORMI...
Publication number
20160259247
Publication date
Sep 8, 2016
JSR Corporation
Fumihiro TOYOKAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20160062237
Publication date
Mar 3, 2016
JSR Corporation
Hiroki NAKAGAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION, METHOD FOR PRODUCING PATTERNED SUBSTRATE, FILM AND FOR...
Publication number
20160011512
Publication date
Jan 14, 2016
JSR Corporation
Shin-ya NAKAFUJI
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM, AND PATTERN-FORMI...
Publication number
20150185613
Publication date
Jul 2, 2015
JSR Corporation
Fumihiro TOYOKAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...
Publication number
20150004547
Publication date
Jan 1, 2015
JSR Corporation
Gouji WAKAMATSU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20140162190
Publication date
Jun 12, 2014
JSR Corporation
Hiroki NAKAGAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
Publication number
20130216961
Publication date
Aug 22, 2013
JSR Corporation
Daita Kouno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR FORMING PATTERN
Publication number
20130164695
Publication date
Jun 27, 2013
JSR Corporation
Yukio NISHIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...
Publication number
20110111349
Publication date
May 12, 2011
JSR Corporation
Gouji WAKAMATSU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN F...
Publication number
20110104612
Publication date
May 5, 2011
JSR Corporation
Yusuke ANNO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST PATTERN-FORMING METHOD AND RESIST PATTERN MINIATURIZING RESI...
Publication number
20100310988
Publication date
Dec 9, 2010
JSR Corporation
Takayoshi ABE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
Publication number
20100255416
Publication date
Oct 7, 2010
JSR Corporation
Daita Kouno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RES...
Publication number
20100068650
Publication date
Mar 18, 2010
Yukio Nishimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20090202945
Publication date
Aug 13, 2009
Hiroki Nakagawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...