Gousuke SHIRAISHI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Optical processing apparatus, coating/development apparatus, optica...
- Patent number 10,527,948
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Seiji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming method, coating and developing apparatus and...
- Patent number 10,459,339
- Issue date Oct 29, 2019
- Tokyo Electron Limited
- Tetsuo Fukuoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method and storage medium
- Patent number 10,274,843
- Issue date Apr 30, 2019
- Tokyo Electron Limited
- Seiji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus, resist pattern forming method, and storage medium
- Patent number 10,101,669
- Issue date Oct 16, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment system
- Patent number 10,025,190
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light irradiation apparatus
- Patent number 9,899,243
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Masahide Tadokoro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing apparatus
- Patent number 8,614,140
- Issue date Dec 24, 2013
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist applying and developing method, resist film processing unit,...
- Patent number 8,343,714
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Gousuke Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method and semiconductor device...
- Patent number 8,101,507
- Issue date Jan 24, 2012
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING METHOD AND PROCESSING SYSTEM
- Publication number 20240404852
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMASHITA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SU...
- Publication number 20240312804
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Hayato TANOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240082957
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Hayato TANOUE
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240071765
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Hayato TANOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL PROCESSING APPARATUS, COATING/DEVELOPMENT APPARATUS, OPTICA...
- Publication number 20180173103
- Publication date Jun 21, 2018
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD AND STORAGE MEDIUM
- Publication number 20180143540
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT SYSTEM
- Publication number 20170031245
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, RESIST PATTERN FORMING METHOD, AND STORAGE MEDIUM
- Publication number 20160327869
- Publication date Nov 10, 2016
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT IRRADIATION APPARATUS
- Publication number 20160170316
- Publication date Jun 16, 2016
- TOKYO ELECTRON LIMITED
- Masahide Tadokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST PATTERN FORMING METHOD, COATING AND DEVELOPING APPARATUS AND...
- Publication number 20160085154
- Publication date Mar 24, 2016
- TOKYO ELECTRON LIMITED
- Tetsuo FUKUOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS
- Publication number 20120132365
- Publication date May 31, 2012
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST APPLYING AND DEVELOPING METHOD, RESIST FILM PROCESSING UNIT,...
- Publication number 20100266969
- Publication date Oct 21, 2010
- TOKYO ELECTRON LIMITED
- Gousuke SHIRAISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE...
- Publication number 20100099256
- Publication date Apr 22, 2010
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS

Gousuke SHIRAISHI

Person

Patents Grantslast 30 patents

Optical processing apparatus, coating/development apparatus, optica...

Resist pattern forming method, coating and developing apparatus and...

Exposure apparatus, exposure method and storage medium

Exposure apparatus, resist pattern forming method, and storage medium

Substrate treatment system

Light irradiation apparatus

Semiconductor device manufacturing apparatus

Resist applying and developing method, resist film processing unit,...

Semiconductor device manufacturing method and semiconductor device...

Patents Applicationslast 30 patents

PROCESSING METHOD AND PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SU...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

OPTICAL PROCESSING APPARATUS, COATING/DEVELOPMENT APPARATUS, OPTICA...

EXPOSURE APPARATUS, EXPOSURE METHOD AND STORAGE MEDIUM

SUBSTRATE TREATMENT SYSTEM

EXPOSURE APPARATUS, RESIST PATTERN FORMING METHOD, AND STORAGE MEDIUM

LIGHT IRRADIATION APPARATUS

RESIST PATTERN FORMING METHOD, COATING AND DEVELOPING APPARATUS AND...

SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS

RESIST APPLYING AND DEVELOPING METHOD, RESIST FILM PROCESSING UNIT,...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE...