Gowri Kota

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Line end shortening reduction during etch
- Patent number 8,668,805
- Issue date Mar 11, 2014
- Lam Research Corporation
- Gowri Kota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for critical dimension control during plasma etching
- Patent number 7,622,051
- Issue date Nov 24, 2009
- Lam Research Corporation
- David M. Schaefer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line end shortening reduction during etch
- Patent number 7,491,343
- Issue date Feb 17, 2009
- Lam Research Corporation
- Yoko Yamaguchi Adams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line end shortening reduction during etch
- Patent number 7,407,597
- Issue date Aug 5, 2008
- Lam Research Corporation
- Gowri Kota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process controls for improved wafer uniformity using integrated or...
- Patent number 7,018,855
- Issue date Mar 28, 2006
- Lam Research Corporation
- Gowri P. Kota
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LINE END SHORTENING REDUCTION DURING ETCH
- Publication number 20080268211
- Publication date Oct 30, 2008
- LAM RESEARCH CORPORATION
- Gowri Kota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE END SHORTENING REDUCTION DURING ETCH
- Publication number 20080087639
- Publication date Apr 17, 2008
- Lam Research Corporation
- Yoko Yamaguchi Adams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line end shortening reduction during etch
- Publication number 20080087637
- Publication date Apr 17, 2008
- LAM RESEARCH CORPORATION
- Gowri Kota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective etch of films with high dielectric constant
- Publication number 20050153563
- Publication date Jul 14, 2005
- Lam Research Corporation
- Shyam Ramalingam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process controls for improved wafer uniformity using integrated or...
- Publication number 20050148104
- Publication date Jul 7, 2005
- Gowri P. Kota
- H01 - BASIC ELECTRIC ELEMENTS