Grady S. Waldo

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated circuitry comprising a memory array comprising strings o...
- Patent number 12,200,929
- Issue date Jan 14, 2025
- Micron Technology, Inc.
- Collin Howder
Information Patent Grant
Low temperature process for polysilazane oxidation/densification
- Patent number 8,575,040
- Issue date Nov 5, 2013
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming trench isolation
- Patent number 7,811,897
- Issue date Oct 12, 2010
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of substantially uniformly etching non-homogeneous substrates
- Patent number 7,699,998
- Issue date Apr 20, 2010
- Micron Technology, Inc.
- Janos Fucsko
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Etch compositions and methods of processing a substrate
- Patent number 7,629,266
- Issue date Dec 8, 2009
- Micron Technology, Inc.
- Janos Fucsko
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Low temperature process for polysilazane oxidation/densification
- Patent number 7,557,420
- Issue date Jul 7, 2009
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature process for polysilazane oxidation/densification
- Patent number 7,521,378
- Issue date Apr 21, 2009
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch compositions and methods of processing a substrate
- Patent number 7,491,650
- Issue date Feb 17, 2009
- Micron Technology, Inc.
- Janos Fucsko
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method of removing silicon from a substrate
- Patent number 7,316,981
- Issue date Jan 8, 2008
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming trench isolation within a semiconductor substrate
- Patent number 7,205,245
- Issue date Apr 17, 2007
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etching method of removing silicon from a substrate
- Patent number 7,166,539
- Issue date Jan 23, 2007
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etching method of removing silicon from a substrate and method...
- Patent number 7,135,381
- Issue date Nov 14, 2006
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching silicon nitride substantially selectively relati...
- Patent number 7,030,034
- Issue date Apr 18, 2006
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Integrated Circuitry Comprising A Memory Array Comprising Strings O...
- Publication number 20250113487
- Publication date Apr 3, 2025
- Micron Technology, Inc.
- Collin Howder
Information Patent Application
LOW PARAMETER PLASMA ASHING TECHNIQUES
- Publication number 20240355595
- Publication date Oct 24, 2024
- Micron Technology, Inc.
- Rachmat Wibowo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuitry Comprising A Memory Array Comprising Strings O...
- Publication number 20230057852
- Publication date Feb 23, 2023
- Micron Technology, Inc.
- Collin Howder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Temperature Process for Polysilazane Oxidation/Densification
- Publication number 20090269569
- Publication date Oct 29, 2009
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch Compositions and Methods of Processing a Substrate
- Publication number 20070145009
- Publication date Jun 28, 2007
- Micron Technology, Inc.
- Janos Fucsko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of removing silicon from a substrate
- Publication number 20070111534
- Publication date May 17, 2007
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of substantially uniformly etching non-homogeneous substrates
- Publication number 20070042608
- Publication date Feb 22, 2007
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming trench isolation
- Publication number 20070037401
- Publication date Feb 15, 2007
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch compositions and methods of processing a substrate
- Publication number 20070023396
- Publication date Feb 1, 2007
- Micron Technology, Inc.
- Janos Fucsko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low temperature process for polysilazane oxidation/densification
- Publication number 20060102977
- Publication date May 18, 2006
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wet etching method of removing silicon from a substrate and method...
- Publication number 20060024914
- Publication date Feb 2, 2006
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming trench isolation within a semiconductor substrate
- Publication number 20060009004
- Publication date Jan 12, 2006
- Janos Fucsko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low temperature process for polysilazane oxidation/densification
- Publication number 20060003596
- Publication date Jan 5, 2006
- Micron Technology, Inc.
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of etching silicon nitride substantially selectively relati...
- Publication number 20050061768
- Publication date Mar 24, 2005
- Janos Fucsko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Wet etching method of removing silicon from a substrate and method...
- Publication number 20050020091
- Publication date Jan 27, 2005
- Janos Fucsko
- H01 - BASIC ELECTRIC ELEMENTS

Grady S. Waldo

Person

Patents Grantslast 30 patents

Integrated circuitry comprising a memory array comprising strings o...

Low temperature process for polysilazane oxidation/densification

Method of forming trench isolation

Method of substantially uniformly etching non-homogeneous substrates

Etch compositions and methods of processing a substrate

Low temperature process for polysilazane oxidation/densification

Low temperature process for polysilazane oxidation/densification

Etch compositions and methods of processing a substrate

Method of removing silicon from a substrate

Method of forming trench isolation within a semiconductor substrate

Wet etching method of removing silicon from a substrate

Wet etching method of removing silicon from a substrate and method...

Methods of etching silicon nitride substantially selectively relati...

Patents Applicationslast 30 patents

Integrated Circuitry Comprising A Memory Array Comprising Strings O...

LOW PARAMETER PLASMA ASHING TECHNIQUES

Integrated Circuitry Comprising A Memory Array Comprising Strings O...

Low Temperature Process for Polysilazane Oxidation/Densification

Etch Compositions and Methods of Processing a Substrate

Method of removing silicon from a substrate

Method of substantially uniformly etching non-homogeneous substrates

Method of forming trench isolation

Etch compositions and methods of processing a substrate

Low temperature process for polysilazane oxidation/densification

Wet etching method of removing silicon from a substrate and method...

Method of forming trench isolation within a semiconductor substrate

Low temperature process for polysilazane oxidation/densification

Methods of etching silicon nitride substantially selectively relati...

Wet etching method of removing silicon from a substrate and method...