Graham A. McFarlane

Person

Murrieta, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Solution based precursors
- Patent number 8,710,253
- Issue date Apr 29, 2014
- Linde Aktiengesellschaft
- Ce Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of recycling fluorine using an adsorption purification process
- Patent number 6,955,707
- Issue date Oct 18, 2005
- The BOC Group, Inc.
- Edward Frederick Ezell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SOLUTION BASED PRECURSORS
- Publication number 20120178953
- Publication date Jul 12, 2012
- Ce Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOLUTION BASED LANTHANIDE AND GROUP III PRECURSORS FOR ATOMIC LAYER...
- Publication number 20100290968
- Publication date Nov 18, 2010
- Ce MA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOLUTION BASED ZIRCONIUM PRECURSORS FOR ATOMIC LAYER DEPOSITION
- Publication number 20100290945
- Publication date Nov 18, 2010
- Ce Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20100036144
- Publication date Feb 11, 2010
- Ce Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOLUTION BASED LANTHANUM PRECURSORS FOR ATOMIC LAYER DEPOSITION
- Publication number 20090117274
- Publication date May 7, 2009
- Ce Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrated chamber cleaning system
- Publication number 20070079849
- Publication date Apr 12, 2007
- Richard Hogle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
H2 conditioning of chamber following cleaning cycle
- Publication number 20070074743
- Publication date Apr 5, 2007
- Graham McFarlane
- B08 - CLEANING
Information Patent Application
Method of forming low dielectric constant layer
- Publication number 20070077778
- Publication date Apr 5, 2007
- The BOC Group, Inc.
- Ce Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of recycling fluorine using an adsorption purification process
- Publication number 20060042462
- Publication date Mar 2, 2006
- Edward Frederick Ezell
- B08 - CLEANING
Information Patent Application
High rate etching using high pressure F2 plasma with argon dilution
- Publication number 20060016459
- Publication date Jan 26, 2006
- Graham McFarlane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sub-atmospheric supply of fluorine to semiconductor process chamber
- Publication number 20040074516
- Publication date Apr 22, 2004
- Richard A. Hogle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of recycling fluorine using an adsorption purification process
- Publication number 20030228989
- Publication date Dec 11, 2003
- Edward Frederick Ezell
- B08 - CLEANING

Graham A. McFarlane

Person

Patents Grantslast 30 patents

Solution based precursors

Method of recycling fluorine using an adsorption purification process

Patents Applicationslast 30 patents

SOLUTION BASED PRECURSORS

SOLUTION BASED LANTHANIDE AND GROUP III PRECURSORS FOR ATOMIC LAYER...

SOLUTION BASED ZIRCONIUM PRECURSORS FOR ATOMIC LAYER DEPOSITION

METHODS FOR ATOMIC LAYER DEPOSITION

SOLUTION BASED LANTHANUM PRECURSORS FOR ATOMIC LAYER DEPOSITION

Integrated chamber cleaning system

H2 conditioning of chamber following cleaning cycle

Method of forming low dielectric constant layer

Method of recycling fluorine using an adsorption purification process

High rate etching using high pressure F2 plasma with argon dilution

Sub-atmospheric supply of fluorine to semiconductor process chamber

Method of recycling fluorine using an adsorption purification process