Grant Peng

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Acoustic assisted single wafer wet clean for semiconductor wafer pr...
- Patent number 8,585,825
- Issue date Nov 19, 2013
- Lam Research Corporation
- Grant Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for particle removal by single-phase and two-phase media
- Patent number 8,226,775
- Issue date Jul 24, 2012
- Lam Research Corporation
- David S. L. Mui
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Materials for particle removal by single-phase and two-phase media
- Patent number 8,211,846
- Issue date Jul 3, 2012
- Lam Research Group
- David S. L. Mui
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Apparatus for particle removal by single-phase and two-phase media
- Patent number 8,084,406
- Issue date Dec 27, 2011
- Lam Research Corporation
- David S. L. Mui
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
Acoustic Assisted Single Wafer Wet Clean For Semiconductor Wafer Pr...
- Publication number 20140034096
- Publication date Feb 6, 2014
- LAM RESEARCH CORPORATION
- Grant Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA
- Publication number 20120132234
- Publication date May 31, 2012
- David S.L. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACOUSTIC ASSISTED SINGLE WAFER WET CLEAN FOR SEMICONDUCTOR WAFER PR...
- Publication number 20100108093
- Publication date May 6, 2010
- Lam Research Corp.
- Grant Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA
- Publication number 20090151757
- Publication date Jun 18, 2009
- David S.L. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA
- Publication number 20090151752
- Publication date Jun 18, 2009
- David S.L. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA
- Publication number 20090156452
- Publication date Jun 18, 2009
- David S.L. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical resistant semiconductor processing chamber bodies
- Publication number 20080038448
- Publication date Feb 14, 2008
- Lam Research Corp.
- Arnold Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Acoustic assisted single wafer wet clean for semiconductor wafer pr...

Methods for particle removal by single-phase and two-phase media

Materials for particle removal by single-phase and two-phase media

Apparatus for particle removal by single-phase and two-phase media

Patents Applicationslast 30 patents

Acoustic Assisted Single Wafer Wet Clean For Semiconductor Wafer Pr...

APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA

ACOUSTIC ASSISTED SINGLE WAFER WET CLEAN FOR SEMICONDUCTOR WAFER PR...

APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA

METHODS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA

MATERIALS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA

Chemical resistant semiconductor processing chamber bodies