Greg Blackburn

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Contaminant reduction improvements for plasma etch chambers
- Patent number 5,716,484
- Issue date Feb 10, 1998
- Applied Materials, Inc.
- Greg Blackburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contaminant reduction improvements for plasma etch chambers
- Patent number 5,693,179
- Issue date Dec 2, 1997
- Applied Materials, Inc.
- Greg Blackburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quick release process kit
- Patent number 5,484,486
- Issue date Jan 16, 1996
- Applied Materials, Inc.
- Greg Blackburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Domed extension for process chamber electrode
- Patent number 5,480,052
- Issue date Jan 2, 1996
- Applied Materials, Inc.
- Michael G. Furr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus employing a textured focus ring
- Patent number 5,474,649
- Issue date Dec 12, 1995
- Applied Materials, Inc.
- Joseph Kava
- H01 - BASIC ELECTRIC ELEMENTS