Gregg S. Higashi

Person

Berkeley Heights, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for removal of material
- Patent number 6,588,437
- Issue date Jul 8, 2003
- Agere Systems Inc.
- Gregg S Higashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making integrated circuit capacitor including anchored plug
- Patent number 6,169,010
- Issue date Jan 2, 2001
- Lucent Technologies Inc.
- Gregg Sumio Higashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit capacitor including anchored plug
- Patent number 6,153,901
- Issue date Nov 28, 2000
- Lucent Technologies Inc.
- Gregg Sumio Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for forming metal oxide semiconductors including an in situ...
- Patent number 6,140,187
- Issue date Oct 31, 2000
- Lucent Technologies Inc.
- Damon K. DeBusk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of integrated circuit fabrication
- Patent number 6,013,556
- Issue date Jan 11, 2000
- Lucent Technologies Inc.
- Gregg Sumio Higashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for continuously controlling the peroxide and ammonia con...
- Patent number 5,578,273
- Issue date Nov 26, 1996
- Lucent Technologies, Inc.
- Karrie J. Hanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and apparatus for semiconductor device fabrication
- Patent number 5,472,516
- Issue date Dec 5, 1995
- AT&T Corp.
- Karrie J. Hanson
- H01 - BASIC ELECTRIC ELEMENTS

Gregg S. Higashi

Person

Patents Grantslast 30 patents

System and method for removal of material

Method for making integrated circuit capacitor including anchored plug

Integrated circuit capacitor including anchored plug

Process for forming metal oxide semiconductors including an in situ...

Method of integrated circuit fabrication

Apparatus for continuously controlling the peroxide and ammonia con...

Process and apparatus for semiconductor device fabrication