Gregory M. Wallraff

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithium oxygen battery and electrolyte composition
- Patent number 10,957,953
- Issue date Mar 23, 2021
- International Business Machines Corporation
- Seok J. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sulfonic acid ester containing polymers for organic solvent based d...
- Patent number 9,772,558
- Issue date Sep 26, 2017
- International Business Machines Corporation
- Ramakrishnan Ayothi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithium oxygen battery and electrolyte composition
- Patent number 9,666,918
- Issue date May 30, 2017
- International Business Machines Corporation
- Seok J. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode material for lithium—oxygen battery
- Patent number 9,450,278
- Issue date Sep 20, 2016
- International Business Machines Corporation
- Ho-Cheol Kim
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Resist performance for the negative tone develop organic developmen...
- Patent number 9,057,960
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-topcoating resist for photolithography
- Patent number 8,945,808
- Issue date Feb 3, 2015
- International Business Machines Corporation
- Robert Allen David
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive tone organic solvent developed chemically amplified resist
- Patent number 8,900,802
- Issue date Dec 2, 2014
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of directed self-assembly and layered structures formed the...
- Patent number 8,821,978
- Issue date Sep 2, 2014
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Metal peroxo compounds with organic co-ligands for electron beam, d...
- Patent number 8,703,386
- Issue date Apr 22, 2014
- International Business Machines Corporation
- John David Bass
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photodecomposable bases and photoresist compositions
- Patent number 8,614,047
- Issue date Dec 24, 2013
- International Business Machines Corporation
- Ramakrishnan Ayothi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Alkaline rinse agents for use in lithographic patterning
- Patent number 8,298,751
- Issue date Oct 30, 2012
- International Business Machines Corporation
- William D. Hinsberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-topcoating photoresist for photolithography
- Patent number 7,951,524
- Issue date May 31, 2011
- International Business Machines Corporation
- Robert Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Bleachable materials for lithography
- Patent number 7,875,408
- Issue date Jan 25, 2011
- International Business Machines Corporation
- John A. Hoffnagle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion topcoat materials with improved performance
- Patent number 7,855,045
- Issue date Dec 21, 2010
- International Business Machines Corporation
- Robert David Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for patterning a low activation energy photoresist
- Patent number 7,820,369
- Issue date Oct 26, 2010
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresists for visible light imaging
- Patent number 7,807,340
- Issue date Oct 5, 2010
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for lithography for optimizing process conditions
- Patent number 7,767,385
- Issue date Aug 3, 2010
- International Business Machines Corporation
- Carl E. Larson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Discrete nano-textured structures in biomolecular arrays, and metho...
- Patent number 7,651,872
- Issue date Jan 26, 2010
- International Business Machines Corporation
- Mark Whitney Hart
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Grant
Bilayer film including an underlayer having vertical acid transport...
- Patent number 7,585,609
- Issue date Sep 8, 2009
- International Business Machines Corporation
- Carl Eric Larson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Discrete nano-textured structures in biomolecular arrays, and metho...
- Patent number 7,354,777
- Issue date Apr 8, 2008
- International Business Machines Corporation
- Mark Whitney Hart
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Grant
Photoresists for visible light imaging
- Patent number 7,354,692
- Issue date Apr 8, 2008
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced chemically amplified resist for sub 30 nm dense feature re...
- Patent number 7,300,741
- Issue date Nov 27, 2007
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion topcoat materials with improved performance
- Patent number 7,288,362
- Issue date Oct 30, 2007
- International Business Machines Corporation
- Robert David Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Low activation energy photoresists
- Patent number 7,193,023
- Issue date Mar 20, 2007
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for employing vertical acid transport for lithographic imagi...
- Patent number 7,160,665
- Issue date Jan 9, 2007
- International Business Machines Corporation
- Carl Eric Larson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 7,135,595
- Issue date Nov 14, 2006
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for forming features of 50 nm or less half-pitch with chemi...
- Patent number 7,090,963
- Issue date Aug 15, 2006
- International Business Machines Corporation
- David R. Medeiros
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Direct photo-patterning of nanoporous organosilicates, and method o...
- Patent number 7,056,840
- Issue date Jun 6, 2006
- International Business Machines Corp.
- Robert Dennis Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition
- Patent number 7,014,980
- Issue date Mar 21, 2006
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Discrete nano-textured structures in biomolecular arrays, and metho...
- Patent number 6,962,822
- Issue date Nov 8, 2005
- International Business Machines Corporation
- Mark Whitney Hart
- C40 - COMBINATORIAL CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
MAGNESIUM OXIDE BASED HARDMASK FOR REACTIVE ION ETCHING
- Publication number 20230137983
- Publication date May 4, 2023
- International Business Machines Corporation
- Aakash Pushp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF AREA-SELECTIVE ATOMIC LAYER DEPOSITION
- Publication number 20200354834
- Publication date Nov 12, 2020
- International Business Machines Corporation
- Ekmini A. De Silva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LITHIUM OXYGEN BATTERY AND ELECTROLYTE COMPOSITION
- Publication number 20170222290
- Publication date Aug 3, 2017
- International Business Machines Corporation
- Seok J. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHIUM OXYGEN BATTERY AND ELECTROLYTE COMPOSITION
- Publication number 20150280296
- Publication date Oct 1, 2015
- Central Glass Co., Ltd.
- Seok J. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SULFONIC ACID ESTER CONTAINING POLYMERS FOR ORGANIC SOLVENT BASED D...
- Publication number 20150086925
- Publication date Mar 26, 2015
- JSR Corporation
- Ramakrishnan Ayothi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST
- Publication number 20140242526
- Publication date Aug 28, 2014
- JSR Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Performance for the Negative Tone Develop Organic Developmen...
- Publication number 20140220495
- Publication date Aug 7, 2014
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATHODE MATERIAL FOR LITHIUM-OXYGEN BATTERY
- Publication number 20140178774
- Publication date Jun 26, 2014
- Volkswagen Aktiengesellschaft
- Ho-Cheol Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL PEROXO COMPOUNDS WITH ORGANIC CO-LIGANDS FOR ELECTRON BEAM, D...
- Publication number 20130224652
- Publication date Aug 29, 2013
- International Business Machines Corporation
- John David Bass
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTODECOMPOSABLE BASES AND PHOTORESIST COMPOSITIONS
- Publication number 20130052585
- Publication date Feb 28, 2013
- JSR Corporation
- Ramakrishnan Ayothi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...
- Publication number 20110147983
- Publication date Jun 23, 2011
- Joy CHENG
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Alkaline Rinse Agents For Use In Lithographic Patterning
- Publication number 20110104900
- Publication date May 5, 2011
- International Business Machines Corporation
- William D. Hinsberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY
- Publication number 20080193879
- Publication date Aug 14, 2008
- Robert Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Bleachable materials for lithography
- Publication number 20080182178
- Publication date Jul 31, 2008
- John A. Hoffnagle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists for Visible Light Imaging
- Publication number 20080166669
- Publication date Jul 10, 2008
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISCRETE NANO-TEXTURED STRUCTURES IN BIOMOLECULAR ARRAYS, AND METHO...
- Publication number 20080132426
- Publication date Jun 5, 2008
- International Business Machines Corporation
- Mark Whitney Hart
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
IMMERSION TOPCOAT MATERIALS WITH IMPROVED PERFORMANCE
- Publication number 20080026330
- Publication date Jan 31, 2008
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY
- Publication number 20070254235
- Publication date Nov 1, 2007
- International Business Machines Corporation
- ROBERT DAVID ALLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RES...
- Publication number 20070248908
- Publication date Oct 25, 2007
- International Business Machines
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for lithography for optimizing process conditions
- Publication number 20070212654
- Publication date Sep 13, 2007
- International Business Machines Corporation
- Carl E. Larson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Water castable-water strippable top coats for 193 nm immersion lith...
- Publication number 20070117040
- Publication date May 24, 2007
- International Business Machines Corporation
- Phillip Joe Brock
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for employing vertical acid transport for lithographic imagi...
- Publication number 20060257786
- Publication date Nov 16, 2006
- International Business Machines Corporation
- Carl Eric Larson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists for visible light imaging
- Publication number 20060251989
- Publication date Nov 9, 2006
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion topcoat materials with improved performance
- Publication number 20060188804
- Publication date Aug 24, 2006
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
photoresist composition
- Publication number 20060128914
- Publication date Jun 15, 2006
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Discrete nano-textured structures in biomolecular arrays, and metho...
- Publication number 20050255707
- Publication date Nov 17, 2005
- Mark Whitney Hart
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
Low activation energy photoresists
- Publication number 20050124774
- Publication date Jun 9, 2005
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for patterning a low activation energy photoresist
- Publication number 20050123852
- Publication date Jun 9, 2005
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Direct photo-patterning of nanoporous organosilicates, and method o...
- Publication number 20050070124
- Publication date Mar 31, 2005
- International Business Machines Corporation
- Robert Dennis Miller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition
- Publication number 20050019696
- Publication date Jan 27, 2005
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Gregory M. Wallraff

Person

Patents Grantslast 30 patents

Lithium oxygen battery and electrolyte composition

Sulfonic acid ester containing polymers for organic solvent based d...

Lithium oxygen battery and electrolyte composition

Cathode material for lithium—oxygen battery

Resist performance for the negative tone develop organic developmen...

Self-topcoating resist for photolithography

Positive tone organic solvent developed chemically amplified resist

Methods of directed self-assembly and layered structures formed the...

Metal peroxo compounds with organic co-ligands for electron beam, d...

Photodecomposable bases and photoresist compositions

Alkaline rinse agents for use in lithographic patterning

Self-topcoating photoresist for photolithography

Bleachable materials for lithography

Immersion topcoat materials with improved performance

Method for patterning a low activation energy photoresist

Photoresists for visible light imaging

Method for lithography for optimizing process conditions

Discrete nano-textured structures in biomolecular arrays, and metho...

Bilayer film including an underlayer having vertical acid transport...

Discrete nano-textured structures in biomolecular arrays, and metho...

Photoresists for visible light imaging

Advanced chemically amplified resist for sub 30 nm dense feature re...

Immersion topcoat materials with improved performance

Low activation energy photoresists

Method for employing vertical acid transport for lithographic imagi...

Photoresist composition

Process for forming features of 50 nm or less half-pitch with chemi...

Direct photo-patterning of nanoporous organosilicates, and method o...

Photoresist composition

Discrete nano-textured structures in biomolecular arrays, and metho...

Patents Applicationslast 30 patents

MAGNESIUM OXIDE BASED HARDMASK FOR REACTIVE ION ETCHING

METHODS OF AREA-SELECTIVE ATOMIC LAYER DEPOSITION

LITHIUM OXYGEN BATTERY AND ELECTROLYTE COMPOSITION

LITHIUM OXYGEN BATTERY AND ELECTROLYTE COMPOSITION

SULFONIC ACID ESTER CONTAINING POLYMERS FOR ORGANIC SOLVENT BASED D...

POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST

Resist Performance for the Negative Tone Develop Organic Developmen...

CATHODE MATERIAL FOR LITHIUM-OXYGEN BATTERY

METAL PEROXO COMPOUNDS WITH ORGANIC CO-LIGANDS FOR ELECTRON BEAM, D...

PHOTODECOMPOSABLE BASES AND PHOTORESIST COMPOSITIONS

METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...

Alkaline Rinse Agents For Use In Lithographic Patterning

SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY

Bleachable materials for lithography

Photoresists for Visible Light Imaging

DISCRETE NANO-TEXTURED STRUCTURES IN BIOMOLECULAR ARRAYS, AND METHO...

IMMERSION TOPCOAT MATERIALS WITH IMPROVED PERFORMANCE

SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY

ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RES...

Method for lithography for optimizing process conditions

Water castable-water strippable top coats for 193 nm immersion lith...

Method for employing vertical acid transport for lithographic imagi...

Photoresists for visible light imaging

Immersion topcoat materials with improved performance

photoresist composition

Discrete nano-textured structures in biomolecular arrays, and metho...

Low activation energy photoresists

Method for patterning a low activation energy photoresist

Direct photo-patterning of nanoporous organosilicates, and method o...

Photoresist composition