Gregory S. Sexton

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Tunable upper plasma-exclusion-zone ring for a bevel etcher
- Patent number 11,756,771
- Issue date Sep 12, 2023
- Lam Research Corporation
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable upper plasma-exclusion-zone ring for a bevel etcher
- Patent number 10,937,634
- Issue date Mar 2, 2021
- Lam Research Corporation
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Back side deposition apparatus and applications
- Patent number 9,881,788
- Issue date Jan 30, 2018
- Lam Research Corporation
- Yunsang Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for processing bevel edge etching
- Patent number 9,564,308
- Issue date Feb 7, 2017
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge electrodes with dielectric covers
- Patent number 9,184,043
- Issue date Nov 10, 2015
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable bevel etcher
- Patent number 9,053,925
- Issue date Jun 9, 2015
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for distributing gas for a bevel etcher
- Patent number 8,940,098
- Issue date Jan 27, 2015
- Lam Research Corporation
- Greg Sexton
- B08 - CLEANING
Information Patent Grant
Plasma processing assemblies including hinge assemblies
- Patent number 8,826,857
- Issue date Sep 9, 2014
- Lam Research Corporation
- Greg Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel etcher with vacuum chuck
- Patent number 8,721,908
- Issue date May 13, 2014
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for enhanced fluid delivery on bevel etch applications
- Patent number 8,671,965
- Issue date Mar 18, 2014
- Lam Research Corporation
- Miguel A. Saldana
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Bevel etcher with vacuum chuck
- Patent number 8,580,078
- Issue date Nov 12, 2013
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel edge plasma chamber with top and bottom edge electrodes
- Patent number 8,574,397
- Issue date Nov 5, 2013
- Lam Research Corporation
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Grant
Flush mounted fastener for plasma processing apparatus
- Patent number 8,562,266
- Issue date Oct 22, 2013
- Lam Research Corporation
- Gregory Sexton
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Method and system for distributing gas for a bevel edge etcher
- Patent number 8,475,624
- Issue date Jul 2, 2013
- Lam Research Corporation
- Greg Sexton
- B08 - CLEANING
Information Patent Grant
Method of orienting an upper electrode relative to a lower electrod...
- Patent number 8,398,875
- Issue date Mar 19, 2013
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for enhanced fluid delivery on bevel etch app...
- Patent number 8,328,980
- Issue date Dec 11, 2012
- Lam Research Corporation
- Miguel A. Saldana
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma chamber for wafer bevel edge processing
- Patent number 8,252,140
- Issue date Aug 28, 2012
- Lam Research Corporation
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Grant
Bevel clean device
- Patent number 8,137,501
- Issue date Mar 20, 2012
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable bevel etcher
- Patent number 7,943,007
- Issue date May 17, 2011
- Lam Research Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge electrodes with variable power
- Patent number 7,938,931
- Issue date May 10, 2011
- Lam Research Corporation
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Grant
Apparatus for aligning electrodes in a process chamber to protect a...
- Patent number 7,922,866
- Issue date Apr 12, 2011
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel etcher with gap control
- Patent number 7,858,898
- Issue date Dec 28, 2010
- Lam Research Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of and apparatus for aligning electrodes in a process chamb...
- Patent number 7,662,254
- Issue date Feb 16, 2010
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for defining regions of process exclusion and process per...
- Patent number 7,575,638
- Issue date Aug 18, 2009
- Lam Research Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature electrostatic chuck
- Patent number 6,669,783
- Issue date Dec 30, 2003
- Lam Research Corporation
- Greg Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer lifting device and methods for implementing the...
- Patent number 6,646,857
- Issue date Nov 11, 2003
- Lam Research Corporation
- Thomas W. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature electrostatic chuck
- Patent number 6,567,258
- Issue date May 20, 2003
- Lam Research Corporation
- Greg Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature electrostatic chuck
- Patent number 6,377,437
- Issue date Apr 23, 2002
- Lam Research Corporation
- Greg Sexton
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER
- Publication number 20230402257
- Publication date Dec 14, 2023
- Jack CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER PLASMA EXCLUSION ZONE RING FOR BEVEL ETCHER
- Publication number 20210351018
- Publication date Nov 11, 2021
- LAM RESEARCH CORPORATION
- Keechan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER
- Publication number 20210151297
- Publication date May 20, 2021
- LAM RESEARCH CORPORATION
- Jack CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Processing Bevel Edge Etching
- Publication number 20160064215
- Publication date Mar 3, 2016
- LAM RESEARCH CORPORATION
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACK SIDE DEPOSITION APPARATUS AND APPLICATIONS
- Publication number 20150340225
- Publication date Nov 26, 2015
- LAM RESEARCH CORPORATION
- Yunsang Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER
- Publication number 20150099365
- Publication date Apr 9, 2015
- LAM RESEARCH CORPORATION
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEVEL ETCHER WITH VACUUM CHUCK
- Publication number 20140038418
- Publication date Feb 6, 2014
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR BEVEL EDGE CLEANING IN A PLASMA PROCESSIN...
- Publication number 20140007901
- Publication date Jan 9, 2014
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Distributing Gas for A Bevel Edge Etcher
- Publication number 20130276821
- Publication date Oct 24, 2013
- Greg Sexton
- B08 - CLEANING
Information Patent Application
Plasma Processing Assemblies Including Hinge Assemblies
- Publication number 20130126092
- Publication date May 23, 2013
- LAM RESEARCH CORPORATION
- Greg Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Enhanced Fluid Delivery on Bevel Etch Applications
- Publication number 20130056078
- Publication date Mar 7, 2013
- Miguel A. Saldana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PASSIVE COMPENSATION FOR TEMPERATURE-DEPENDENT WAFER GAP CHANGES IN...
- Publication number 20120318455
- Publication date Dec 20, 2012
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bevel Edge Plasma Chamber With Top and Bottom Edge Electrodes
- Publication number 20120273134
- Publication date Nov 1, 2012
- LAM RESEARCH CORPORATION
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Application
CONFIGURABLE BEVEL ETCHER
- Publication number 20110214687
- Publication date Sep 8, 2011
- LAM RESEARCH CORPORATION
- Andrew D. Bailey III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTENSION ELECTRODE OF PLASMA BEVEL ETCHING APPARATUS AND METHOD OF...
- Publication number 20110206833
- Publication date Aug 25, 2011
- LAM RESEARCH CORPORATION
- Gregory Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUSH MOUNTED FASTENER FOR PLASMA PROCESSING APPARATUS
- Publication number 20110206479
- Publication date Aug 25, 2011
- LAM RESEARCH CORPORATION
- Gregory Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER FOR WAFER BEVEL EDGE PROCESSING
- Publication number 20110186227
- Publication date Aug 4, 2011
- LAM RESEARCH CORPORATION
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Application
METHOD OF ORIENTING AN UPPER ELECTRODE RELATIVE TO A LOWER ELECTROD...
- Publication number 20110165779
- Publication date Jul 7, 2011
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Enhanced Fluid Delivery on Bevel Etch App...
- Publication number 20110059614
- Publication date Mar 10, 2011
- Miguel A. Saldana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus For Aligning Electrodes In A Process Chamber to Protect A...
- Publication number 20100096087
- Publication date Apr 22, 2010
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE ELECTRODES WITH DIELECTRIC COVERS
- Publication number 20090166326
- Publication date Jul 2, 2009
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE ELECTRODES WITH VARIABLE POWER
- Publication number 20090114244
- Publication date May 7, 2009
- Gregory S. Sexton
- B08 - CLEANING
Information Patent Application
METHOD AND SYSTEM FOR DISTRIBUTING GAS FOR A BEVEL EDGE ETCHER
- Publication number 20080216864
- Publication date Sep 11, 2008
- Greg Sexton
- B08 - CLEANING
Information Patent Application
BEVEL CLEAN DEVICE
- Publication number 20080190448
- Publication date Aug 14, 2008
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of and apparatus for aligning electrodes in a process chamb...
- Publication number 20080190556
- Publication date Aug 14, 2008
- LAM RESEARCH CORPORATION
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for defining regions of process exclusion and process per...
- Publication number 20080185105
- Publication date Aug 7, 2008
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Configurable bevel etcher
- Publication number 20080182412
- Publication date Jul 31, 2008
- LAM RESEARCH CORPORATION
- Andrew D. Bailey III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bevel etcher with vacuum chuck
- Publication number 20080179010
- Publication date Jul 31, 2008
- LAM RESEARCH CORPORATION
- Andrew D. Bailey III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bevel etcher with gap control
- Publication number 20080179297
- Publication date Jul 31, 2008
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High temperature electrostatic chuck
- Publication number 20030003749
- Publication date Jan 2, 2003
- Greg Sexton
- H01 - BASIC ELECTRIC ELEMENTS

Gregory S. Sexton

Person

Patents Grantslast 30 patents

Tunable upper plasma-exclusion-zone ring for a bevel etcher

Tunable upper plasma-exclusion-zone ring for a bevel etcher

Back side deposition apparatus and applications

Methods for processing bevel edge etching

Edge electrodes with dielectric covers

Configurable bevel etcher

Method for distributing gas for a bevel etcher

Plasma processing assemblies including hinge assemblies

Bevel etcher with vacuum chuck

Methods for enhanced fluid delivery on bevel etch applications

Bevel etcher with vacuum chuck

Bevel edge plasma chamber with top and bottom edge electrodes

Flush mounted fastener for plasma processing apparatus

Method and system for distributing gas for a bevel edge etcher

Method of orienting an upper electrode relative to a lower electrod...

Apparatus and methods for enhanced fluid delivery on bevel etch app...

Plasma chamber for wafer bevel edge processing

Bevel clean device

Configurable bevel etcher

Edge electrodes with variable power

Apparatus for aligning electrodes in a process chamber to protect a...

Bevel etcher with gap control

Methods of and apparatus for aligning electrodes in a process chamb...

Apparatus for defining regions of process exclusion and process per...

High temperature electrostatic chuck

Semiconductor wafer lifting device and methods for implementing the...

High temperature electrostatic chuck

High temperature electrostatic chuck

Patents Applicationslast 30 patents

TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER

LOWER PLASMA EXCLUSION ZONE RING FOR BEVEL ETCHER

TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER

Methods for Processing Bevel Edge Etching

BACK SIDE DEPOSITION APPARATUS AND APPLICATIONS

TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER

BEVEL ETCHER WITH VACUUM CHUCK

METHODS AND APPARATUS FOR BEVEL EDGE CLEANING IN A PLASMA PROCESSIN...

Method and System for Distributing Gas for A Bevel Edge Etcher

Plasma Processing Assemblies Including Hinge Assemblies

Methods for Enhanced Fluid Delivery on Bevel Etch Applications

PASSIVE COMPENSATION FOR TEMPERATURE-DEPENDENT WAFER GAP CHANGES IN...

Bevel Edge Plasma Chamber With Top and Bottom Edge Electrodes

CONFIGURABLE BEVEL ETCHER

EXTENSION ELECTRODE OF PLASMA BEVEL ETCHING APPARATUS AND METHOD OF...

FLUSH MOUNTED FASTENER FOR PLASMA PROCESSING APPARATUS

PLASMA CHAMBER FOR WAFER BEVEL EDGE PROCESSING

METHOD OF ORIENTING AN UPPER ELECTRODE RELATIVE TO A LOWER ELECTROD...

Apparatus and Methods for Enhanced Fluid Delivery on Bevel Etch App...

Apparatus For Aligning Electrodes In A Process Chamber to Protect A...

EDGE ELECTRODES WITH DIELECTRIC COVERS

EDGE ELECTRODES WITH VARIABLE POWER

METHOD AND SYSTEM FOR DISTRIBUTING GAS FOR A BEVEL EDGE ETCHER

BEVEL CLEAN DEVICE

Methods of and apparatus for aligning electrodes in a process chamb...

Apparatus for defining regions of process exclusion and process per...

Configurable bevel etcher

Bevel etcher with vacuum chuck

Bevel etcher with gap control

High temperature electrostatic chuck