Guangxiang Jin

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of plasma etching of high-K dielectric materials
- Patent number 7,838,434
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Guangxiang Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch methods to form anisotropic features for high aspect ratio app...
- Patent number 7,368,394
- Issue date May 6, 2008
- Applied Materials, Inc.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching high-K dielectric materials with high sele...
- Patent number 7,217,665
- Issue date May 15, 2007
- Applied Materials, Inc.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of high-K dielectric materials
- Patent number 7,094,704
- Issue date Aug 22, 2006
- Applied Materials, Inc.
- Guangxiang Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing short circuits in magnetic film stacks
- Patent number 6,893,893
- Issue date May 17, 2005
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching methods for a magnetic memory cell stack
- Patent number 6,821,907
- Issue date Nov 23, 2004
- Jeng H. Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of high-K dielectric materials with high s...
- Patent number 6,806,095
- Issue date Oct 19, 2004
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a gate structure of a field effect transistor...
- Patent number 6,767,824
- Issue date Jul 27, 2004
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a cup capacitor
- Patent number 6,730,561
- Issue date May 4, 2004
- Applied Materials, Inc.
- Jeng H. Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus and method
- Patent number 6,692,903
- Issue date Feb 17, 2004
- Applied Materials, Inc.
- Haojiang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preventing corrosion of a dielectric material
- Patent number 6,368,517
- Issue date Apr 9, 2002
- Applied Materials, Inc.
- Jeng H. Hwang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCH METHODS TO FORM ANISOTROPIC FEATURES FOR HIGH ASPECT RATIO APP...
- Publication number 20080057729
- Publication date Mar 6, 2008
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch methods to form anisotropic features for high aspect ratio app...
- Publication number 20070202700
- Publication date Aug 30, 2007
- APPLIED MATERIALS, INC.
- Uwe Leucke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etch methods to form anisotropic features for high aspect ratio app...
- Publication number 20070199922
- Publication date Aug 30, 2007
- APPLIED MATERIALS, INC.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA ETCHING OF HIGH-K DIELECTRIC MATERIALS
- Publication number 20070077767
- Publication date Apr 5, 2007
- Applied Materials, Inc.
- Guangxiang Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching high-kappa dielectric materials with good high-kappa foot c...
- Publication number 20060252265
- Publication date Nov 9, 2006
- Guangxiang Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching metals with high selectivity to hafnium-based die...
- Publication number 20060060565
- Publication date Mar 23, 2006
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of etching metals with high selectivity to hafnium-based die...
- Publication number 20040206724
- Publication date Oct 21, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of plasma etching of high-K dielectric materials with high s...
- Publication number 20040173572
- Publication date Sep 9, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching metallic materials to form a tapered profile
- Publication number 20040171272
- Publication date Sep 2, 2004
- APPLIED MATERIALS, INC.
- Guangxiang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of etching high-K dielectric materials
- Publication number 20040132311
- Publication date Jul 8, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching high-K dielectric materials with high sele...
- Publication number 20040097092
- Publication date May 20, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating a gate structure of a field effect transistor...
- Publication number 20040058517
- Publication date Mar 25, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma etching of high-K dielectric materials
- Publication number 20040007561
- Publication date Jan 15, 2004
- APPLIED MATERIALS, INC.
- Padmapani Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching of high-K dielectric materials
- Publication number 20030211748
- Publication date Nov 13, 2003
- APPLIED MATERIALS, INC.
- Guangxiang Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of preventing short circuits in magnetic film stacks
- Publication number 20030180968
- Publication date Sep 25, 2003
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching methods for a magnetic memory cell stack
- Publication number 20030170985
- Publication date Sep 11, 2003
- APPLIED MATERIALS, INC.
- Jeng H. Hwang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of plasma etching of high-K dielectric materials with high s...
- Publication number 20030170986
- Publication date Sep 11, 2003
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a cup capacitor
- Publication number 20030013252
- Publication date Jan 16, 2003
- Jeng H. Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate cleaning apparatus and method
- Publication number 20020072016
- Publication date Jun 13, 2002
- APPLIED MATERIALS, INC.
- Haojiang Chen
- H01 - BASIC ELECTRIC ELEMENTS

Guangxiang Jin

Person

Patents Grantslast 30 patents

Method of plasma etching of high-K dielectric materials

Etch methods to form anisotropic features for high aspect ratio app...

Method of plasma etching high-K dielectric materials with high sele...

Method of plasma etching of high-K dielectric materials

Method of preventing short circuits in magnetic film stacks

Etching methods for a magnetic memory cell stack

Method of plasma etching of high-K dielectric materials with high s...

Method of fabricating a gate structure of a field effect transistor...

Method of forming a cup capacitor

Substrate cleaning apparatus and method

Method for preventing corrosion of a dielectric material

Patents Applicationslast 30 patents

ETCH METHODS TO FORM ANISOTROPIC FEATURES FOR HIGH ASPECT RATIO APP...

Etch methods to form anisotropic features for high aspect ratio app...

Etch methods to form anisotropic features for high aspect ratio app...

METHOD OF PLASMA ETCHING OF HIGH-K DIELECTRIC MATERIALS

Etching high-kappa dielectric materials with good high-kappa foot c...

Method of etching metals with high selectivity to hafnium-based die...

Method of etching metals with high selectivity to hafnium-based die...

Method of plasma etching of high-K dielectric materials with high s...

Method of etching metallic materials to form a tapered profile

Method of etching high-K dielectric materials

Method of plasma etching high-K dielectric materials with high sele...

Method of fabricating a gate structure of a field effect transistor...

Method for plasma etching of high-K dielectric materials

Method of plasma etching of high-K dielectric materials

Method of preventing short circuits in magnetic film stacks

Etching methods for a magnetic memory cell stack

Method of plasma etching of high-K dielectric materials with high s...

Method of forming a cup capacitor

Substrate cleaning apparatus and method