Guido LIMBACH

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element unit for exposure processes
- Patent number 10,203,607
- Issue date Feb 12, 2019
- Carl Zeiss SMT GmbH
- Tilman Schwertner
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 9,703,098
- Issue date Jul 11, 2017
- Carl Zeiss SMT GmbH
- Guido Soyez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, projection objective with such mirror, and projection expos...
- Patent number 9,575,224
- Issue date Feb 21, 2017
- Carl Zeiss SMT GmbH
- Rolf Freimann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for replacing objective parts
- Patent number 9,551,944
- Issue date Jan 24, 2017
- Carl Zeiss SMT GmbH
- Bernhard Geuppert
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 9,423,695
- Issue date Aug 23, 2016
- Carl Zeiss SMT GmbH
- Guido Soyez
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical module with a measuring device
- Patent number 9,175,948
- Issue date Nov 3, 2015
- Carl Zeiss SMT GmbH
- Armin Schoeppach
- G01 - MEASURING TESTING
Information Patent Grant
Optical element unit for exposure processes having sealing element
- Patent number 9,046,795
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Tilman Schwertner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 8,939,587
- Issue date Jan 27, 2015
- Carl Zeiss SMT GmbH
- Guido Soyez
- G02 - OPTICS
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,659,745
- Issue date Feb 25, 2014
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,542,346
- Issue date Sep 24, 2013
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 8,376,559
- Issue date Feb 19, 2013
- Carl Zeiss SMT GmbH
- Guido Soyez
- G02 - OPTICS
Information Patent Grant
Lens module comprising at least one exchangeable optical element
- Patent number 8,092,029
- Issue date Jan 10, 2012
- Carl Zeiss SMT GmbH
- Guido Soyez
- G02 - OPTICS
Information Patent Grant
Optical element unit for exposure processes
- Patent number 7,545,483
- Issue date Jun 9, 2009
- Carl Zeiss SMT AG
- Bernhard Gellrich
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20180031827
- Publication date Feb 1, 2018
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20160357012
- Publication date Dec 8, 2016
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20160195818
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
- Publication number 20150168846
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Tilman Schwertner
- G02 - OPTICS
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20150138521
- Publication date May 21, 2015
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Device for Replacing Objective Parts
- Publication number 20140359990
- Publication date Dec 11, 2014
- Bernhard Geuppert
- B08 - CLEANING
Information Patent Application
OPTICAL MODULE WITH A MEASURING DEVICE
- Publication number 20140125995
- Publication date May 8, 2014
- Armin Schoeppach
- G02 - OPTICS
Information Patent Application
MIRROR, PROJECTION OBJECTIVE WITH SUCH MIRROR, AND PROJECTION EXPOS...
- Publication number 20130286471
- Publication date Oct 31, 2013
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20130278911
- Publication date Oct 24, 2013
- Guido Limbach
- G02 - OPTICS
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20130155509
- Publication date Jun 20, 2013
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G02 - OPTICS
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT
- Publication number 20120105958
- Publication date May 3, 2012
- Carl Zeiss SMT GMBH
- Guido SOYEZ
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR REPLACING OBJECTIVE PARTS
- Publication number 20090260654
- Publication date Oct 22, 2009
- Carl Zeiss SMT AG
- Bernhard Geuppert
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20090244509
- Publication date Oct 1, 2009
- Carl Zeiss SMT AG
- Guido Limbach
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
- Publication number 20080225247
- Publication date Sep 18, 2008
- Carl Zeiss SMT AG
- Tilman Schwertner
- G02 - OPTICS
Information Patent Application
Optical element unit for exposure processes
- Publication number 20080192215
- Publication date Aug 14, 2008
- Carl Zeiss SMT AG
- Bernhard Gellrich
- G02 - OPTICS
Information Patent Application
Lens Module Comprising at Least One Exchangeable Optical Element
- Publication number 20080137192
- Publication date Jun 12, 2008
- Guido Soyez
- G02 - OPTICS

Guido LIMBACH

Person

Patents Grantslast 30 patents

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

Optical element unit for exposure processes

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

Lens module comprising at least one exchangeable optical element

Mirror, projection objective with such mirror, and projection expos...

Method for replacing objective parts

Lens module comprising at least one exchangeable optical element

EUV exposure apparatus with reflective elements having reduced infl...

Optical module with a measuring device

Optical element unit for exposure processes having sealing element

Lens module comprising at least one exchangeable optical element

Optical system with an exchangeable, manipulable correction arrange...

Optical system with an exchangeable, manipulable correction arrange...

Lens module comprising at least one exchangeable optical element

Lens module comprising at least one exchangeable optical element

Optical element unit for exposure processes

Patents Applicationslast 30 patents

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

Method and Device for Replacing Objective Parts

OPTICAL MODULE WITH A MEASURING DEVICE

MIRROR, PROJECTION OBJECTIVE WITH SUCH MIRROR, AND PROJECTION EXPOS...

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

EUV Exposure Apparatus

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

METHOD AND DEVICE FOR REPLACING OBJECTIVE PARTS

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES

Optical element unit for exposure processes

Lens Module Comprising at Least One Exchangeable Optical Element