Gundula Weiss

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Microlithographic projection exposure apparatus having a multi-mirr...
- Patent number 10,146,135
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,052,606
- Issue date Jun 9, 2015
- Carl Zeiss SMT GmbH
- Andras G. Major
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical beam deflecting element, illumination system including same...
- Patent number 9,025,131
- Issue date May 5, 2015
- Carl Zeiss SMT GmbH
- Daniel Runde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,891,057
- Issue date Nov 18, 2014
- Carl Zeiss SMT GmbH
- Michael Layh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus having a multi-mirr...
- Patent number 8,724,086
- Issue date May 13, 2014
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Method of producing a diffractive optical element and diffractive o...
- Patent number 8,259,392
- Issue date Sep 4, 2012
- Carl Zeiss SMT GmbH
- Harald Volkenandt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Optical system of an illumination device of a projection exposure a...
- Patent number 8,068,279
- Issue date Nov 29, 2011
- Carl Zeiss SMT GmbH
- Karl-Heinz Schuster
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRR...
- Publication number 20150177623
- Publication date Jun 25, 2015
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140211188
- Publication date Jul 31, 2014
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20130077074
- Publication date Mar 28, 2013
- Carl Zeiss SMT GMBH
- Andras G. Major
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...
- Publication number 20130077077
- Publication date Mar 28, 2013
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL BEAM DEFLECTING ELEMENT, ILLUMINATION SYSTEM INCLUDING SAME...
- Publication number 20120249988
- Publication date Oct 4, 2012
- CARL ZEISS SMT GMBH
- Daniel Runde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20100283984
- Publication date Nov 11, 2010
- Carl Zeiss SMT AG
- Michael Layh
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20100283985
- Publication date Nov 11, 2010
- Carl Zeiss SMT AG
- Michael Layh
- G02 - OPTICS
Information Patent Application
METHOD OF PRODUCING A DIFFRACTIVE OPTICAL ELEMENT AND DIFFRACTIVE O...
- Publication number 20080192223
- Publication date Aug 14, 2008
- Carl Zeiss SMT AG
- Harald Volkenandt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
OPTICAL SYSTEM OF AN ILLUMINATION DEVICE OF A PROJECTION EXPOSURE A...
- Publication number 20070217013
- Publication date Sep 20, 2007
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS

Gundula Weiss

Person

Patents Grantslast 30 patents

Microlithographic projection exposure apparatus having a multi-mirr...

Microlithographic projection exposure apparatus

Optical beam deflecting element, illumination system including same...

Microlithographic projection exposure apparatus

Microlithographic projection exposure apparatus having a multi-mirr...

Method of producing a diffractive optical element and diffractive o...

Optical system of an illumination device of a projection exposure a...

Patents Applicationslast 30 patents

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRR...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...

OPTICAL BEAM DEFLECTING ELEMENT, ILLUMINATION SYSTEM INCLUDING SAME...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

METHOD OF PRODUCING A DIFFRACTIVE OPTICAL ELEMENT AND DIFFRACTIVE O...

OPTICAL SYSTEM OF AN ILLUMINATION DEVICE OF A PROJECTION EXPOSURE A...