Guo Xiang NING

Person

Ballston Lake, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Hard mask etch and dielectric etch aware overlap for via and metal...
- Patent number 9,817,927
- Issue date Nov 14, 2017
- GLOBALFOUNDRIES Inc.
- Guo Xiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, re...
- Patent number 9,798,238
- Issue date Oct 24, 2017
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Guo Xiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, re...
- Patent number 9,341,961
- Issue date May 17, 2016
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Guo Xiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout for reticle and wafer scanning electron microscope registrat...
- Patent number 9,029,855
- Issue date May 12, 2015
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Guo Xiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
HARD MASK ETCH AND DIELECTRIC ETCH AWARE OVERLAP FOR VIA AND METAL...
- Publication number 20170061044
- Publication date Mar 2, 2017
- GLOBALFOUNDRIES INC.
- Guo Xiang NING
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, RE...
- Publication number 20160179006
- Publication date Jun 23, 2016
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Guo Xiang NING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAYOUT FOR RETICLE AND WAFER SCANNING ELECTRON MICROSCOPE REGISTRAT...
- Publication number 20150221565
- Publication date Aug 6, 2015
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Guo Xiang NING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL PROXIMITY CORRECTION FOR CONNECTING VIA BETWEEN LAYERS OF A...
- Publication number 20150006138
- Publication date Jan 1, 2015
- GLOBALFOUNDRIES INC.
- Guo Xiang Ning
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LAYOUT FOR RETICLE AND WAFER SCANNING ELECTRON MICROSCOPE REGISTRAT...
- Publication number 20140264334
- Publication date Sep 18, 2014
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Guo Xiang NING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, RE...
- Publication number 20140268090
- Publication date Sep 18, 2014
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Guo Xiang NING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Guo Xiang NING

Person

Patents Grantslast 30 patents

Hard mask etch and dielectric etch aware overlap for via and metal...

Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, re...

Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, re...

Layout for reticle and wafer scanning electron microscope registrat...

Patents Applicationslast 30 patents

HARD MASK ETCH AND DIELECTRIC ETCH AWARE OVERLAP FOR VIA AND METAL...

CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, RE...

LAYOUT FOR RETICLE AND WAFER SCANNING ELECTRON MICROSCOPE REGISTRAT...

OPTICAL PROXIMITY CORRECTION FOR CONNECTING VIA BETWEEN LAYERS OF A...

LAYOUT FOR RETICLE AND WAFER SCANNING ELECTRON MICROSCOPE REGISTRAT...

CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, RE...