Guorong V. Zhuang

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-environment polarized infrared reflectometer for semiconducto...
- Patent number 11,231,362
- Issue date Jan 25, 2022
- KLA Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Mid-infrared spectroscopy for measurement of high aspect ratio stru...
- Patent number 11,137,350
- Issue date Oct 5, 2021
- KLA Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Grant
Confined illumination for small spot size metrology
- Patent number 10,006,865
- Issue date Jun 26, 2018
- KLA-Tencor Corporation
- Derrick Shaughnessy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology with reduced focus error sensitivity
- Patent number 9,970,863
- Issue date May 15, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Small-angle scattering X-ray metrology systems and methods
- Patent number 9,846,132
- Issue date Dec 19, 2017
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Grant
Confined illumination for small spot size metrology
- Patent number 9,719,932
- Issue date Aug 1, 2017
- KLA-Tencor Corporation
- Derrick Shaughnessy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High brightness liquid droplet X-ray source for semiconductor metro...
- Patent number 9,693,439
- Issue date Jun 27, 2017
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology with reduced sensitivity to grating anomalies
- Patent number 9,470,639
- Issue date Oct 18, 2016
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Selectably configurable multiple mode spectroscopic ellipsometry
- Patent number 9,404,872
- Issue date Aug 2, 2016
- KLA-Tencor Corporation
- Haiming Wang
- G01 - MEASURING TESTING
Information Patent Grant
Dynamically adjustable semiconductor metrology system
- Patent number 9,228,943
- Issue date Jan 5, 2016
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for cleaning objects in a chamber of an optic...
- Patent number 9,156,068
- Issue date Oct 13, 2015
- KLA-Tencor Corporation
- Leonard E. Klebanoff
- B08 - CLEANING
Information Patent Grant
Light source tracking in optical metrology system
- Patent number 9,146,156
- Issue date Sep 29, 2015
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for purifying a controlled-pressure environment
- Patent number 8,790,603
- Issue date Jul 29, 2014
- KLA-Tencor Corporation
- Guorong V. Zhuang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Optical system polarizer calibration
- Patent number 8,570,514
- Issue date Oct 29, 2013
- KLA-Tencor Corporation
- Johannes D. de Veer
- G01 - MEASURING TESTING
Information Patent Grant
Bright and dark field scatterometry systems for line roughness metr...
- Patent number 8,045,179
- Issue date Oct 25, 2011
- KLA-Tencor Corporation
- Guorong Vera Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
High brightness X-ray metrology
- Patent number 7,929,667
- Issue date Apr 19, 2011
- KLA-Tencor Corporation
- Guorong V. Zhuang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Infrared metrology
- Patent number 7,928,390
- Issue date Apr 19, 2011
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for near-field heterodyne spectroscopy
- Patent number 7,760,364
- Issue date Jul 20, 2010
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Mid-Infrared Spectroscopy For Measurement Of High Aspect Ratio Stru...
- Publication number 20200240907
- Publication date Jul 30, 2020
- KLA Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
Optical Metrology With Reduced Focus Error Sensitivity
- Publication number 20160245741
- Publication date Aug 25, 2016
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
SMALL-ANGLE SCATTERING X-RAY METROLOGY SYSTEMS AND METHODS
- Publication number 20150110249
- Publication date Apr 23, 2015
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR CLEANING OBJECTS IN A CHAMBER OF AN OPTIC...
- Publication number 20140374619
- Publication date Dec 25, 2014
- Leonard E. Klebanoff
- B08 - CLEANING
Information Patent Application
CARBON AS GRAZING INCIDENCE EUV MIRROR AND SPECTRAL PURITY FILTER
- Publication number 20140168758
- Publication date Jun 19, 2014
- KLA-Tencor Corporation
- Garry Rose
- G02 - OPTICS
Information Patent Application
OPTICAL COMPONENT WITH BLOCKING SURFACE AND METHOD THEREOF
- Publication number 20140158914
- Publication date Jun 12, 2014
- Leonard E. Klebanoff
- G02 - OPTICS
Information Patent Application
APPARATUS FOR PURIFYING A CONTROLLED-PRESSURE ENVIRONMENT
- Publication number 20140004025
- Publication date Jan 2, 2014
- Guorong V. Zhuang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dynamically Adjustable Semiconductor Metrology System
- Publication number 20130114085
- Publication date May 9, 2013
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM
- Publication number 20130033704
- Publication date Feb 7, 2013
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING

Guorong V. Zhuang

Person

Patents Grantslast 30 patents

Multi-environment polarized infrared reflectometer for semiconducto...

Mid-infrared spectroscopy for measurement of high aspect ratio stru...

Confined illumination for small spot size metrology

Optical metrology with reduced focus error sensitivity

Small-angle scattering X-ray metrology systems and methods

Confined illumination for small spot size metrology

High brightness liquid droplet X-ray source for semiconductor metro...

Optical metrology with reduced sensitivity to grating anomalies

Selectably configurable multiple mode spectroscopic ellipsometry

Dynamically adjustable semiconductor metrology system

Methods and apparatus for cleaning objects in a chamber of an optic...

Light source tracking in optical metrology system

Apparatus for purifying a controlled-pressure environment

Optical system polarizer calibration

Bright and dark field scatterometry systems for line roughness metr...

High brightness X-ray metrology

Infrared metrology

Systems and methods for near-field heterodyne spectroscopy

Patents Applicationslast 30 patents

Mid-Infrared Spectroscopy For Measurement Of High Aspect Ratio Stru...

Optical Metrology With Reduced Focus Error Sensitivity

SMALL-ANGLE SCATTERING X-RAY METROLOGY SYSTEMS AND METHODS

METHODS AND APPARATUS FOR CLEANING OBJECTS IN A CHAMBER OF AN OPTIC...

CARBON AS GRAZING INCIDENCE EUV MIRROR AND SPECTRAL PURITY FILTER

OPTICAL COMPONENT WITH BLOCKING SURFACE AND METHOD THEREOF

APPARATUS FOR PURIFYING A CONTROLLED-PRESSURE ENVIRONMENT

Dynamically Adjustable Semiconductor Metrology System

LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM