Guy Parsey

Person

Ann Arbor, MI, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithography mask repair by simulation of photoresist thickness evol...
- Patent number 11,966,156
- Issue date Apr 23, 2024
- KLA Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for setting up a physics-based model
- Patent number 11,868,689
- Issue date Jan 9, 2024
- KLA Corp.
- Chad Huard
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV...
- Publication number 20250104216
- Publication date Mar 27, 2025
- KLA Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV...
- Publication number 20250104214
- Publication date Mar 27, 2025
- KLA Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV...
- Publication number 20250104215
- Publication date Mar 27, 2025
- KLA Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY MASK REPAIR BY SIMULATION OF PHOTORESIST THICKNESS EVOL...
- Publication number 20240061327
- Publication date Feb 22, 2024
- KLA Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR SETTING UP A PHYSICS-BASED MODEL
- Publication number 20230112164
- Publication date Apr 13, 2023
- KLA Corporation
- Chad Huard
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PREDICTION AND METROLOGY OF STOCHASTIC PHOTORESIST THICKNESS DEFECTS
- Publication number 20220129775
- Publication date Apr 28, 2022
- KLA Corporation
- Anatoly Burov
- G06 - COMPUTING CALCULATING COUNTING

Person

Patents Grantslast 30 patents

Lithography mask repair by simulation of photoresist thickness evol...

Systems and methods for setting up a physics-based model

Patents Applicationslast 30 patents

METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV...

METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV...

METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV...

LITHOGRAPHY MASK REPAIR BY SIMULATION OF PHOTORESIST THICKNESS EVOL...

SYSTEMS AND METHODS FOR SETTING UP A PHYSICS-BASED MODEL

PREDICTION AND METROLOGY OF STOCHASTIC PHOTORESIST THICKNESS DEFECTS