Gyeong-Su Keum

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Filament member, ion source, and ion implantation apparatus
- Patent number 7,652,264
- Issue date Jan 26, 2010
- Samsung Electronics Co., Ltd.
- Ui-Hui Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanters having an arc chamber that affects ion current density
- Patent number 7,170,070
- Issue date Jan 30, 2007
- Samsung Electronics Co., Ltd.
- Ui-hui Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting apparatus and ion implanting method using the same
- Patent number 7,112,810
- Issue date Sep 26, 2006
- Samsung Electronics Co., Ltd.
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polarity exchanger and ion implanter having the same
- Patent number 6,903,336
- Issue date Jun 7, 2005
- Samsung Electronics Co., Ltd.
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measuring inclination angle of ion beam
- Patent number 6,858,854
- Issue date Feb 22, 2005
- Samsung Electronics Co., Ltd.
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater assembly for heating a wafer
- Patent number 6,720,533
- Issue date Apr 13, 2004
- Samsung Electronics Co., Ltd.
- Gyeong-Su Keum
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of and apparatus for use in orienting an object at a referen...
- Patent number 6,705,020
- Issue date Mar 16, 2004
- Samsung Electronics Co, Ltd.
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time parameter monitoring apparatus for high voltage chamber i...
- Patent number 6,590,378
- Issue date Jul 8, 2003
- Samsung Electronics Co., Ltd.
- Sang-Mun Chon
- G01 - MEASURING TESTING
Information Patent Grant
Wafer sidewall inspection system and method
- Patent number 6,449,585
- Issue date Sep 10, 2002
- Samsung Electronics Co., Ltd.
- Ki-chul Hyun
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma based ion implantation system
- Publication number 20080289576
- Publication date Nov 27, 2008
- Samsung Electronics Co., Ltd.
- Young dong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Filament member, ion source, and ion implantation apparatus
- Publication number 20070114435
- Publication date May 24, 2007
- Ui-Hui Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Filament member, ion source, and ion implantation apparatus
- Publication number 20070114436
- Publication date May 24, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma doping method and plasma doping apparatus for performing the...
- Publication number 20070087584
- Publication date Apr 19, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma doping method and plasma doping apparatus for performing the...
- Publication number 20070077366
- Publication date Apr 5, 2007
- Gyeong-Su Keum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ion implanters having an arc chamber that affects ion current density
- Publication number 20060060797
- Publication date Mar 23, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Ui-hui Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanting apparatus and ion implanting method using the same
- Publication number 20050133737
- Publication date Jun 23, 2005
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical vapor deposition processing equipment for use in fabricati...
- Publication number 20050022742
- Publication date Feb 3, 2005
- Hyung-Sik Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Polarity exchanger and ion implanter having the same
- Publication number 20040113100
- Publication date Jun 17, 2004
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for measuring inclination angle of ion beam
- Publication number 20030197132
- Publication date Oct 23, 2003
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck of an ion implanter
- Publication number 20030107866
- Publication date Jun 12, 2003
- Tae-Won Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heater assembly for heating a wafer
- Publication number 20030047555
- Publication date Mar 13, 2003
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of and apparatus for use in orienting an object at a referen...
- Publication number 20020166979
- Publication date Nov 14, 2002
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Parameter monitoring apparatus for high voltage chamber in semicond...
- Publication number 20020067177
- Publication date Jun 6, 2002
- Sang-Mun Chon
- G01 - MEASURING TESTING

Gyeong-Su Keum

Person

Patents Grantslast 30 patents

Filament member, ion source, and ion implantation apparatus

Ion implanters having an arc chamber that affects ion current density

Ion implanting apparatus and ion implanting method using the same

Polarity exchanger and ion implanter having the same

Method and apparatus for measuring inclination angle of ion beam

Heater assembly for heating a wafer

Method of and apparatus for use in orienting an object at a referen...

Real time parameter monitoring apparatus for high voltage chamber i...

Wafer sidewall inspection system and method

Patents Applicationslast 30 patents

Plasma based ion implantation system

Filament member, ion source, and ion implantation apparatus

Filament member, ion source, and ion implantation apparatus

Plasma doping method and plasma doping apparatus for performing the...

Plasma doping method and plasma doping apparatus for performing the...

Ion implanters having an arc chamber that affects ion current density

Ion implanting apparatus and ion implanting method using the same

Chemical vapor deposition processing equipment for use in fabricati...

Polarity exchanger and ion implanter having the same

Method and apparatus for measuring inclination angle of ion beam

Electrostatic chuck of an ion implanter

Heater assembly for heating a wafer

Method of and apparatus for use in orienting an object at a referen...

Parameter monitoring apparatus for high voltage chamber in semicond...