H. Ufuk Alpay

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Poughquag, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Damage resistant photomask construction
- Patent number 6,841,309
- Issue date Jan 11, 2005
- Dupont Photomasks, Inc.
- H. Ufuk Alpay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY