Hachishiro Iizuka

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Upper electrode and plasma processing apparatus
- Patent number 11,621,151
- Issue date Apr 4, 2023
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sealing structure, vacuum processing apparatus and sealing method
- Patent number 11,476,132
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 11,414,754
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,807,862
- Issue date Oct 31, 2017
- TOKOYO ELECTRON LIMITED
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,196,461
- Issue date Nov 24, 2015
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing gas supply structure the...
- Patent number 9,117,633
- Issue date Aug 25, 2015
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,986,495
- Issue date Mar 24, 2015
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,852,386
- Issue date Oct 7, 2014
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and shower head
- Patent number 8,852,387
- Issue date Oct 7, 2014
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and vaporizer
- Patent number 8,758,511
- Issue date Jun 24, 2014
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shower head and plasma processing apparatus having same
- Patent number 8,758,550
- Issue date Jun 24, 2014
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and shower head
- Patent number 8,747,609
- Issue date Jun 10, 2014
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing gas supply structure the...
- Patent number 8,674,607
- Issue date Mar 18, 2014
- Tokyo Electron Limited
- Hachishiro Iizuka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,608,903
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower head and substrate processing apparatus
- Patent number 8,366,828
- Issue date Feb 5, 2013
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shower head and plasma processing apparatus having same
- Patent number 8,282,769
- Issue date Oct 9, 2012
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower head and substrate processing apparatus
- Patent number 8,236,106
- Issue date Aug 7, 2012
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply mechanism and substrate processing apparatus
- Patent number 8,221,581
- Issue date Jul 17, 2012
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Baffle plate and substrate processing apparatus
- Patent number 8,152,925
- Issue date Apr 10, 2012
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coupling member and plasma processing apparatus
- Patent number 8,052,364
- Issue date Nov 8, 2011
- Tokyo Electron Limited
- Hachishiro Iizuka
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,043,471
- Issue date Oct 25, 2011
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vaporizer and semiconductor processing apparatus
- Patent number 7,666,260
- Issue date Feb 23, 2010
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and substrate mounting table employed t...
- Patent number 7,513,954
- Issue date Apr 7, 2009
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Middle plate for the shower head
- Patent number D581012
- Issue date Nov 18, 2008
- Tokyo Electron Limited
- Hachishiro Iizuka
- D23 - Environmental heating and cooling
Information Patent Grant
Gas reaction system and semiconductor processing apparatus
- Patent number 7,413,611
- Issue date Aug 19, 2008
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sheet-fed treating device
- Patent number 7,232,502
- Issue date Jun 19, 2007
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SHOWER HEAD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20230052858
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTRODE STRUCTURE
- Publication number 20220084798
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20210301398
- Publication date Sep 30, 2021
- Tokyo Electron Limited
- Hachishiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210233750
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20210142989
- Publication date May 13, 2021
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SHOWER HEAD
- Publication number 20210079526
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEALING STRUCTURE, VACUUM PROCESSING APPARATUS AND SEALING METHOD
- Publication number 20210005482
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE MOUNTING MECHANISM AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20170133245
- Publication date May 11, 2017
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130264014
- Publication date Oct 10, 2013
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120111501
- Publication date May 10, 2012
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120103523
- Publication date May 3, 2012
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING GAS SUPPLY STRUCTURE THE...
- Publication number 20120090783
- Publication date Apr 19, 2012
- TOKYO ELECTRON LIMITED
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING GAS SUPPLY STRUCTURE THE...
- Publication number 20110291568
- Publication date Dec 1, 2011
- TOKYO ELECTRON LIMTED
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110284165
- Publication date Nov 24, 2011
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SHOWER HEAD
- Publication number 20110214814
- Publication date Sep 8, 2011
- TOKYO ELECTRON LIMITED
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110132542
- Publication date Jun 9, 2011
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110094995
- Publication date Apr 28, 2011
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SHOWER HEAD
- Publication number 20110067815
- Publication date Mar 24, 2011
- TOKYO ELECTRON LIMITED
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110061813
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20100307686
- Publication date Dec 9, 2010
- TOKYO ELECTRON LIMITED
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD AND PLASMA PROCESSING APPARATUS HAVING SAME
- Publication number 20100230051
- Publication date Sep 16, 2010
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD AND PLASMA PROCESSING APPARATUS HAVING SAME
- Publication number 20100230052
- Publication date Sep 16, 2010
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING UNIT
- Publication number 20090314435
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BAFFLE PLATE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20090314432
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PLACING TABLE
- Publication number 20090266300
- Publication date Oct 29, 2009
- TOKYO ELECTRON LIMITED
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COUPLING MEMBER AND PLASMA PROCESSING APPARATUS
- Publication number 20090245971
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Hachishiro Iizuka
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
SHOWER HEAD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20090236041
- Publication date Sep 24, 2009
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWER HEAD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20090229754
- Publication date Sep 17, 2009
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATING APPARATUS AND TREATING GAS EMITTING MECHANISM
- Publication number 20090038548
- Publication date Feb 12, 2009
- Tokyo Electron Limited
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SHOWER HEAD
- Publication number 20090000743
- Publication date Jan 1, 2009
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS

Hachishiro Iizuka

Person

Patents Grantslast 30 patents

Upper electrode and plasma processing apparatus

Sealing structure, vacuum processing apparatus and sealing method

Film forming apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and processing gas supply structure the...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and shower head

Film forming apparatus and vaporizer

Shower head and plasma processing apparatus having same

Plasma processing apparatus and shower head

Plasma processing apparatus and processing gas supply structure the...

Plasma processing apparatus and plasma processing method

Shower head and substrate processing apparatus

Shower head and plasma processing apparatus having same

Shower head and substrate processing apparatus

Gas supply mechanism and substrate processing apparatus

Baffle plate and substrate processing apparatus

Coupling member and plasma processing apparatus

Plasma processing apparatus

Vaporizer and semiconductor processing apparatus

Plasma processing apparatus and substrate mounting table employed t...

Middle plate for the shower head

Gas reaction system and semiconductor processing apparatus

Sheet-fed treating device

Patents Applicationslast 30 patents

SHOWER HEAD AND SUBSTRATE PROCESSING DEVICE

PLASMA PROCESSING APPARATUS AND ELECTRODE STRUCTURE

FILM FORMING APPARATUS

PLASMA PROCESSING APPARATUS

UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SHOWER HEAD

SEALING STRUCTURE, VACUUM PROCESSING APPARATUS AND SEALING METHOD

SUBSTRATE MOUNTING MECHANISM AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PROCESSING GAS SUPPLY STRUCTURE THE...

PLASMA PROCESSING APPARATUS AND PROCESSING GAS SUPPLY STRUCTURE THE...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND SHOWER HEAD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND SHOWER HEAD

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SHOWER HEAD AND PLASMA PROCESSING APPARATUS HAVING SAME

SHOWER HEAD AND PLASMA PROCESSING APPARATUS HAVING SAME

PLASMA PROCESSING UNIT

BAFFLE PLATE AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PLACING TABLE

COUPLING MEMBER AND PLASMA PROCESSING APPARATUS

SHOWER HEAD AND SUBSTRATE PROCESSING APPARATUS

SHOWER HEAD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS AND TREATING GAS EMITTING MECHANISM

SUBSTRATE PROCESSING APPARATUS AND SHOWER HEAD