Hai Deng

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and compositions for reducing line wide roughness
- Patent number 7,867,687
- Issue date Jan 11, 2011
- Intel Corporation
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Zeolite—sol gel nano-composite low k dielectric
- Patent number 7,674,390
- Issue date Mar 9, 2010
- Intel Corporation
- Hai Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion liquids with siloxane polymer for immersion lithography
- Patent number 7,391,501
- Issue date Jun 24, 2008
- Intel Corporation
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Zeolite-carbon doped oxide composite low k dielectric
- Patent number 7,303,985
- Issue date Dec 4, 2007
- Intel Corporation
- Hai Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wash composition with polymeric surfactant
- Patent number 7,214,474
- Issue date May 8, 2007
- Intel Corporation
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Langmuir-blodgett chemically amplified photoresist
- Patent number 6,864,192
- Issue date Mar 8, 2005
- Intel Corporation
- Huey-Chiang Liou
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ZEOLITE - CARBON DOPED OXIDE COMPOSITE LOW K DIELECTRIC
- Publication number 20080220213
- Publication date Sep 11, 2008
- Hai Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wash composition with polymeric surfactant
- Publication number 20050287478
- Publication date Dec 29, 2005
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion liquids for immersion lithography
- Publication number 20050164502
- Publication date Jul 28, 2005
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Zeolite-carbon doped oxide composite low k dielectric
- Publication number 20050107242
- Publication date May 19, 2005
- Hai Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Zeolite - sol gel nano-composite low k dielectric
- Publication number 20050103744
- Publication date May 19, 2005
- Hai Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and compositions for reducing line wide roughness
- Publication number 20050084793
- Publication date Apr 21, 2005
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Removing contaminations due to polymer aggregation in photoresist
- Publication number 20040266014
- Publication date Dec 30, 2004
- Hok-Kin Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Methods and compositions for reducing line wide roughness

Zeolite—sol gel nano-composite low k dielectric

Immersion liquids with siloxane polymer for immersion lithography

Zeolite-carbon doped oxide composite low k dielectric

Wash composition with polymeric surfactant

Langmuir-blodgett chemically amplified photoresist

Patents Applicationslast 30 patents

ZEOLITE - CARBON DOPED OXIDE COMPOSITE LOW K DIELECTRIC

Wash composition with polymeric surfactant

Immersion liquids for immersion lithography

Zeolite-carbon doped oxide composite low k dielectric

Zeolite - sol gel nano-composite low k dielectric

Methods and compositions for reducing line wide roughness

Removing contaminations due to polymer aggregation in photoresist