Haiqing Wei

Person

Hubei, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for pixelating vector graphic into image
- Patent number 12,112,409
- Issue date Oct 8, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Light source calibration method and system employed in source mask...
- Patent number 12,050,407
- Issue date Jul 30, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for correcting lithography process hotspots based...
- Patent number 11,687,697
- Issue date Jun 27, 2023
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL IMAGING METHOD, DEVICE AND SYSTEM FOR PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240126179
- Publication date Apr 18, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR PIXELATING VECTOR GRAPHIC INTO IMAGE
- Publication number 20240095980
- Publication date Mar 21, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LIGHT SOURCE CALIBRATION METHOD AND SYSTEM EMPLOYED IN SOURCE MASK...
- Publication number 20240085801
- Publication date Mar 14, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHIC MASK OPTIMIZATION METHOD AND SYSTEM WITHOUT BORDE...
- Publication number 20240069432
- Publication date Feb 29, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR MODELING, CALIBRATION, AND SIMULATION OF MULT...
- Publication number 20240046006
- Publication date Feb 8, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR CORRECTING LITHOGRAPHY PROCESS HOTSPOTS BASED...
- Publication number 20230046115
- Publication date Feb 16, 2023
- HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Haiqing Wei

Person

Patents Grantslast 30 patents

Method and system for pixelating vector graphic into image

Light source calibration method and system employed in source mask...

Method and system for correcting lithography process hotspots based...

Patents Applicationslast 30 patents

OPTICAL IMAGING METHOD, DEVICE AND SYSTEM FOR PHOTOLITHOGRAPHY SYSTEM

METHOD AND SYSTEM FOR PIXELATING VECTOR GRAPHIC INTO IMAGE

LIGHT SOURCE CALIBRATION METHOD AND SYSTEM EMPLOYED IN SOURCE MASK...

PHOTOLITHOGRAPHIC MASK OPTIMIZATION METHOD AND SYSTEM WITHOUT BORDE...

METHOD AND SYSTEM FOR MODELING, CALIBRATION, AND SIMULATION OF MULT...

METHOD AND SYSTEM FOR CORRECTING LITHOGRAPHY PROCESS HOTSPOTS BASED...