Haiying Fu

Person

Camas, WA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Enhancement of electrolyte hydrodynamics for efficient mass transfe...
- Patent number 10,662,545
- Issue date May 26, 2020
- Novellus Systems, Inc.
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
TSV bath evaluation using field versus feature contrast
- Patent number 10,508,359
- Issue date Dec 17, 2019
- Lam Research Corporation
- Lee Brogan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Enhancement of electrolyte hydrodynamics for efficient mass transfe...
- Patent number 9,834,852
- Issue date Dec 5, 2017
- Novellus Systems, Inc.
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Detection of plating on wafer holding apparatus
- Patent number 9,746,427
- Issue date Aug 29, 2017
- Novellus Systems, Inc.
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
TSV bath evaluation using field versus feature contrast
- Patent number 9,689,083
- Issue date Jun 27, 2017
- Lam Research Corporation
- Lee Brogan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Enhancement of electrolyte hydrodynamics for efficient mass transfe...
- Patent number 9,523,155
- Issue date Dec 20, 2016
- Novellus Systems, Inc.
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method to improve mechanical strength of low-K dielectric film usin...
- Patent number 8,715,788
- Issue date May 6, 2014
- Novellus Systems, Inc.
- Ananda K. Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High compressive stress carbon liners for MOS devices
- Patent number 8,362,571
- Issue date Jan 29, 2013
- Novellus Systems, Inc.
- Qingguo Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve mechanical strength of low-K dielectric film usin...
- Patent number 8,043,667
- Issue date Oct 25, 2011
- Novellus Systems, Inc.
- Ananda K. Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-K SiC copper diffusion barrier films
- Patent number 7,968,436
- Issue date Jun 28, 2011
- Novellus Systems, Inc.
- Yongsik Yu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for producing low stress porous and CDO low-K dielectric ma...
- Patent number 7,923,385
- Issue date Apr 12, 2011
- Novellus Systems, Inc.
- Qingguo Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High compressive stress carbon liners for MOS devices
- Patent number 7,906,817
- Issue date Mar 15, 2011
- Novellus Systems, Inc.
- Qingguo Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing low stress porous low-k dielectric materials...
- Patent number 7,799,705
- Issue date Sep 21, 2010
- Novellus Systems, Inc.
- Qingguo Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing low-k carbon doped oxide films with low resid...
- Patent number 7,781,351
- Issue date Aug 24, 2010
- Novellus Systems, Inc.
- Qingguo Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing low-K CDO films
- Patent number 7,737,525
- Issue date Jun 15, 2010
- Novellus Systems, Inc.
- Qingguo Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve mechanical strength of low-K dielectric film usin...
- Patent number 7,611,757
- Issue date Nov 3, 2009
- Novellus Systems, Inc.
- Ananda K. Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-k SiC copper diffusion barrier films
- Patent number 7,573,061
- Issue date Aug 11, 2009
- Novellus Systems, Inc.
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing low stress porous low-k dielectric materials...
- Patent number 7,473,653
- Issue date Jan 6, 2009
- Novellus Systems, Inc.
- Qingguo Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing low-k CDO films with low residual stress
- Patent number 7,390,537
- Issue date Jun 24, 2008
- Novellus Systems, Inc.
- Qingguo Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for improving the cracking resistance of low-k dielectric m...
- Patent number 7,381,662
- Issue date Jun 3, 2008
- Novellus Systems, Inc.
- Dong Niu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for producing low-k CDO films
- Patent number 7,341,761
- Issue date Mar 11, 2008
- Novellus Systems, Inc.
- Qingguo Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for improving integration performance of low stress CDO films
- Patent number 7,326,444
- Issue date Feb 5, 2008
- Novellus Systems, Inc.
- Qingguo Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-k SiC copper diffusion barrier films
- Patent number 7,282,438
- Issue date Oct 16, 2007
- Novellus Systems, Inc.
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve mechanical strength of low-k dielectric film usin...
- Patent number 7,253,125
- Issue date Aug 7, 2007
- Novellus Systems, Inc.
- Ananda K. Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing low stress porous low-k dielectric materials...
- Patent number 7,241,704
- Issue date Jul 10, 2007
- Novellus Systems, Inc.
- Qingguo Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of porogen removal from porous low-k films using UV radiation
- Patent number 7,208,389
- Issue date Apr 24, 2007
- Novellus Systems, Inc.
- Adrianne K. Tipton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for improving the cracking resistance of low-k dielectric m...
- Patent number 7,094,713
- Issue date Aug 22, 2006
- Novellus Systems, Inc.
- Dong Niu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon carbide having low dielectric constant
- Patent number 6,855,645
- Issue date Feb 15, 2005
- Novellus Systems, Inc.
- Xingyuan Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hermetic silicon carbide
- Patent number 6,777,349
- Issue date Aug 17, 2004
- Novellus Systems, Inc.
- Haiying Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods to retard copper diffusion and improve film adh...
- Patent number 6,764,952
- Issue date Jul 20, 2004
- Novellus Systems, Inc.
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ENHANCEMENT OF ELECTROLYTE HYDRODYNAMICS FOR EFFICIENT MASS TRANSFE...
- Publication number 20180105949
- Publication date Apr 19, 2018
- Novellus Systems, Inc.
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
TSV BATH EVALUATION USING FIELD VERSUS FEATURE CONTRAST
- Publication number 20170241041
- Publication date Aug 24, 2017
- LAM RESEARCH CORPORATION
- Lee Brogan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ENHANCEMENT OF ELECTROLYTE HYDRODYNAMICS FOR EFFICIENT MASS TRANSFE...
- Publication number 20170029973
- Publication date Feb 2, 2017
- Novellus Systems, Inc.
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
TSV BATH EVALUATION USING FIELD VERSUS FEATURE CONTRAST
- Publication number 20140367279
- Publication date Dec 18, 2014
- LAM RESEARCH CORPORATION
- Lee Brogan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
DETECTION OF PLATING ON WAFER HOLDING APPARATUS
- Publication number 20140230855
- Publication date Aug 21, 2014
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ENHANCEMENT OF ELECTROLYTE HYDRODYNAMICS FOR EFFICIENT MASS TRANSFE...
- Publication number 20140183049
- Publication date Jul 3, 2014
- Novellus Systems, Inc.
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING APPARATUSES AND METHODS EMPLOYING LIQUID PARTICLE CO...
- Publication number 20140001050
- Publication date Jan 2, 2014
- Ludan Huang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD AND APPARATUS FOR ELECTROPLATING SEMICONDUCTOR WAFER WHEN CO...
- Publication number 20130284604
- Publication date Oct 31, 2013
- Tighe A. Spurlin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHODS FOR PRODUCING LOW STRESS POROUS AND CDO LOW-K DIELECTRIC MA...
- Publication number 20090239390
- Publication date Sep 24, 2009
- Novellus Systems, Inc.
- Qingguo Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon carbide having low dielectric constant
- Publication number 20040126929
- Publication date Jul 1, 2004
- Novellus Systems, Inc.
- Xingyuan Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hermetic silicon carbide
- Publication number 20030176080
- Publication date Sep 18, 2003
- Haiying Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Enhancement of electrolyte hydrodynamics for efficient mass transfe...

TSV bath evaluation using field versus feature contrast

Enhancement of electrolyte hydrodynamics for efficient mass transfe...

Detection of plating on wafer holding apparatus

TSV bath evaluation using field versus feature contrast

Enhancement of electrolyte hydrodynamics for efficient mass transfe...

Method to improve mechanical strength of low-K dielectric film usin...

High compressive stress carbon liners for MOS devices

Method to improve mechanical strength of low-K dielectric film usin...

Low-K SiC copper diffusion barrier films

Methods for producing low stress porous and CDO low-K dielectric ma...

High compressive stress carbon liners for MOS devices

Methods for producing low stress porous low-k dielectric materials...

Methods for producing low-k carbon doped oxide films with low resid...

Method for producing low-K CDO films

Method to improve mechanical strength of low-K dielectric film usin...

Low-k SiC copper diffusion barrier films

Methods for producing low stress porous low-k dielectric materials...

Methods for producing low-k CDO films with low residual stress

Methods for improving the cracking resistance of low-k dielectric m...

Methods for producing low-k CDO films

Methods for improving integration performance of low stress CDO films

Low-k SiC copper diffusion barrier films

Method to improve mechanical strength of low-k dielectric film usin...

Methods for producing low stress porous low-k dielectric materials...

Method of porogen removal from porous low-k films using UV radiation

Methods for improving the cracking resistance of low-k dielectric m...

Silicon carbide having low dielectric constant

Hermetic silicon carbide

Systems and methods to retard copper diffusion and improve film adh...

Patents Applicationslast 30 patents

ENHANCEMENT OF ELECTROLYTE HYDRODYNAMICS FOR EFFICIENT MASS TRANSFE...

TSV BATH EVALUATION USING FIELD VERSUS FEATURE CONTRAST

ENHANCEMENT OF ELECTROLYTE HYDRODYNAMICS FOR EFFICIENT MASS TRANSFE...

TSV BATH EVALUATION USING FIELD VERSUS FEATURE CONTRAST

DETECTION OF PLATING ON WAFER HOLDING APPARATUS

ENHANCEMENT OF ELECTROLYTE HYDRODYNAMICS FOR EFFICIENT MASS TRANSFE...

ELECTROPLATING APPARATUSES AND METHODS EMPLOYING LIQUID PARTICLE CO...

METHOD AND APPARATUS FOR ELECTROPLATING SEMICONDUCTOR WAFER WHEN CO...

METHODS FOR PRODUCING LOW STRESS POROUS AND CDO LOW-K DIELECTRIC MA...

Silicon carbide having low dielectric constant

Hermetic silicon carbide