Hajime INAMI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Production method of composition for resist top coat layer, method...
- Patent number 11,340,528
- Issue date May 24, 2022
- JSR Corporation
- Sosuke Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250085629
- Publication date Mar 13, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250076760
- Publication date Mar 6, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250076762
- Publication date Mar 6, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250076761
- Publication date Mar 6, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393687
- Publication date Nov 28, 2024
- JSR Corporation
- Fuyuki EGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393688
- Publication date Nov 28, 2024
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20220342307
- Publication date Oct 27, 2022
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRODUCTION METHOD OF COMPOSITION FOR RESIST TOP COAT LAYER, METHOD...
- Publication number 20210181630
- Publication date Jun 17, 2021
- JSR Corporation
- Sosuke OSAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hajime INAMI

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition and method for forming resist...

Production method of composition for resist top coat layer, method...

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

PRODUCTION METHOD OF COMPOSITION FOR RESIST TOP COAT LAYER, METHOD...