Hajime Kakumaru

Person

Hitachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive element for preparing a phosphor pattern
- Patent number 6,416,931
- Issue date Jul 9, 2002
- Hitachi Chemical Co., Ltd.
- Takeshi Nojiri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phosphor pattern, processes for preparing the same and photosensiti...
- Patent number 6,329,111
- Issue date Dec 11, 2001
- Hitachi Chemical Company
- Takeshi Nojiri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, photosensitive film and process f...
- Patent number 6,248,501
- Issue date Jun 19, 2001
- Hitachi Chemical Co., Ltd.
- Hiroyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, photosensitive film and process f...
- Patent number 6,077,647
- Issue date Jun 20, 2000
- Hitachi Chemical Co., Ltd.
- Hiroyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, photosensitive film and process f...
- Patent number 5,858,616
- Issue date Jan 12, 1999
- Hitachi Chemical Company, Ltd.
- Hiroyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing process
- Patent number 5,700,629
- Issue date Dec 23, 1997
- Hitachi Chemical Company, Ltd.
- Hajime Kakumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative type photosensitive electrodepositing resin composition
- Patent number 5,403,698
- Issue date Apr 4, 1995
- Hitachi Chemical Company, Ltd.
- Sigeo Tachiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable composition and photopolymerizable element
- Patent number 5,334,484
- Issue date Aug 2, 1994
- Hitachi Chemical Co., Ltd.
- Yoshitaka Minami
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photopolymerizable composition and processes using acridine photoin...
- Patent number 5,089,377
- Issue date Feb 18, 1992
- Asahi Denka Kogyo K.K.
- Hajime Kakumaru
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substituted acridine derivatives and application thereof
- Patent number 5,045,433
- Issue date Sep 3, 1991
- Hitachi Chemical Co., Ltd.
- Hajime Kakumaru
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acridine compound and photopolymerizable composition using the same
- Patent number 4,985,564
- Issue date Jan 15, 1991
- Hitachi Chemical Co., Ltd.
- Hajime Kakumaru
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Aqueous alkali developable photosensitive composition and photosens...
- Patent number 4,562,142
- Issue date Dec 31, 1985
- Hitachi Chemical Company, Ltd.
- Hajime Kakumaru
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing adhesive film
- Patent number 4,312,916
- Issue date Jan 26, 1982
- Hitachi Chemical Company, Ltd.
- Hajime Kakumaru
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition
- Patent number 4,272,607
- Issue date Jun 9, 1981
- Hitachi Chemical Company, Ltd.
- Katsushige Tsukada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Phosphor pattern, processes for preparing the same and photosensiti...
- Publication number 20030090193
- Publication date May 15, 2003
- Takeshi Nojiri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phosphor pattern, processes for preparing the same and photosensiti...
- Publication number 20020018946
- Publication date Feb 14, 2002
- Takeshi Nojiri
- H01 - BASIC ELECTRIC ELEMENTS

Hajime Kakumaru

Person

Patents Grantslast 30 patents

Photosensitive element for preparing a phosphor pattern

Phosphor pattern, processes for preparing the same and photosensiti...

Photosensitive resin composition, photosensitive film and process f...

Photosensitive resin composition, photosensitive film and process f...

Photosensitive resin composition, photosensitive film and process f...

Developing process

Negative type photosensitive electrodepositing resin composition

Photopolymerizable composition and photopolymerizable element

Photopolymerizable composition and processes using acridine photoin...

Substituted acridine derivatives and application thereof

Acridine compound and photopolymerizable composition using the same

Aqueous alkali developable photosensitive composition and photosens...

Process for producing adhesive film

Photosensitive resin composition

Patents Applicationslast 30 patents

Phosphor pattern, processes for preparing the same and photosensiti...

Phosphor pattern, processes for preparing the same and photosensiti...