Hakki Ergün CEKLI

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,782,349
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of obtaining measurements, apparatus for performing a proces...
- Patent number 11,774,862
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G01 - MEASURING TESTING
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,714,357
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,592,753
- Issue date Feb 28, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,493,851
- Issue date Nov 8, 2022
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,327,407
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of adapting feed-forward parameters
- Patent number 11,300,886
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Hadi Yagubizade
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a control parameter for an apparatus utilize...
- Patent number 11,181,829
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of obtaining measurements, apparatus for performing a proces...
- Patent number 11,175,591
- Issue date Nov 16, 2021
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,156,923
- Issue date Oct 26, 2021
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maintaining a set of process fingerprints
- Patent number 11,099,485
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,086,229
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to reduce effects of nonlinear behavior
- Patent number 11,036,146
- Issue date Jun 15, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process
- Patent number 10,877,381
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and associated...
- Patent number 10,545,410
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Hakki Ergun Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device cooling system and method of thermally conditioni...
- Patent number 10,495,986
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,474,045
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device cooling apparatus
- Patent number 10,394,139
- Issue date Aug 27, 2019
- ASML Holding N.V.
- Güneş Nakiboglu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20230168591
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20220229373
- Publication date Jul 21, 2022
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OBTAINING MEASUREMENTS, APPARATUS FOR PERFORMING A PROCES...
- Publication number 20220035259
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20220011681
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20210325788
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MAINTAINING A SET OF PROCESS FINGERPRINTS
- Publication number 20210157247
- Publication date May 27, 2021
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A CONTROL PARAMETER FOR AN APPARATUS UTILIZE...
- Publication number 20210132508
- Publication date May 6, 2021
- ASML NETHERLANDS B.V.
- Cyrus Emil TABERY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20210080836
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF ADAPTING FEED-FORWARD PARAMETERS
- Publication number 20200166854
- Publication date May 28, 2020
- Hadi YAGUBIZADE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20200103761
- Publication date Apr 2, 2020
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS
- Publication number 20200019067
- Publication date Jan 16, 2020
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE COOLING APPARATUS
- Publication number 20190346777
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Günes NAKIBOGLU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OBTAINING MEASUREMENTS, APPARATUS FOR PERFORMING A PROCES...
- Publication number 20190137892
- Publication date May 9, 2019
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- G01 - MEASURING TESTING
Information Patent Application
PATTERNING DEVICE COOLING APPARATUS
- Publication number 20190121248
- Publication date Apr 25, 2019
- ASML NETHERLANDS B.V.
- Günes NAKIBOGLU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE COOLING SYSTEM AND METHOD OF THERMALLY CONDITIONI...
- Publication number 20190101837
- Publication date Apr 4, 2019
- ASML, Netherlands B.V.
- Hakki Ergün CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...
- Publication number 20190079411
- Publication date Mar 14, 2019
- ASML NETHERLANDS B.V.
- Hakki Ergun CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO REDUCE EFFECTS OF NONLINEAR BEHAVIOR
- Publication number 20180314168
- Publication date Nov 1, 2018
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G05 - CONTROLLING REGULATING
Information Patent Application
LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20180292761
- Publication date Oct 11, 2018
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hakki Ergün CEKLI

Person

Patents Grantslast 30 patents

Methods of determining corrections for a patterning process, device...

Method of obtaining measurements, apparatus for performing a proces...

Method to predict yield of a device manufacturing process

Methods of determining corrections for a patterning process, device...

Lithographic method and lithographic apparatus

Methods of determining corrections for a patterning process, device...

Method of adapting feed-forward parameters

Method for determining a control parameter for an apparatus utilize...

Method of obtaining measurements, apparatus for performing a proces...

Lithographic method and lithographic apparatus

Maintaining a set of process fingerprints

Method to predict yield of a device manufacturing process

Method and apparatus to reduce effects of nonlinear behavior

Lithographic method

Methods of determining corrections for a patterning process

Lithographic apparatus, device manufacturing method and associated...

Lithographic method

Patterning device cooling system and method of thermally conditioni...

Lithographic apparatus and device manufacturing method

Patterning device cooling apparatus

Patents Applicationslast 30 patents

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHOD OF OBTAINING MEASUREMENTS, APPARATUS FOR PERFORMING A PROCES...

LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

MAINTAINING A SET OF PROCESS FINGERPRINTS

METHOD FOR DETERMINING A CONTROL PARAMETER FOR AN APPARATUS UTILIZE...

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHOD OF ADAPTING FEED-FORWARD PARAMETERS

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

LITHOGRAPHIC METHOD

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS

PATTERNING DEVICE COOLING APPARATUS

METHOD OF OBTAINING MEASUREMENTS, APPARATUS FOR PERFORMING A PROCES...

PATTERNING DEVICE COOLING APPARATUS

PATTERNING DEVICE COOLING SYSTEM AND METHOD OF THERMALLY CONDITIONI...

LITHOGRAPHIC METHOD

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...

METHOD AND APPARATUS TO REDUCE EFFECTS OF NONLINEAR BEHAVIOR

LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS