Hako Botma

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Actuation mechanism, optical apparatus, lithography apparatus and m...
- Patent number 9,785,051
- Issue date Oct 10, 2017
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,576,373
- Issue date Nov 5, 2013
- ASML Netherlands B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pulse modifier, lithographic apparatus and device manufacturing method
- Patent number 8,030,628
- Issue date Oct 4, 2011
- ASML Netherlands B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electromagnetic radiation pulse duration control apparatus and method
- Patent number 7,715,101
- Issue date May 11, 2010
- ASML Netherlands B.V.
- Hako Botma
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, beam delivery systems, prisms and device ma...
- Patent number 7,507,976
- Issue date Mar 24, 2009
- ASML Netherlands B.V.
- Hako Botma
- G02 - OPTICS
Information Patent Grant
Pulse modifier, lithographic apparatus, and device manufacturing me...
- Patent number 7,432,517
- Issue date Oct 7, 2008
- ASML Netherlands B.V.
- Hako Botma
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,400,381
- Issue date Jul 15, 2008
- ASML Netherlands B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,375,353
- Issue date May 20, 2008
- ASML Netherlands B.V.
- Hendrik Antony Johannes Neerhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,333,178
- Issue date Feb 19, 2008
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam modifying device, lithographic projection apparatus, method of...
- Patent number 7,326,948
- Issue date Feb 5, 2008
- ASML Netherlands B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, illumination system, and optical element fo...
- Patent number 7,312,850
- Issue date Dec 25, 2007
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,148,952
- Issue date Dec 12, 2006
- ASML Netherlands B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, mirror element, device manufacturing method...
- Patent number 7,130,023
- Issue date Oct 31, 2006
- ASML Netherlands B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination assembly, method for providing a radiation beam, litho...
- Patent number 7,116,400
- Issue date Oct 3, 2006
- ASML Netherlands B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical attenuator device, radiation system and lithographic appara...
- Patent number 7,030,958
- Issue date Apr 18, 2006
- ASML Netherlands B.V.
- Cornelis Petrus Andreas Marie Luijkx
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 6,924,885
- Issue date Aug 2, 2005
- ASML Netherlands B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION SYSTEM
- Publication number 20180031982
- Publication date Feb 1, 2018
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G02 - OPTICS
Information Patent Application
ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND M...
- Publication number 20150277233
- Publication date Oct 1, 2015
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus Van Schoot
- G01 - MEASURING TESTING
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20110149255
- Publication date Jun 23, 2011
- ASML NETHERLANDS B.V.
- Hako BOTMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pulse Modifier, Lithographic Apparatus and Device Manufacturing Method
- Publication number 20090159819
- Publication date Jun 25, 2009
- ASML NETHERLANDS B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electromagnetic Radiation Pulse Duration Control Apparatus and Method
- Publication number 20090080085
- Publication date Mar 26, 2009
- ASML NETHERLANDS B.V.
- Hako Botma
- G02 - OPTICS
Information Patent Application
Lithographic apparatus, beam delivery systems, prisms and device ma...
- Publication number 20080067424
- Publication date Mar 20, 2008
- ASML NETHERLANDS B.V.
- Hako Botma
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070170376
- Publication date Jul 26, 2007
- ASML NETHERLANDS B.V.
- Hendrik Antony Johannes Neerhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam modifying device, lithographic projection apparatus, method of...
- Publication number 20070090278
- Publication date Apr 26, 2007
- ASML NETHERLANDS B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070057201
- Publication date Mar 15, 2007
- ASML NETHERLANDS B.V.
- Hendrik Antony Johannes Neerhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pulse modifier, lithographic apparatus, and device manufacturing me...
- Publication number 20060126681
- Publication date Jun 15, 2006
- ASML NETHERLANDS B.V.
- Hako Botma
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050270513
- Publication date Dec 8, 2005
- ASML NETHERLANDS B.V.
- Marcel Mathijs Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination assembly, method for providing a radiation beam, litho...
- Publication number 20050270510
- Publication date Dec 8, 2005
- ASML NETHERLANDS B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050264784
- Publication date Dec 1, 2005
- ASML NETHERLANDS B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, illumination system, and optical element fo...
- Publication number 20050219494
- Publication date Oct 6, 2005
- ASML NETHERLANDS B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050146702
- Publication date Jul 7, 2005
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical attenuator device, radiation system and lithographic appara...
- Publication number 20050140957
- Publication date Jun 30, 2005
- ASML NETHERLANDS B.V.
- Cornelis Petrus Andreas Marie Luijkx
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20040165168
- Publication date Aug 26, 2004
- ASML NETHERLANDS B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, mirror element, device manufacturing method...
- Publication number 20040150807
- Publication date Aug 5, 2004
- ASML NETHERLANDS B.V.
- Hako Botma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Actuation mechanism, optical apparatus, lithography apparatus and m...

Lithographic apparatus and method

Pulse modifier, lithographic apparatus and device manufacturing method

Electromagnetic radiation pulse duration control apparatus and method

Lithographic apparatus, beam delivery systems, prisms and device ma...

Pulse modifier, lithographic apparatus, and device manufacturing me...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Beam modifying device, lithographic projection apparatus, method of...

Lithographic apparatus, illumination system, and optical element fo...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, mirror element, device manufacturing method...

Illumination assembly, method for providing a radiation beam, litho...

Optical attenuator device, radiation system and lithographic appara...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

RADIATION SYSTEM

ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND M...

Lithographic Apparatus and Method

Pulse Modifier, Lithographic Apparatus and Device Manufacturing Method

Electromagnetic Radiation Pulse Duration Control Apparatus and Method

Lithographic apparatus, beam delivery systems, prisms and device ma...

Lithographic apparatus and device manufacturing method

Beam modifying device, lithographic projection apparatus, method of...

Lithographic apparatus and device manufacturing method

Pulse modifier, lithographic apparatus, and device manufacturing me...

Lithographic apparatus and device manufacturing method

Illumination assembly, method for providing a radiation beam, litho...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, illumination system, and optical element fo...

Lithographic apparatus and device manufacturing method

Optical attenuator device, radiation system and lithographic appara...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, mirror element, device manufacturing method...