Hakuba KITAGAWA

Person

Mie, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate treatment apparatus and manufacturing method of semicondu...
- Patent number 11,784,064
- Issue date Oct 10, 2023
- Kioxia Corporation
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate, method of manufacturing semiconductor devi...
- Patent number 11,616,120
- Issue date Mar 28, 2023
- Kioxia Corporation
- Fuyuma Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment device, substrate treatment method, and semicon...
- Patent number 11,342,182
- Issue date May 24, 2022
- Kioxia Corporation
- Yasuhito Yoshimizu
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,211,267
- Issue date Dec 28, 2021
- TOSHIBA MEMORY CORPORATION
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and method of manufacturing semicondu...
- Patent number 11,171,022
- Issue date Nov 9, 2021
- TOSHIBA MEMORY CORPORATION
- Hakuba Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and manufacturing method of semicondu...
- Patent number 10,879,087
- Issue date Dec 29, 2020
- TOSHIBA MEMORY CORPORATION
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus, method of manufacturing semiconducto...
- Patent number 10,804,221
- Issue date Oct 13, 2020
- TOSHIBA MEMORY CORPORATION
- Fuyuma Ito
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...
- Publication number 20240312800
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Hakuba KITAGAWA
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVI...
- Publication number 20230207616
- Publication date Jun 29, 2023
- Kioxia Corporation
- Fuyuma ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEM...
- Publication number 20220310401
- Publication date Sep 29, 2022
- KIOXIA Corporation
- Hakuba KITAGAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVI...
- Publication number 20220085153
- Publication date Mar 17, 2022
- KIOXIA Corporation
- Fuyuma ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND MANUFACTURING METHOD OF SEMICONDU...
- Publication number 20210090913
- Publication date Mar 25, 2021
- Toshiba Memory Corporation
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200211864
- Publication date Jul 2, 2020
- Toshiba Memory Corporation
- Yasuhito YOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD, AND SEMICON...
- Publication number 20200185221
- Publication date Jun 11, 2020
- Toshiba Memory Corporation
- Yasuhito YOSHIMIZU
- B08 - CLEANING
Information Patent Application
SUBSTRATE TREATMENT APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTO...
- Publication number 20200091092
- Publication date Mar 19, 2020
- Toshiba Memory Corporation
- Fuyuma Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20200066550
- Publication date Feb 27, 2020
- Toshiba Memory Corporation
- Hakuba KITAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND MANUFACTURING METHOD OF SEMICONDU...
- Publication number 20180269082
- Publication date Sep 20, 2018
- Toshiba Memory Corporation
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20180265989
- Publication date Sep 20, 2018
- Toshiba Memory Corporation
- Yasuhito YOSHIMIZU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hakuba KITAGAWA

Person

Patents Grantslast 30 patents

Substrate treatment apparatus and manufacturing method of semicondu...

Semiconductor substrate, method of manufacturing semiconductor devi...

Substrate treatment device, substrate treatment method, and semicon...

Substrate processing apparatus and substrate processing method

Substrate treatment apparatus and method of manufacturing semicondu...

Substrate treatment apparatus and manufacturing method of semicondu...

Substrate treatment apparatus, method of manufacturing semiconducto...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...

SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVI...

CHEMICAL SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEM...

SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVI...

SUBSTRATE TREATMENT APPARATUS AND MANUFACTURING METHOD OF SEMICONDU...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD, AND SEMICON...

SUBSTRATE TREATMENT APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTO...

SUBSTRATE TREATMENT APPARATUS AND METHOD OF MANUFACTURING SEMICONDU...

SUBSTRATE TREATMENT APPARATUS AND MANUFACTURING METHOD OF SEMICONDU...

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD