Halbert Chong

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,249,390
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20200249557
- Publication date Aug 6, 2020
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY