Han-Kwang NIENHUYS

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Manufacturing a reflective diffraction grating
- Patent number 12,164,125
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G02 - OPTICS
Information Patent Grant
Metrology measurement method and apparatus
- Patent number 12,140,875
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Ilse Van Weperen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation system
- Patent number 11,984,236
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G02 - OPTICS
Information Patent Grant
Contaminant detection metrology system, lithographic apparatus, and...
- Patent number 11,803,119
- Issue date Oct 31, 2023
- ASML Holding N.V.
- Michal Emanuel Pawlowski
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for determining a radiation beam intensity pro...
- Patent number 11,353,796
- Issue date Jun 7, 2022
- ASML Netherlands B.V.
- Teis Johan Coenen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Particle traps and barriers for particle suppression
- Patent number 11,175,596
- Issue date Nov 16, 2021
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Radiation source
- Patent number 11,140,765
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Rilpho Ludovicus Donker
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Particle suppression systems and methods
- Patent number 11,137,694
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Yang-Shan Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam splitting apparatus
- Patent number 11,112,618
- Issue date Sep 7, 2021
- ASML Netherlands B.V.
- Gosse Charles De Vries
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring a parameter of a lithographic process, metrolog...
- Patent number 11,099,489
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for detecting substrate surface variations
- Patent number 11,092,902
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Johannes Franciscus Martinus D'Achard Van Enschut
- G01 - MEASURING TESTING
Information Patent Grant
Measurement system, lithographic apparatus and device manufacturing...
- Patent number 11,009,800
- Issue date May 18, 2021
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensor apparatus
- Patent number 10,900,829
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G01 - MEASURING TESTING
Information Patent Grant
Optical systems, metrology apparatus and associated method
- Patent number 10,725,381
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Sietse Thijmen Van Der Post
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Suppression filter, radiation collector and radiation source for a...
- Patent number 10,678,140
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam delivery apparatus and method
- Patent number 10,580,545
- Issue date Mar 3, 2020
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Radiation system
- Patent number 10,580,546
- Issue date Mar 3, 2020
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Attenuation apparatus and method
- Patent number 10,495,976
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensor apparatus
- Patent number 10,422,691
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflector
- Patent number 10,216,101
- Issue date Feb 26, 2019
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation beam apparatus
- Patent number 10,168,621
- Issue date Jan 1, 2019
- ASML Netherlands B.V.
- Jeroen Dekkers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undulator
- Patent number 9,952,513
- Issue date Apr 24, 2018
- ASML Netherlands B.V.
- Andrey Alexandrovich Nikipelov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Component for a radiation source, associated radiation source and l...
- Patent number 9,846,365
- Issue date Dec 19, 2017
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 9,823,572
- Issue date Nov 21, 2017
- ASML Netherlands B.V.
- Andrey Alexandrovich Nikipelov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method of manufacturing a device
- Patent number 9,606,445
- Issue date Mar 28, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 9,513,566
- Issue date Dec 6, 2016
- ASML Netherlands B.V.
- Kursat Bal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and component with repeating structure havin...
- Patent number 8,970,818
- Issue date Mar 3, 2015
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,917,380
- Issue date Dec 23, 2014
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,797,504
- Issue date Aug 5, 2014
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,730,448
- Issue date May 20, 2014
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY MEASUREMENT METHOD AND APPARATUS
- Publication number 20240255279
- Publication date Aug 1, 2024
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G01 - MEASURING TESTING
Information Patent Application
ASSEMBLY FOR SEPARATING RADIATION IN THE FAR FIELD
- Publication number 20240168392
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CONTAMINANT DETECTION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND...
- Publication number 20230106481
- Publication date Apr 6, 2023
- ASML Holding N.V.
- Michal Emanuel PAWLOWSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY MEASUREMENT METHOD AND APPARATUS
- Publication number 20230100123
- Publication date Mar 30, 2023
- ASML NETHERLANDS B.V.
- Ilse VAN WEPEREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED...
- Publication number 20230040124
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING A REFLECTIVE DIFFRACTION GRATING
- Publication number 20220221629
- Publication date Jul 14, 2022
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G02 - OPTICS
Information Patent Application
PARTICLE SUPPRESSION SYSTEMS AND METHODS
- Publication number 20210173315
- Publication date Jun 10, 2021
- ASML NETHERLANDS B.V.
- Yang-Shan HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING...
- Publication number 20200379360
- Publication date Dec 3, 2020
- ASML NETHERLANDS B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation Source
- Publication number 20200296817
- Publication date Sep 17, 2020
- ASML NETHERLANDS B.V.
- Rilpho Ludovicus DONKER
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Particle Traps and Barriers for Particle Suppression
- Publication number 20200225591
- Publication date Jul 16, 2020
- ASML Netherlands B,V.
- Han-Kwang NIENHUYS
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method of Measuring a Parameter of a Lithographic Process, Metrolog...
- Publication number 20200192231
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G01 - MEASURING TESTING
Information Patent Application
RADIATION SYSTEM
- Publication number 20200152345
- Publication date May 14, 2020
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Detecting Substrate Surface Variations
- Publication number 20200124977
- Publication date Apr 23, 2020
- ASML Netherlands B.V.
- Johannes Franciscus Martinus D'ACHARD VAN ENSCHUT
- G01 - MEASURING TESTING
Information Patent Application
Method and Apparatus for Determining a Radiation Beam Intensity Pro...
- Publication number 20200098486
- Publication date Mar 26, 2020
- ASML NETHERLANDS B.V.
- Teis Johan COENEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SENSOR APPARATUS
- Publication number 20190353521
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Systems, Metrology Apparatus and Associated Method
- Publication number 20190072853
- Publication date Mar 7, 2019
- ASML NETHERLANDS B.V.
- Sietse Thijmen VAN DER POST
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Methods and Apparatus for Determining the Position of a Spot of Rad...
- Publication number 20190049861
- Publication date Feb 14, 2019
- ASML NETHERLANDS B.V.
- Peter Danny VAN VOORST
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RADIATION BEAM APPARATUS
- Publication number 20180314164
- Publication date Nov 1, 2018
- ASML NETHERLANDS B.V.
- Jeroen DEKKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam splitting apparatus
- Publication number 20180252930
- Publication date Sep 6, 2018
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPRESSION FILTER, RADIATION COLLECTOR AND RADIATION SOURCE FOR A...
- Publication number 20180246414
- Publication date Aug 30, 2018
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Attenuation Apparatus and Method
- Publication number 20180239259
- Publication date Aug 23, 2018
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G02 - OPTICS
Information Patent Application
REFLECTOR
- Publication number 20180239252
- Publication date Aug 23, 2018
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20180081278
- Publication date Mar 22, 2018
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- G01 - MEASURING TESTING
Information Patent Application
RADIATION SENSOR APPARATUS
- Publication number 20180058928
- Publication date Mar 1, 2018
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G01 - MEASURING TESTING
Information Patent Application
RADIATION SYSTEM
- Publication number 20180031982
- Publication date Feb 1, 2018
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G02 - OPTICS
Information Patent Application
AN UNDULATOR
- Publication number 20170184975
- Publication date Jun 29, 2017
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Component for a Radiation Source, Associated Radiation Source and L...
- Publication number 20160377985
- Publication date Dec 29, 2016
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEAM DELIVERY APPARATUS AND METHOD
- Publication number 20160225477
- Publication date Aug 4, 2016
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20160147161
- Publication date May 26, 2016
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate Support for a Lithographic Apparatus and Lithographic App...
- Publication number 20150331338
- Publication date Nov 19, 2015
- ASML NETHERLANDS B.V.
- Erik Johan ARLEMARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Han-Kwang NIENHUYS

Person

Patents Grantslast 30 patents

Manufacturing a reflective diffraction grating

Metrology measurement method and apparatus

Radiation system

Contaminant detection metrology system, lithographic apparatus, and...

Method and apparatus for determining a radiation beam intensity pro...

Particle traps and barriers for particle suppression

Radiation source

Particle suppression systems and methods

Beam splitting apparatus

Method of measuring a parameter of a lithographic process, metrolog...

Method and apparatus for detecting substrate surface variations

Measurement system, lithographic apparatus and device manufacturing...

Radiation sensor apparatus

Optical systems, metrology apparatus and associated method

Suppression filter, radiation collector and radiation source for a...

Beam delivery apparatus and method

Radiation system

Attenuation apparatus and method

Radiation sensor apparatus

Reflector

Radiation beam apparatus

Undulator

Component for a radiation source, associated radiation source and l...

Lithographic method

Lithographic apparatus and method of manufacturing a device

Lithographic apparatus

Lithographic apparatus and component with repeating structure havin...

Lithographic apparatus and method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

METROLOGY MEASUREMENT METHOD AND APPARATUS

ASSEMBLY FOR SEPARATING RADIATION IN THE FAR FIELD

CONTAMINANT DETECTION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND...

METROLOGY MEASUREMENT METHOD AND APPARATUS

METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED...

MANUFACTURING A REFLECTIVE DIFFRACTION GRATING

PARTICLE SUPPRESSION SYSTEMS AND METHODS

MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING...

Radiation Source

Particle Traps and Barriers for Particle Suppression

Method of Measuring a Parameter of a Lithographic Process, Metrolog...

RADIATION SYSTEM

Method and Apparatus for Detecting Substrate Surface Variations

Method and Apparatus for Determining a Radiation Beam Intensity Pro...

RADIATION SENSOR APPARATUS

Optical Systems, Metrology Apparatus and Associated Method

Methods and Apparatus for Determining the Position of a Spot of Rad...

RADIATION BEAM APPARATUS

Beam splitting apparatus

SUPPRESSION FILTER, RADIATION COLLECTOR AND RADIATION SOURCE FOR A...

Attenuation Apparatus and Method

REFLECTOR

LITHOGRAPHIC METHOD

RADIATION SENSOR APPARATUS

RADIATION SYSTEM

AN UNDULATOR

Component for a Radiation Source, Associated Radiation Source and L...

BEAM DELIVERY APPARATUS AND METHOD

LITHOGRAPHIC METHOD

Substrate Support for a Lithographic Apparatus and Lithographic App...