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Han-Kwang NIENHUYS

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  • Veldhoven, NL
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    CONTAMINANT DETECTION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND...
    • Publication number 20230106481
    • Publication date Apr 6, 2023
    • ASML Holding N.V.
    • Michal Emanuel PAWLOWSKI
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    METROLOGY MEASUREMENT METHOD AND APPARATUS
    • Publication number 20230100123
    • Publication date Mar 30, 2023
    • ASML NETHERLANDS B.V.
    • Ilse VAN WEPEREN
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED...
    • Publication number 20230040124
    • Publication date Feb 9, 2023
    • ASML NETHERLANDS B.V.
    • Han-Kwang NIENHUYS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    MANUFACTURING A REFLECTIVE DIFFRACTION GRATING
    • Publication number 20220221629
    • Publication date Jul 14, 2022
    • ASML NETHERLANDS B.V.
    • Han-Kwang NIENHUYS
    • G02 - OPTICS
  • Information Patent Application

    PARTICLE SUPPRESSION SYSTEMS AND METHODS
    • Publication number 20210173315
    • Publication date Jun 10, 2021
    • ASML NETHERLANDS B.V.
    • Yang-Shan HUANG
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING...
    • Publication number 20200379360
    • Publication date Dec 3, 2020
    • ASML NETHERLANDS B.V.
    • Han-Kwang Nienhuys
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Radiation Source
    • Publication number 20200296817
    • Publication date Sep 17, 2020
    • ASML NETHERLANDS B.V.
    • Rilpho Ludovicus DONKER
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    Particle Traps and Barriers for Particle Suppression
    • Publication number 20200225591
    • Publication date Jul 16, 2020
    • ASML Netherlands B,V.
    • Han-Kwang NIENHUYS
    • B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • Information Patent Application

    Method of Measuring a Parameter of a Lithographic Process, Metrolog...
    • Publication number 20200192231
    • Publication date Jun 18, 2020
    • ASML NETHERLANDS B.V.
    • Hugo Augustinus Joseph CRAMER
    • G01 - MEASURING TESTING
  • Information Patent Application

    RADIATION SYSTEM
    • Publication number 20200152345
    • Publication date May 14, 2020
    • ASML NETHERLANDS B.V.
    • Han-Kwang NIENHUYS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Method and Apparatus for Detecting Substrate Surface Variations
    • Publication number 20200124977
    • Publication date Apr 23, 2020
    • ASML Netherlands B.V.
    • Johannes Franciscus Martinus D'ACHARD VAN ENSCHUT
    • G01 - MEASURING TESTING
  • Information Patent Application

    Method and Apparatus for Determining a Radiation Beam Intensity Pro...
    • Publication number 20200098486
    • Publication date Mar 26, 2020
    • ASML NETHERLANDS B.V.
    • Teis Johan COENEN
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RADIATION SENSOR APPARATUS
    • Publication number 20190353521
    • Publication date Nov 21, 2019
    • ASML NETHERLANDS B.V.
    • Vadim Yevgenyevich BANINE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Optical Systems, Metrology Apparatus and Associated Method
    • Publication number 20190072853
    • Publication date Mar 7, 2019
    • ASML NETHERLANDS B.V.
    • Sietse Thijmen VAN DER POST
    • G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
  • Information Patent Application

    Methods and Apparatus for Determining the Position of a Spot of Rad...
    • Publication number 20190049861
    • Publication date Feb 14, 2019
    • ASML NETHERLANDS B.V.
    • Peter Danny VAN VOORST
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Application

    RADIATION BEAM APPARATUS
    • Publication number 20180314164
    • Publication date Nov 1, 2018
    • ASML NETHERLANDS B.V.
    • Jeroen DEKKERS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Beam splitting apparatus
    • Publication number 20180252930
    • Publication date Sep 6, 2018
    • ASML NETHERLANDS B.V.
    • Gosse Charles DE VRIES
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SUPPRESSION FILTER, RADIATION COLLECTOR AND RADIATION SOURCE FOR A...
    • Publication number 20180246414
    • Publication date Aug 30, 2018
    • ASML NETHERLANDS B.V.
    • Vadim Yevgenyevich BANINE
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    Attenuation Apparatus and Method
    • Publication number 20180239259
    • Publication date Aug 23, 2018
    • ASML NETHERLANDS B.V.
    • Han-Kwang NIENHUYS
    • G02 - OPTICS
  • Information Patent Application

    REFLECTOR
    • Publication number 20180239252
    • Publication date Aug 23, 2018
    • ASML NETHERLANDS B.V.
    • Han-Kwang NIENHUYS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    LITHOGRAPHIC METHOD
    • Publication number 20180081278
    • Publication date Mar 22, 2018
    • ASML NETHERLANDS B.V.
    • Andrey Alexandrovich NIKIPELOV
    • G01 - MEASURING TESTING
  • Information Patent Application

    RADIATION SENSOR APPARATUS
    • Publication number 20180058928
    • Publication date Mar 1, 2018
    • ASML NETHERLANDS B.V.
    • Vadim Yevgenyevich BANINE
    • G01 - MEASURING TESTING
  • Information Patent Application

    RADIATION SYSTEM
    • Publication number 20180031982
    • Publication date Feb 1, 2018
    • ASML NETHERLANDS B.V.
    • Han-Kwang NIENHUYS
    • G02 - OPTICS
  • Information Patent Application

    AN UNDULATOR
    • Publication number 20170184975
    • Publication date Jun 29, 2017
    • ASML NETHERLANDS B.V.
    • Andrey Alexandrovich NIKIPELOV
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Component for a Radiation Source, Associated Radiation Source and L...
    • Publication number 20160377985
    • Publication date Dec 29, 2016
    • ASML NETHERLANDS B.V.
    • Han-Kwang NIENHUYS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    BEAM DELIVERY APPARATUS AND METHOD
    • Publication number 20160225477
    • Publication date Aug 4, 2016
    • ASML NETHERLANDS B.V.
    • Vadim Yevgenyevich BANINE
    • G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
  • Information Patent Application

    LITHOGRAPHIC METHOD
    • Publication number 20160147161
    • Publication date May 26, 2016
    • ASML NETHERLANDS B.V.
    • Andrey Alexandrovich NIKIPELOV
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Substrate Support for a Lithographic Apparatus and Lithographic App...
    • Publication number 20150331338
    • Publication date Nov 19, 2015
    • ASML NETHERLANDS B.V.
    • Erik Johan ARLEMARK
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Lithographic Apparatus and Method of Manufacturing a Device
    • Publication number 20150192861
    • Publication date Jul 9, 2015
    • ASML NETHERLANDS B.V.
    • Vadim Yevgenyevich Banine
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Lithographic Apparatus
    • Publication number 20150049323
    • Publication date Feb 19, 2015
    • ASML NETHERLANDS B.V.
    • Kursat Bal
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY