Hanbing Wu

Person

Millbrae, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
UHV in-situ cryo-cool chamber
- Patent number 11,802,340
- Issue date Oct 31, 2023
- Applied Materials, Inc.
- Bharath Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system with multi-cathode and method of manufacture thereof
- Patent number 11,600,476
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Paste method to reduce defects in dielectric sputtering
- Patent number 11,459,651
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system with multi-cathode and method of manufacture thereof
- Patent number 11,183,375
- Issue date Nov 23, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for co-sputtering multiple targets
- Patent number 11,101,117
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process kit for multi-cathode processing chamber
- Patent number 11,043,364
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Hanbing Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for multi-cathode substrate processing
- Patent number 11,011,357
- Issue date May 18, 2021
- Applied Materials, Inc.
- Hanbing Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including top reflector above annula...
- Patent number 10,978,276
- Issue date Apr 13, 2021
- Applied Materials, Inc.
- Bharath Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma chamber target for reducing defects in workpiece during diel...
- Patent number 10,704,139
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus including annular lamp assembly
- Patent number 10,573,498
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Bharath Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for co-sputtering multiple targets
- Patent number 10,468,238
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ temperature measurement in a noisy environment
- Patent number 10,249,522
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Hanbing Wu
- G01 - MEASURING TESTING
Information Patent Grant
In-situ temperature measurement in a noisy environment
- Patent number 9,673,074
- Issue date Jun 6, 2017
- Applied Materials, Inc.
- Hanbing Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter source for semiconductor process chambers
- Patent number 9,620,339
- Issue date Apr 11, 2017
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Deposition System With Multi-Cathode And Method Of Manufacture Thereof
- Publication number 20220037136
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20200161095
- Publication date May 21, 2020
- Applied Materials, Inc.
- Bharath SWAMINATHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CO-SPUTTERING MULTIPLE TARGETS
- Publication number 20200013597
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Anantha K. SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT FOR MULTI-CATHODE PROCESSING CHAMBER
- Publication number 20180350572
- Publication date Dec 6, 2018
- Hanbing Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER TARGET FOR REDUCING DEFECTS IN WORKPIECE DURING DIEL...
- Publication number 20180291500
- Publication date Oct 11, 2018
- XIAODONG WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR MULTI-CATHODE SUBSTRATE PROCESSING
- Publication number 20180240655
- Publication date Aug 23, 2018
- HANBING WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PASTE METHOD TO REDUCE DEFECTS IN DIELECTRIC SPUTTERING
- Publication number 20180223421
- Publication date Aug 9, 2018
- XIAODONG WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20180197721
- Publication date Jul 12, 2018
- Applied Materials, Inc.
- Bharath SWAMINATHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UHV In-Situ Cryo-Cool Chamber
- Publication number 20180163306
- Publication date Jun 14, 2018
- Applied Materials, Inc.
- Bharath Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU TEMPERATURE MEASUREMENT IN A NOISY ENVIRONMENT
- Publication number 20170271182
- Publication date Sep 21, 2017
- Applied Materials, Inc.
- Hanbing WU
- G01 - MEASURING TESTING
Information Patent Application
SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS
- Publication number 20170211175
- Publication date Jul 27, 2017
- Applied Materials, Inc.
- ANANTHA K. SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CO-SPUTTERING MULTIPLE TARGETS
- Publication number 20170053784
- Publication date Feb 23, 2017
- Applied Materials, Inc.
- Anantha K. SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION SYSTEM WITH MULTI-CATHODE AND METHOD OF MANUFACTURE THEREOF
- Publication number 20150279635
- Publication date Oct 1, 2015
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS
- Publication number 20140262767
- Publication date Sep 18, 2014
- Anantha K. SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU TEMPERATURE MEASUREMENT IN A NOISY ENVIRONMENT
- Publication number 20140269826
- Publication date Sep 18, 2014
- Hanbing WU
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

UHV in-situ cryo-cool chamber

Deposition system with multi-cathode and method of manufacture thereof

Paste method to reduce defects in dielectric sputtering

Deposition system with multi-cathode and method of manufacture thereof

Methods and apparatus for co-sputtering multiple targets

Process kit for multi-cathode processing chamber

Methods and apparatus for multi-cathode substrate processing

Substrate processing apparatus including top reflector above annula...

Plasma chamber target for reducing defects in workpiece during diel...

Substrate processing apparatus including annular lamp assembly

Methods and apparatus for co-sputtering multiple targets

In-situ temperature measurement in a noisy environment

In-situ temperature measurement in a noisy environment

Sputter source for semiconductor process chambers

Patents Applicationslast 30 patents

Deposition System With Multi-Cathode And Method Of Manufacture Thereof

METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR CO-SPUTTERING MULTIPLE TARGETS

PROCESS KIT FOR MULTI-CATHODE PROCESSING CHAMBER

PLASMA CHAMBER TARGET FOR REDUCING DEFECTS IN WORKPIECE DURING DIEL...

METHODS AND APPARATUS FOR MULTI-CATHODE SUBSTRATE PROCESSING

PASTE METHOD TO REDUCE DEFECTS IN DIELECTRIC SPUTTERING

METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE

UHV In-Situ Cryo-Cool Chamber

IN-SITU TEMPERATURE MEASUREMENT IN A NOISY ENVIRONMENT

SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS

METHODS AND APPARATUS FOR CO-SPUTTERING MULTIPLE TARGETS

DEPOSITION SYSTEM WITH MULTI-CATHODE AND METHOD OF MANUFACTURE THEREOF

SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS

IN-SITU TEMPERATURE MEASUREMENT IN A NOISY ENVIRONMENT