Hang Yu

Person

Woodland, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Modified stacks for 3D NAND
- Patent number 12,195,846
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Xinhai Han
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Faceplate with localized flow control
- Patent number 12,020,907
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Arun Thottappayil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron nitride for mask patterning
- Patent number 11,935,751
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Siyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low impedance current path for edge non-uniformity tuning
- Patent number 11,929,278
- Issue date Mar 12, 2024
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mesa height modulation for thickness correction
- Patent number 11,869,795
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Saketh Pemmasani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tensile nitride deposition systems and methods
- Patent number 11,710,631
- Issue date Jul 25, 2023
- Applied Materials, Inc.
- Michael Wenyoung Tsiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for depositing high density and high tensile st...
- Patent number 11,538,677
- Issue date Dec 27, 2022
- Applied Materials, Inc.
- Chuanxi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of silicon boron nitride films
- Patent number 11,515,145
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Chuanxi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-layer deposition and treatment of silicon nitride films
- Patent number 11,276,570
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Vinayak Veer Vats
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sequential deposition and high frequency plasma treatment of deposi...
- Patent number 11,217,443
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process development visualization tool
- Patent number 11,157,661
- Issue date Oct 26, 2021
- Applied Materials, Inc.
- Vinayak Veer Vats
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Shadow ring for modifying wafer edge and bevel deposition
- Patent number 11,136,665
- Issue date Oct 5, 2021
- Applied Materials, Inc.
- Dale Du Bois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulsed plasma deposition etch step coverage improvement
- Patent number 10,950,430
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etch rate reduction of silicon nitride films
- Patent number 10,515,796
- Issue date Dec 24, 2019
- Applied Materials, Inc.
- Michael Wenyoung Tsiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shadow ring for modifying wafer edge and bevel deposition
- Patent number 10,227,695
- Issue date Mar 12, 2019
- Applied Materials, Inc.
- Dale R. Du Bois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous carbon deposition method for improved stack defectivity
- Patent number 8,349,741
- Issue date Jan 8, 2013
- Applied Materials, Inc.
- Hang Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous carbon deposition method for improved stack defectivity
- Patent number 8,227,352
- Issue date Jul 24, 2012
- Applied Materials, Inc.
- Hang Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nonplanar faceplate for a plasma processing chamber
- Patent number 8,097,082
- Issue date Jan 17, 2012
- Applied Materials, Inc.
- Jianhua Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MODIFIED STACKS FOR 3D NAND
- Publication number 20250101578
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Xinhai Han
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOPED SILICON OXIDE FOR BOTTOM-UP DEPOSITION
- Publication number 20240420949
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Woongsik Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION FOR REDUCED ROUGHNESS OF SILICON NITRIDE
- Publication number 20240332009
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Qixin Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT
- Publication number 20240304437
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Chuanxi YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY ETCH OF BORON-CONTAINING MATERIAL
- Publication number 20240249953
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Yeonju Kwak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV PHOTORESIST AND UNDERLAYER ADHESION MODULATION
- Publication number 20240184207
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Zhiyu Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-DOPED SILICON-CONTAINING MATERIALS
- Publication number 20240087882
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Siyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON MOLD FOR DRAM CAPACITOR
- Publication number 20240038833
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Fredrick Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON HARDMASK OPENING USING BORON NITRIDE MASK
- Publication number 20240014039
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Jeong Hwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHAPED SHOWERHEAD FOR EDGE PLASMA MODULATION
- Publication number 20230011938
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Saketh Pemmasani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MESA HEIGHT MODULATION FOR THICKNESS CORRECTION
- Publication number 20230008922
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Saketh Pemmasani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Forming Memory Device With Reduced Resistivity
- Publication number 20220415651
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Qixin Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON NITRIDE FOR MASK PATTERNING
- Publication number 20220384189
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Siyu Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW IMPEDANCE CURRENT PATH FOR EDGE NON-UNIFORMITY TUNING
- Publication number 20220375776
- Publication date Nov 24, 2022
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOPED SILICON NITRIDE FOR 3D NAND
- Publication number 20220216048
- Publication date Jul 7, 2022
- Applied Materials, Inc.
- Tianyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON OXIDE GAP FILL USING CAPACITIVELY COUPLED PLASMAS
- Publication number 20220157602
- Publication date May 19, 2022
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TENSILE NITRIDE DEPOSITION SYSTEMS AND METHODS
- Publication number 20220130661
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Michael Wenyoung Tsiang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF REDUCING DEFECTS IN A MULTI-LAYER PECVD TEOS OXIDE FILM
- Publication number 20220119952
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Rana Howlader
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of Silicon Boron Nitride Films
- Publication number 20220084809
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Chuanxi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITING HIGH DENSITY AND HIGH TENSILE ST...
- Publication number 20220068630
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Chuanxi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-LAYER DEPOSITION AND TREATMENT OF SILICON NITRIDE FILMS
- Publication number 20220028680
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FACEPLATE WITH LOCALIZED FLOW CONTROL
- Publication number 20210319981
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Arun Thottappayil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFIED STACKS FOR 3D NAND
- Publication number 20210040607
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Xinhai Han
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING FILMS CONTAINING SILICON BORON WITH LOW LEAKAGE...
- Publication number 20200211834
- Publication date Jul 2, 2020
- Applied Materials, Inc.
- Chuanxi YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS DEVELOPMENT VISUALIZATION TOOL
- Publication number 20200202044
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Vinayak Veer Vats
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS FOR DEPOSITING PHOSPHORUS-DOPED SILICON NITRIDE FILMS
- Publication number 20200190664
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Kesong HU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEQUENTIAL DEPOSITION AND HIGH FREQUENCY PLASMA TREATMENT OF DEPOSI...
- Publication number 20200176241
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- Vinayak Veer Vats
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSED PLASMA DEPOSITION ETCH STEP COVERAGE IMPROVEMENT
- Publication number 20190385844
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Vinayak Veer VATS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCH RATE REDUCTION OF SILICON NITRIDE FILMS
- Publication number 20190157077
- Publication date May 23, 2019
- Applied Materials, Inc.
- Michael Wenyoung TSIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHADOW RING FOR MODIFYING WAFER EDGE AND BEVEL DEPOSITION
- Publication number 20190153592
- Publication date May 23, 2019
- Applied Materials, Inc.
- Dale Du BOIS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Modified stacks for 3D NAND

Faceplate with localized flow control

Boron nitride for mask patterning

Low impedance current path for edge non-uniformity tuning

Mesa height modulation for thickness correction

Tensile nitride deposition systems and methods

Systems and methods for depositing high density and high tensile st...

Deposition of silicon boron nitride films

Multi-layer deposition and treatment of silicon nitride films

Sequential deposition and high frequency plasma treatment of deposi...

Process development visualization tool

Shadow ring for modifying wafer edge and bevel deposition

Pulsed plasma deposition etch step coverage improvement

Dry etch rate reduction of silicon nitride films

Shadow ring for modifying wafer edge and bevel deposition

Amorphous carbon deposition method for improved stack defectivity

Amorphous carbon deposition method for improved stack defectivity

Nonplanar faceplate for a plasma processing chamber

Patents Applicationslast 30 patents

MODIFIED STACKS FOR 3D NAND

DOPED SILICON OXIDE FOR BOTTOM-UP DEPOSITION

ION IMPLANTATION FOR REDUCED ROUGHNESS OF SILICON NITRIDE

PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT

DRY ETCH OF BORON-CONTAINING MATERIAL

EUV PHOTORESIST AND UNDERLAYER ADHESION MODULATION

FLUORINE-DOPED SILICON-CONTAINING MATERIALS

CARBON MOLD FOR DRAM CAPACITOR

CARBON HARDMASK OPENING USING BORON NITRIDE MASK

SHAPED SHOWERHEAD FOR EDGE PLASMA MODULATION

MESA HEIGHT MODULATION FOR THICKNESS CORRECTION

Methods Of Forming Memory Device With Reduced Resistivity

BORON NITRIDE FOR MASK PATTERNING

LOW IMPEDANCE CURRENT PATH FOR EDGE NON-UNIFORMITY TUNING

DOPED SILICON NITRIDE FOR 3D NAND

SILICON OXIDE GAP FILL USING CAPACITIVELY COUPLED PLASMAS

TENSILE NITRIDE DEPOSITION SYSTEMS AND METHODS

METHOD OF REDUCING DEFECTS IN A MULTI-LAYER PECVD TEOS OXIDE FILM

Deposition of Silicon Boron Nitride Films

SYSTEMS AND METHODS FOR DEPOSITING HIGH DENSITY AND HIGH TENSILE ST...

MULTI-LAYER DEPOSITION AND TREATMENT OF SILICON NITRIDE FILMS

FACEPLATE WITH LOCALIZED FLOW CONTROL

MODIFIED STACKS FOR 3D NAND

METHODS FOR FORMING FILMS CONTAINING SILICON BORON WITH LOW LEAKAGE...

PROCESS DEVELOPMENT VISUALIZATION TOOL

METHODS FOR DEPOSITING PHOSPHORUS-DOPED SILICON NITRIDE FILMS

SEQUENTIAL DEPOSITION AND HIGH FREQUENCY PLASMA TREATMENT OF DEPOSI...

PULSED PLASMA DEPOSITION ETCH STEP COVERAGE IMPROVEMENT

DRY ETCH RATE REDUCTION OF SILICON NITRIDE FILMS

SHADOW RING FOR MODIFYING WAFER EDGE AND BEVEL DEPOSITION