Hanhong Chen

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
PEALD nitride films
- Patent number 12,119,221
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dithering or dynamic offsets for improved uniformity
- Patent number 12,077,861
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming silicon nitride films using microwave plasma
- Patent number 11,955,331
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PEALD titanium nitride with direct microwave plasma
- Patent number 11,823,870
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for controlling a flow pulse shape
- Patent number 11,761,083
- Issue date Sep 19, 2023
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PEALD nitride films
- Patent number 11,626,281
- Issue date Apr 11, 2023
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Machine learning based smart process recipe builder to improve azim...
- Patent number 11,586,789
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Dhritiman Subha Kashyap
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma source for rotating susceptor
- Patent number 11,315,769
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Complementary pattern station designs
- Patent number 11,220,747
- Issue date Jan 11, 2022
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods to deposit flowable (gap-fill) carbon containing films usin...
- Patent number 10,985,009
- Issue date Apr 20, 2021
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source for rotating susceptor
- Patent number 10,903,056
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DRAM MIM capacitor using non-noble electrodes
- Patent number 9,281,357
- Issue date Mar 8, 2016
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High work function, manufacturable top electrode
- Patent number 9,224,878
- Issue date Dec 29, 2015
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to improve electrical performance of ZrO2 based high-K diel...
- Patent number 9,178,006
- Issue date Nov 3, 2015
- Intermolecular, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adsorption site blocking method for co-doping ALD films
- Patent number 9,178,010
- Issue date Nov 3, 2015
- Intermolecular, Inc.
- Sandra Malhotra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inexpensive electrode materials to facilitate rutile phase titanium...
- Patent number 9,082,782
- Issue date Jul 14, 2015
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inexpensive electrode materials to facilitate rutile phase titanium...
- Patent number 8,980,744
- Issue date Mar 17, 2015
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced work function layer supporting growth of rutile phase tita...
- Patent number 8,975,147
- Issue date Mar 10, 2015
- Intermolecular, Inc.
- Xiangxin Rui
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Molybdenum oxide top electrode for DRAM capacitors
- Patent number 8,975,633
- Issue date Mar 10, 2015
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DRAM MIM capacitor using non-noble electrodes
- Patent number 8,969,169
- Issue date Mar 3, 2015
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Yttrium and titanium high-k dielectric films
- Patent number 8,900,418
- Issue date Dec 2, 2014
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Yttrium and titanium high-k dielectric films
- Patent number 8,901,708
- Issue date Dec 2, 2014
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Yttrium and titanium high-K dielectric film
- Patent number 8,900,422
- Issue date Dec 2, 2014
- Intermolecular, Inc.
- Imran Hashim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Band gap improvement in DRAM capacitors
- Patent number 8,878,269
- Issue date Nov 4, 2014
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for step coverage measurement
- Patent number 8,859,301
- Issue date Oct 14, 2014
- Intermolecular, Inc.
- Hanhong Chen
- G01 - MEASURING TESTING
Information Patent Grant
Single-sided non-noble metal electrode hybrid MIM stack for DRAM de...
- Patent number 8,853,049
- Issue date Oct 7, 2014
- Intermolecular, Inc.
- Wim Deweerd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High work function, manufacturable top electrode
- Patent number 8,847,397
- Issue date Sep 30, 2014
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature ALD process of metal oxide for DRAM applications
- Patent number 8,835,273
- Issue date Sep 16, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating a DRAM capacitor
- Patent number 8,836,002
- Issue date Sep 16, 2014
- Intermolecular, Inc.
- Karthik Ramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of semiconductor stacks with ruthenium-based materials
- Patent number 8,828,821
- Issue date Sep 9, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DITHERING OR DYNAMIC OFFSETS FOR IMPROVED UNIFORMITY
- Publication number 20240352586
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR CONTROLLING PULSE SHAPE IN ALD PROCESSES
- Publication number 20230366088
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SHOWERHEAD WITH IMPROVED UNIFORMITY
- Publication number 20230317416
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Chaowei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEALD TITANIUM NITRIDE WITH DIRECT MICROWAVE PLASMA
- Publication number 20230253186
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEALD Nitride Films
- Publication number 20230230830
- Publication date Jul 20, 2023
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus For Single Chamber Deposition And Etch
- Publication number 20220389571
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NON-CONFORMAL PLASMA INDUCED ALD GAPFILL
- Publication number 20220389580
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MACHINE LEARNING BASED SMART PROCESS RECIPE BUILDER TO IMPROVE AZIM...
- Publication number 20220327262
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Dhritiman Subha Kashyap
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Plasma Source For Rotating Susceptor
- Publication number 20210166923
- Publication date Jun 3, 2021
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEALD Nitride Films
- Publication number 20210090877
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for Controlling Pulse Shape in ALD Processes
- Publication number 20210087688
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Joseph AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dithering Or Dynamic Offsets For Improved Uniformity
- Publication number 20210087681
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEALD TITANIUM NITRIDE WITH DIRECT MICROWAVE PLASMA
- Publication number 20210050186
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Complementary Pattern Station Designs
- Publication number 20200131636
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Operating A Spatial Deposition Tool
- Publication number 20200090978
- Publication date Mar 19, 2020
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Operating A Spatial Deposition Tool
- Publication number 20200066572
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS TO DEPOSIT FLOWABLE (GAP-FILL) CARBON CONTAINING FILMS USIN...
- Publication number 20190333760
- Publication date Oct 31, 2019
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILMS USING MICROWAVE PLASMA
- Publication number 20190259598
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- Hanhong CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source For Rotating Susceptor
- Publication number 20180330927
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRAM MIMCAP Stack with MoO2 Electrode
- Publication number 20160133691
- Publication date May 12, 2016
- Intermolecular, Inc.
- Prashant B. Phatak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods to Improve Electrical Performance of ZrO2 Based High-K Diel...
- Publication number 20150228710
- Publication date Aug 13, 2015
- Elpida Memory, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAM MIM Capacitor Using Non-Noble Electrodes
- Publication number 20150137315
- Publication date May 21, 2015
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAM MIM Capacitor Using Non-Noble Electrodes
- Publication number 20150087130
- Publication date Mar 26, 2015
- Elpida Memory, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Work Function, Manufacturable Top Electrode
- Publication number 20140187016
- Publication date Jul 3, 2014
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Work Function, Manufacturable Top Electrode
- Publication number 20140183697
- Publication date Jul 3, 2014
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Temperature ALD Process of Metal Oxide for DRAM Applications
- Publication number 20140080284
- Publication date Mar 20, 2014
- Elpida Memory, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Temperature ALD Process for Metal Oxide for DRAM Applications
- Publication number 20140077337
- Publication date Mar 20, 2014
- Intermolecular, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED NON-NOBLE ELECTRODE LAYERS FOR DRAM CAPACITOR CELL
- Publication number 20130330902
- Publication date Dec 12, 2013
- Elpida Memory, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integration of Non-Noble DRAM Electrode
- Publication number 20130320495
- Publication date Dec 5, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Producing MIM Capacitors with High K Dielectric Material...
- Publication number 20130285205
- Publication date Oct 31, 2013
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS

Hanhong Chen

Person

Patents Grantslast 30 patents

PEALD nitride films

Dithering or dynamic offsets for improved uniformity

Method of forming silicon nitride films using microwave plasma

PEALD titanium nitride with direct microwave plasma

Methods for controlling a flow pulse shape

PEALD nitride films

Machine learning based smart process recipe builder to improve azim...

Plasma source for rotating susceptor

Complementary pattern station designs

Methods to deposit flowable (gap-fill) carbon containing films usin...

Plasma source for rotating susceptor

DRAM MIM capacitor using non-noble electrodes

High work function, manufacturable top electrode

Methods to improve electrical performance of ZrO2 based high-K diel...

Adsorption site blocking method for co-doping ALD films

Inexpensive electrode materials to facilitate rutile phase titanium...

Inexpensive electrode materials to facilitate rutile phase titanium...

Enhanced work function layer supporting growth of rutile phase tita...

Molybdenum oxide top electrode for DRAM capacitors

DRAM MIM capacitor using non-noble electrodes

Yttrium and titanium high-k dielectric films

Yttrium and titanium high-k dielectric films

Yttrium and titanium high-K dielectric film

Band gap improvement in DRAM capacitors

System and method for step coverage measurement

Single-sided non-noble metal electrode hybrid MIM stack for DRAM de...

High work function, manufacturable top electrode

High temperature ALD process of metal oxide for DRAM applications

Method for fabricating a DRAM capacitor

Fabrication of semiconductor stacks with ruthenium-based materials

Patents Applicationslast 30 patents

DITHERING OR DYNAMIC OFFSETS FOR IMPROVED UNIFORMITY

METHODS FOR CONTROLLING PULSE SHAPE IN ALD PROCESSES

PLASMA SHOWERHEAD WITH IMPROVED UNIFORMITY

PEALD TITANIUM NITRIDE WITH DIRECT MICROWAVE PLASMA

PEALD Nitride Films

Apparatus For Single Chamber Deposition And Etch

NON-CONFORMAL PLASMA INDUCED ALD GAPFILL

MACHINE LEARNING BASED SMART PROCESS RECIPE BUILDER TO IMPROVE AZIM...

Plasma Source For Rotating Susceptor

PEALD Nitride Films

Methods for Controlling Pulse Shape in ALD Processes

Dithering Or Dynamic Offsets For Improved Uniformity

PEALD TITANIUM NITRIDE WITH DIRECT MICROWAVE PLASMA

Complementary Pattern Station Designs

Methods Of Operating A Spatial Deposition Tool

Methods Of Operating A Spatial Deposition Tool

METHODS TO DEPOSIT FLOWABLE (GAP-FILL) CARBON CONTAINING FILMS USIN...

METHOD OF FORMING SILICON NITRIDE FILMS USING MICROWAVE PLASMA

Plasma Source For Rotating Susceptor

DRAM MIMCAP Stack with MoO2 Electrode

Methods to Improve Electrical Performance of ZrO2 Based High-K Diel...

DRAM MIM Capacitor Using Non-Noble Electrodes

DRAM MIM Capacitor Using Non-Noble Electrodes

High Work Function, Manufacturable Top Electrode

High Work Function, Manufacturable Top Electrode

High Temperature ALD Process of Metal Oxide for DRAM Applications

High Temperature ALD Process for Metal Oxide for DRAM Applications

ENHANCED NON-NOBLE ELECTRODE LAYERS FOR DRAM CAPACITOR CELL

Integration of Non-Noble DRAM Electrode

Method for Producing MIM Capacitors with High K Dielectric Material...