Hans Bernhard Pogge

Person

Hopewell Junction, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process of forming recessed dielectric regions in a monocrystalline...
- Patent number 4,307,180
- Issue date Dec 22, 1981
- International Business Machines Corp.
- Hans B. Pogge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making a lateral PNP or NPN with a high gain utilizing r...
- Patent number 4,264,382
- Issue date Apr 28, 1981
- International Business Machines Corporation
- Narasipur G. Anantha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a narrow dimensioned region on a body
- Patent number 4,256,514
- Issue date Mar 17, 1981
- International Business Machines Corporation
- Hans B. Pogge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lateral PNP or NPN with a high gain
- Patent number 4,196,440
- Issue date Apr 1, 1980
- International Business Machines Corporation
- Narasipur G. Anantha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactive ion etching method for producing deep dielectric isolation...
- Patent number 4,139,442
- Issue date Feb 13, 1979
- International Business Machines Corporation
- James A. Bondur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming isolated regions of silicon utilizing reactive i...
- Patent number 4,104,086
- Issue date Aug 1, 1978
- International Business Machines Corporation
- James Allan Bondur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Total dielectric isolation utilizing a combination of reactive ion...
- Patent number 4,104,090
- Issue date Aug 1, 1978
- International Business Machines Corporation
- Hans Bernhard Pogge
- H01 - BASIC ELECTRIC ELEMENTS

Hans Bernhard Pogge

Person

Patents Grantslast 30 patents

Process of forming recessed dielectric regions in a monocrystalline...

Method for making a lateral PNP or NPN with a high gain utilizing r...

Method for forming a narrow dimensioned region on a body

Lateral PNP or NPN with a high gain

Reactive ion etching method for producing deep dielectric isolation...

Method for forming isolated regions of silicon utilizing reactive i...

Total dielectric isolation utilizing a combination of reactive ion...