Hans-Juergen Rostalski

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Projection optical unit for microlithography and method for produci...
- Patent number 11,650,510
- Issue date May 16, 2023
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical unit for imaging an object field into an image field
- Patent number 11,119,413
- Issue date Sep 14, 2021
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical unit and projection exposure apparatus including same
- Patent number 10,527,832
- Issue date Jan 7, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical unit for imaging an object field into an image fiel...
- Patent number 10,330,903
- Issue date Jun 25, 2019
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G02 - OPTICS
Information Patent Grant
Imaging optical unit for imaging an object field into an image fiel...
- Patent number 10,254,653
- Issue date Apr 9, 2019
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical unit and projection exposure apparatus for projecti...
- Patent number 10,139,734
- Issue date Nov 27, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chromatically corrected objective with specifically structured and...
- Patent number 10,101,668
- Issue date Oct 16, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring arrangement for measuring optical properties of a reflect...
- Patent number 9,709,494
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Johannes Bol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical unit and projection exposure apparatus for projecti...
- Patent number 9,291,751
- Issue date Mar 22, 2016
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Optical arrangement in a projection objective of a microlithographi...
- Patent number 9,086,561
- Issue date Jul 21, 2015
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Imaging optics and projection exposure installation for microlithog...
- Patent number 9,057,964
- Issue date Jun 16, 2015
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Projection system with compensation of intensity variations and com...
- Patent number 8,605,257
- Issue date Dec 10, 2013
- Carl Zeiss SMT GmbH
- Patrick Scheible
- G02 - OPTICS
Information Patent Grant
Imaging microoptics for measuring the position of an aerial image
- Patent number 8,451,458
- Issue date May 28, 2013
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Chromatically corrected objective with specifically structured and...
- Patent number 8,345,350
- Issue date Jan 1, 2013
- Carl Zeiss SMT GmbH
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Imaging microoptics for measuring the position of an aerial image
- Patent number 8,164,759
- Issue date Apr 24, 2012
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Projection objective for lithography
- Patent number 8,068,276
- Issue date Nov 29, 2011
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Projection objective for immersion lithography
- Patent number 7,969,663
- Issue date Jun 28, 2011
- Carl Zeiss SMT GmbH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Grant
Projection objective and projection exposure apparatus including th...
- Patent number 7,965,453
- Issue date Jun 21, 2011
- Carl Zeiss SMT GmbH
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Grant
Projection objective for lithography
- Patent number 7,835,073
- Issue date Nov 16, 2010
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus, projection exposure method and proje...
- Patent number 7,834,981
- Issue date Nov 16, 2010
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Refractive projection objective for immersion lithography
- Patent number 7,751,129
- Issue date Jul 6, 2010
- Carl Zeiss SMT AG
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Grant
Projection objective and projection exposure apparatus including th...
- Patent number 7,738,188
- Issue date Jun 15, 2010
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 7,570,343
- Issue date Aug 4, 2009
- Carl Zeis SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography lens system and projection exposure system provided wit...
- Patent number 7,551,361
- Issue date Jun 23, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 7,532,306
- Issue date May 12, 2009
- Carl Zeiss SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system
- Patent number 7,492,509
- Issue date Feb 17, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Projection objective for a microlithographic projection exposure ap...
- Patent number 7,411,201
- Issue date Aug 12, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Refractive projection objective for immersion lithography
- Patent number 7,408,716
- Issue date Aug 5, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Refractive projection objective
- Patent number 7,382,540
- Issue date Jun 3, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Refractive projection objective for immersion lithography
- Patent number 7,312,847
- Issue date Dec 25, 2007
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
IMAGING OPTICAL UNIT
- Publication number 20240103382
- Publication date Mar 28, 2024
- Carl Zeiss SMT GMBH
- Hans-Jürgen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL UNIT
- Publication number 20240094637
- Publication date Mar 21, 2024
- Carl Zeiss SMT GMBH
- Hans-Jürgen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL UNIT FOR MICROLITHOGRAPHY AND METHOD FOR PRODUCI...
- Publication number 20220107570
- Publication date Apr 7, 2022
- Carl Zeiss SMT GMBH
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD
- Publication number 20200218045
- Publication date Jul 9, 2020
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIEL...
- Publication number 20180252904
- Publication date Sep 6, 2018
- Carl Zeiss SMT GMBH
- Alexander Wolf
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIEL...
- Publication number 20180246410
- Publication date Aug 30, 2018
- Carl Zeiss SMT GMBH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS INCLUDING SAME
- Publication number 20180088303
- Publication date Mar 29, 2018
- Carl Zeiss SMT GMBH
- Markus Schwab
- G02 - OPTICS
Information Patent Application
MEASURING ARRANGEMENT FOR MEASURING OPTICAL PROPERTIES OF A REFLECT...
- Publication number 20160274029
- Publication date Sep 22, 2016
- Carl Zeiss SMT GMBH
- Johannes BOL
- G01 - MEASURING TESTING
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20160131980
- Publication date May 12, 2016
- Carl Zeiss SMT GMBH
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR PROJECTI...
- Publication number 20150293457
- Publication date Oct 15, 2015
- Carl Zeiss SMT GMBH
- Alexander Epple
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR PROJECTI...
- Publication number 20140368801
- Publication date Dec 18, 2014
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
CHROMATICALLY CORRECTED OBJECTIVE WITH SPECIFICALLY STRUCTURED AND...
- Publication number 20130201464
- Publication date Aug 8, 2013
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G02 - OPTICS
Information Patent Application
IMAGING MICROOPTICS FOR MEASURING THE POSITION OF AN AERIAL IMAGE
- Publication number 20120176670
- Publication date Jul 12, 2012
- Carl Zeiss SMT GMBH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT IN A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHI...
- Publication number 20120075602
- Publication date Mar 29, 2012
- Carl Zeiss SMT GMBH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOG...
- Publication number 20120069315
- Publication date Mar 22, 2012
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR LITHOGRAPHY
- Publication number 20110026110
- Publication date Feb 3, 2011
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY
- Publication number 20100323299
- Publication date Dec 23, 2010
- Carl Zeiss SMT AG
- Aurelian DODOC
- G02 - OPTICS
Information Patent Application
IMAGING MICROOPTICS FOR MEASURING THE POSITION OF AN AERIAL IMAGE
- Publication number 20100214565
- Publication date Aug 26, 2010
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS INCLUDING TH...
- Publication number 20100172019
- Publication date Jul 8, 2010
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Application
CHROMATICALLY CORRECTED OBJECTIVE AND PROJECTION EXPOSURE APPARATUS...
- Publication number 20100128240
- Publication date May 27, 2010
- Carl Zeiss SMT AG
- Alexander Epple
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLIT...
- Publication number 20100085644
- Publication date Apr 8, 2010
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20100045952
- Publication date Feb 25, 2010
- Carl Zeiss SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20080316452
- Publication date Dec 25, 2008
- Carl Zeiss SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR LITHOGRAPHY
- Publication number 20080174858
- Publication date Jul 24, 2008
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND PROJE...
- Publication number 20080117400
- Publication date May 22, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
Projection System with Compensation of Intensity Variations and Com...
- Publication number 20080094599
- Publication date Apr 24, 2008
- Carl Zeiss SMT AG
- Patrick Scheible
- G02 - OPTICS
Information Patent Application
Refractive Projection Objective for Immersion Lithography
- Publication number 20080043345
- Publication date Feb 21, 2008
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Application
Projection objective and projection exposure apparatus including th...
- Publication number 20080037112
- Publication date Feb 14, 2008
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Application
Projection Optical System
- Publication number 20070258152
- Publication date Nov 8, 2007
- CARL ZEISS SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
Lithography Lens System And Projection Exposure System Provided Wit...
- Publication number 20070258134
- Publication date Nov 8, 2007
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hans-Juergen Rostalski

Person

Patents Grantslast 30 patents

Projection optical unit for microlithography and method for produci...

Imaging optical unit for imaging an object field into an image field

Imaging optical unit and projection exposure apparatus including same

Imaging optical unit for imaging an object field into an image fiel...

Imaging optical unit for imaging an object field into an image fiel...

Imaging optical unit and projection exposure apparatus for projecti...

Chromatically corrected objective with specifically structured and...

Measuring arrangement for measuring optical properties of a reflect...

Imaging optical unit and projection exposure apparatus for projecti...

Optical arrangement in a projection objective of a microlithographi...

Imaging optics and projection exposure installation for microlithog...

Projection system with compensation of intensity variations and com...

Imaging microoptics for measuring the position of an aerial image

Chromatically corrected objective with specifically structured and...

Imaging microoptics for measuring the position of an aerial image

Projection objective for lithography

Projection objective for immersion lithography

Projection objective and projection exposure apparatus including th...

Projection objective for lithography

Projection exposure apparatus, projection exposure method and proje...

Refractive projection objective for immersion lithography

Projection objective and projection exposure apparatus including th...

Microlithographic projection exposure apparatus

Lithography lens system and projection exposure system provided wit...

Microlithographic projection exposure apparatus

Projection optical system

Projection objective for a microlithographic projection exposure ap...

Refractive projection objective for immersion lithography

Refractive projection objective

Refractive projection objective for immersion lithography

Patents Applicationslast 30 patents

IMAGING OPTICAL UNIT

IMAGING OPTICAL UNIT

PROJECTION OPTICAL UNIT FOR MICROLITHOGRAPHY AND METHOD FOR PRODUCI...

IMAGING OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD

IMAGING OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIEL...

IMAGING OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIEL...

IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS INCLUDING SAME

MEASURING ARRANGEMENT FOR MEASURING OPTICAL PROPERTIES OF A REFLECT...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR PROJECTI...

IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR PROJECTI...

CHROMATICALLY CORRECTED OBJECTIVE WITH SPECIFICALLY STRUCTURED AND...

IMAGING MICROOPTICS FOR MEASURING THE POSITION OF AN AERIAL IMAGE

OPTICAL ARRANGEMENT IN A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHI...

IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOG...

PROJECTION OBJECTIVE FOR LITHOGRAPHY

PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY

IMAGING MICROOPTICS FOR MEASURING THE POSITION OF AN AERIAL IMAGE

PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS INCLUDING TH...

CHROMATICALLY CORRECTED OBJECTIVE AND PROJECTION EXPOSURE APPARATUS...

PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLIT...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

PROJECTION OBJECTIVE FOR LITHOGRAPHY

PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND PROJE...

Projection System with Compensation of Intensity Variations and Com...

Refractive Projection Objective for Immersion Lithography

Projection objective and projection exposure apparatus including th...

Projection Optical System

Lithography Lens System And Projection Exposure System Provided Wit...