Hans P. Kleinknecht

Person

Bergdietikon, CH

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for optical dimension measurement using interf...
- Patent number 4,964,726
- Issue date Oct 23, 1990
- General Electric Company
- Hans P. Kleinknecht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for forming large area high resolution patterns
- Patent number 4,668,080
- Issue date May 26, 1987
- RCA Corporation
- Michael T. Gale
- G02 - OPTICS
Information Patent Grant
Optical profilometer for steep surface contours with significant su...
- Patent number 4,579,454
- Issue date Apr 1, 1986
- RCA Corporation
- Hans P. Kleinknecht
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for determining the doping profile in epitaxia...
- Patent number 4,456,879
- Issue date Jun 26, 1984
- RCA Corporation
- Hans P. Kleinknecht
- G01 - MEASURING TESTING
Information Patent Grant
Automatic photomask alignment system for projection printing
- Patent number 4,422,763
- Issue date Dec 27, 1983
- RCA Corporation
- Hans P. Kleinknecht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical measurements of fine line parameters in integrated circuit...
- Patent number 4,408,884
- Issue date Oct 11, 1983
- RCA Corporation
- Hans P. Kleinknecht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical line width measuring apparatus and method
- Patent number 4,330,213
- Issue date May 18, 1982
- RCA Corporation
- Hans P. Kleinknecht
- G01 - MEASURING TESTING
Information Patent Grant
Optically testing the lateral dimensions of a pattern
- Patent number 4,303,341
- Issue date Dec 1, 1981
- RCA Corporation
- Hans P. Kleinknecht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical testing of a semiconductor
- Patent number 4,211,488
- Issue date Jul 8, 1980
- RCA Corporation
- Hans P. Kleinknecht
- G01 - MEASURING TESTING
Information Patent Grant
Photomask alignment system
- Patent number 4,211,489
- Issue date Jul 8, 1980
- RCA Corporation
- Hans P. Kleinknecht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically testing the lateral dimensions of a pattern
- Patent number 4,200,396
- Issue date Apr 29, 1980
- RCA Corporation
- Hans P. Kleinknecht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically measuring the carrier concentration in a semiconductor
- Patent number 4,188,123
- Issue date Feb 12, 1980
- RCA Corporation
- Hans P. Kleinknecht
- G01 - MEASURING TESTING
Information Patent Grant
Optically monitoring the thickness of a depositing layer
- Patent number 4,141,780
- Issue date Feb 27, 1979
- RCA Corporation
- Hans P. Kleinknecht
- G01 - MEASURING TESTING
Information Patent Grant
Optically monitoring the undercutting of a layer being etched
- Patent number 4,039,370
- Issue date Aug 2, 1977
- RCA Corporation
- Hans Peter Kleinknecht
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for making a recording of an electrostatic charge pattern
- Patent number 4,005,436
- Issue date Jan 25, 1977
- RCA Corporation
- Hans Peter Kleinknecht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hans P. Kleinknecht

Person

Patents Grantslast 30 patents

Apparatus and method for optical dimension measurement using interf...

Method and apparatus for forming large area high resolution patterns

Optical profilometer for steep surface contours with significant su...

Method and apparatus for determining the doping profile in epitaxia...

Automatic photomask alignment system for projection printing

Optical measurements of fine line parameters in integrated circuit...

Optical line width measuring apparatus and method

Optically testing the lateral dimensions of a pattern

Optical testing of a semiconductor

Photomask alignment system

Optically testing the lateral dimensions of a pattern

Optically measuring the carrier concentration in a semiconductor

Optically monitoring the thickness of a depositing layer

Optically monitoring the undercutting of a layer being etched

Apparatus for making a recording of an electrostatic charge pattern