Hans Van Der Laan

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 11,681,229
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 10,962,886
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Correction using stack difference
- Patent number 10,635,004
- Issue date Apr 28, 2020
- ASML Netherlands B.V.
- Aiqin Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate measurement recipe design of, or for, a target including...
- Patent number 10,578,982
- Issue date Mar 3, 2020
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus and associated computer product
- Patent number 10,551,750
- Issue date Feb 4, 2020
- ASML Netherlands B.V.
- Adam Jan Urbanczyk
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus and associated computer product
- Patent number 10,310,388
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Adam Urbanczyk
- G01 - MEASURING TESTING
Information Patent Grant
Method of metrology, inspection apparatus, lithographic system and...
- Patent number 9,958,789
- Issue date May 1, 2018
- ASML Netherlands B.V.
- Peter Hanzen Wardenier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method with radiati...
- Patent number 8,937,705
- Issue date Jan 20, 2015
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to determine the value of process parameters based on scatte...
- Patent number 8,773,657
- Issue date Jul 8, 2014
- ASML Netherlands B.V.
- Hans Van Der Laan
- G01 - MEASURING TESTING
Information Patent Grant
Calculating a laser metric within a lithographic apparatus and meth...
- Patent number 8,717,540
- Issue date May 6, 2014
- ASML Netherlands B.V.
- Carsten Andreas Köhler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection apparatus and method of compensating pertur...
- Patent number 8,570,489
- Issue date Oct 29, 2013
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring properties of dynamic positioning errors in a l...
- Patent number 8,554,510
- Issue date Oct 8, 2013
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,279,405
- Issue date Oct 2, 2012
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a lithographic projection apparatus
- Patent number 8,208,122
- Issue date Jun 26, 2012
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method, computer program and lithographic appa...
- Patent number 8,134,683
- Issue date Mar 13, 2012
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,697,116
- Issue date Apr 13, 2010
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, calibration me...
- Patent number 7,663,741
- Issue date Feb 16, 2010
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,505,116
- Issue date Mar 17, 2009
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 7,459,690
- Issue date Dec 2, 2008
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G01 - MEASURING TESTING
Information Patent Grant
Method for predicting a critical dimension of a feature imaged by a...
- Patent number 7,443,486
- Issue date Oct 28, 2008
- ASML Netherlands B.V.
- Koen Van Ingen Schenau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus, lithographic apparatus, process apparatus metr...
- Patent number 7,403,293
- Issue date Jul 22, 2008
- ASML Netherlands
- Henricus Petrus Maria Pellemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,382,438
- Issue date Jun 3, 2008
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test pattern, inspection method, and device manufacturing method
- Patent number 7,312,860
- Issue date Dec 25, 2007
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,274,434
- Issue date Sep 25, 2007
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,177,010
- Issue date Feb 13, 2007
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,170,587
- Issue date Jan 30, 2007
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test pattern, inspection method, and device manufacturing method
- Patent number 7,151,594
- Issue date Dec 19, 2006
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device inspection method and apparatus using an asymmetric marker
- Patent number 7,112,813
- Issue date Sep 26, 2006
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 7,075,620
- Issue date Jul 11, 2006
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G01 - MEASURING TESTING
Information Patent Grant
Device manufacturing method and computer program
- Patent number 7,042,550
- Issue date May 9, 2006
- ASML Netherlands B.V.
- Martin Lowisch
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20230333481
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20210216017
- Publication date Jul 15, 2021
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology Method and Apparatus and Associated Computer Product
- Publication number 20190250520
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Adam Jan URBANCZYK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE MEASUREMENT RECIPE DESIGN OF, OR FOR, A TARGET INCLUDING...
- Publication number 20190171116
- Publication date Jun 6, 2019
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20190025705
- Publication date Jan 24, 2019
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology Method and Apparatus and Associated Computer Product
- Publication number 20180217508
- Publication date Aug 2, 2018
- ASML NETHERLANDS B.V.
- Adam URBANCZYK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CORRECTION USING STACK DIFFERENCE
- Publication number 20180129139
- Publication date May 10, 2018
- ASML NETHERLANDS B.V.
- Aiqin JIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Metrology, Inspection Apparatus, Lithographic System and...
- Publication number 20160370710
- Publication date Dec 22, 2016
- ASML NETHERLANDS B.V.
- Peter Hanzen WARDENIER
- G01 - MEASURING TESTING
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20110200922
- Publication date Aug 18, 2011
- ASML NETHERLANDS B.V.
- Carsten Andreas Köhler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MEASURING PROPERTIES OF DYNAMIC POSITIONING ERRORS IN A L...
- Publication number 20110153265
- Publication date Jun 23, 2011
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PROJECTION APPARATUS AND METHOD OF COMPENSATING PERTUR...
- Publication number 20100321657
- Publication date Dec 23, 2010
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MEASURING A LITHOGRAPHIC PROJECTION APPARATUS
- Publication number 20090268182
- Publication date Oct 29, 2009
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method with Radiati...
- Publication number 20090219500
- Publication date Sep 3, 2009
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to Determine the Value of Process Parameters BAsed on Scatte...
- Publication number 20070222979
- Publication date Sep 27, 2007
- ASML NETHERLANDS B.V.
- Hans Van Der Laan
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070115449
- Publication date May 24, 2007
- ASML NETHERLANDS B.V.
- Marcel Mathijs Theodore Maria Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Test pattern, inspection method, and device manufacturing method
- Publication number 20070052948
- Publication date Mar 8, 2007
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method that compens...
- Publication number 20070046917
- Publication date Mar 1, 2007
- ASML NETHERLANDS B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20060219931
- Publication date Oct 5, 2006
- ASML NETHERLANDS B.V.
- Jan E. Van Der Werf
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060109436
- Publication date May 25, 2006
- ASML NETHERLANDS B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050280795
- Publication date Dec 22, 2005
- ASML NETHERLANDS B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20040190677
- Publication date Sep 30, 2004
- ASML NETHERLANDS B.V.
- Jan E. Van Der Werf
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20040189966
- Publication date Sep 30, 2004
- ASML NETHERLANDS B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device inspection
- Publication number 20040129900
- Publication date Jul 8, 2004
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and a measurement system
- Publication number 20040114119
- Publication date Jun 17, 2004
- ASML NETHERLANDS B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring aberration of a projection system of a lithogra...
- Publication number 20030047694
- Publication date Mar 13, 2003
- ASML NETHERLANDS B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic projection apparatus, a grating module, a sensor modul...
- Publication number 20020145717
- Publication date Oct 10, 2002
- Johannes Jacobus Matheus Baselmans
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20020037461
- Publication date Mar 28, 2002
- Jan E. Van Der Werf
- G01 - MEASURING TESTING
Information Patent Application
Method of operating a lithographic apparatus, lithographic apparatu...
- Publication number 20020027648
- Publication date Mar 7, 2002
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring aberration in an optical imaging system
- Publication number 20020008869
- Publication date Jan 24, 2002
- Hans Van der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hans Van Der Laan

Person

Patents Grantslast 30 patents

Selection of measurement locations for patterning processes

Selection of measurement locations for patterning processes

Correction using stack difference

Substrate measurement recipe design of, or for, a target including...

Metrology method and apparatus and associated computer product

Metrology method and apparatus and associated computer product

Method of metrology, inspection apparatus, lithographic system and...

Lithographic apparatus and device manufacturing method with radiati...

Method to determine the value of process parameters based on scatte...

Calculating a laser metric within a lithographic apparatus and meth...

Lithographic projection apparatus and method of compensating pertur...

Method of measuring properties of dynamic positioning errors in a l...

Lithographic apparatus and device manufacturing method

Method of measuring a lithographic projection apparatus

Device manufacturing method, computer program and lithographic appa...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, calibration me...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...

Method for predicting a critical dimension of a feature imaged by a...

Metrology apparatus, lithographic apparatus, process apparatus metr...

Lithographic apparatus and device manufacturing method

Test pattern, inspection method, and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Test pattern, inspection method, and device manufacturing method

Device inspection method and apparatus using an asymmetric marker

Lithographic apparatus, device manufacturing method, and device man...

Device manufacturing method and computer program

Patents Applicationslast 30 patents

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

Metrology Method and Apparatus and Associated Computer Product

SUBSTRATE MEASUREMENT RECIPE DESIGN OF, OR FOR, A TARGET INCLUDING...

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

Metrology Method and Apparatus and Associated Computer Product

CORRECTION USING STACK DIFFERENCE

Method of Metrology, Inspection Apparatus, Lithographic System and...

Lithographic Apparatus and Method

METHOD OF MEASURING PROPERTIES OF DYNAMIC POSITIONING ERRORS IN A L...

LITHOGRAPHIC PROJECTION APPARATUS AND METHOD OF COMPENSATING PERTUR...

METHOD OF MEASURING A LITHOGRAPHIC PROJECTION APPARATUS

Lithographic Apparatus and Device Manufacturing Method with Radiati...

Method to Determine the Value of Process Parameters BAsed on Scatte...

Lithographic apparatus and device manufacturing method

Test pattern, inspection method, and device manufacturing method

Lithographic apparatus and device manufacturing method that compens...

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus and device manufacturing method

Device inspection

Lithographic apparatus and a measurement system

Method of measuring aberration of a projection system of a lithogra...

Lithographic projection apparatus, a grating module, a sensor modul...

Lithographic apparatus, device manufacturing method, and device man...

Method of operating a lithographic apparatus, lithographic apparatu...

Method of measuring aberration in an optical imaging system