Hanyou Chu

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 11,961,721
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal-incident in-situ process monitor sensor
- Patent number 10,978,278
- Issue date Apr 13, 2021
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical sensor for phase determination
- Patent number 10,837,902
- Issue date Nov 17, 2020
- Tokyo Electron Limited
- Ivan Maleev
- G01 - MEASURING TESTING
Information Patent Grant
Spatially resolved optical emission spectroscopy (OES) in plasma pr...
- Patent number 9,970,818
- Issue date May 15, 2018
- Tokyo Electron Limited
- Junwei Bao
- G01 - MEASURING TESTING
Information Patent Grant
Computation efficiency by diffraction order truncation
- Patent number 9,625,937
- Issue date Apr 18, 2017
- KLA-Tencor Corporation
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Techniques for optimized scatterometry
- Patent number 9,127,927
- Issue date Sep 8, 2015
- KLA-Tencor Corporation
- Jonathan Iloreta
- G01 - MEASURING TESTING
Information Patent Grant
System for in-situ film stack measurement during etching and etch c...
- Patent number 9,059,038
- Issue date Jun 16, 2015
- Tokyo Electron Limited
- Shifang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Numerical aperture integration for optical critical dimension (OCD)...
- Patent number 8,762,100
- Issue date Jun 24, 2014
- Tokyo Electron Limited
- Hanyou Chu
- G01 - MEASURING TESTING
Information Patent Grant
Numerical aperture integration for optical critical dimension (OCD)...
- Patent number 8,670,948
- Issue date Mar 11, 2014
- Tokyo Electron Limited
- Hanyou Chu
- G01 - MEASURING TESTING
Information Patent Grant
Rational approximation and continued-fraction approximation approac...
- Patent number 8,560,270
- Issue date Oct 15, 2013
- Tokyo Electron Limited
- Hanyou Chu
- G01 - MEASURING TESTING
Information Patent Grant
Generating simulated diffraction signal using a dispersion function...
- Patent number 8,069,020
- Issue date Nov 29, 2011
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Determining profile parameters of a structure formed on a semicondu...
- Patent number 7,912,679
- Issue date Mar 22, 2011
- Tokyo Electron Limited
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated process control using optical metrology with a photonic n...
- Patent number 7,639,351
- Issue date Dec 29, 2009
- Tokyo Electron Limited
- Zhigang Chen
- G01 - MEASURING TESTING
Information Patent Grant
Determining transmittance of a photomask using optical metrology
- Patent number 7,639,375
- Issue date Dec 29, 2009
- Tokyo Electron Limited
- Sanjay Yedur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Automated process control of a fabrication tool using a dispersion...
- Patent number 7,636,649
- Issue date Dec 22, 2009
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Global shape definition method for scatterometry
- Patent number 7,613,598
- Issue date Nov 3, 2009
- KLA-Tencor Corp.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Measuring a process parameter of a semiconductor fabrication proces...
- Patent number 7,522,294
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Hanyou Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology using a photonic nanojet
- Patent number 7,394,535
- Issue date Jul 1, 2008
- Tokyo Electron Limited
- Zhigang Chen
- G01 - MEASURING TESTING
Information Patent Grant
Measuring a process parameter of a semiconductor fabrication proces...
- Patent number 7,327,475
- Issue date Feb 5, 2008
- Tokyo Electron Limited
- Hanyou Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scatterometry for samples with non-uniform edges
- Patent number 7,233,390
- Issue date Jun 19, 2007
- Therma-Wave, Inc.
- Yia Chung Chang
- G01 - MEASURING TESTING
Information Patent Grant
Global shape definition method for scatterometry
- Patent number 7,145,664
- Issue date Dec 5, 2006
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
CD metrology analysis using a finite difference method
- Patent number 7,106,459
- Issue date Sep 12, 2006
- Therma-Wave, Inc.
- Hanyou Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CD metrology analysis using green's function
- Patent number 7,038,850
- Issue date May 2, 2006
- Therm-Wave, Inc.
- Yia Chung Chang
- G01 - MEASURING TESTING
Information Patent Grant
Real time analysis of periodic structures on semiconductors
- Patent number 7,031,848
- Issue date Apr 18, 2006
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Real time analysis of periodic structures on semiconductors
- Patent number 6,947,850
- Issue date Sep 20, 2005
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Real time analysis of periodic structures on semiconductors
- Patent number 6,931,361
- Issue date Aug 16, 2005
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
CD metrology analysis using a finite difference method
- Patent number 6,919,964
- Issue date Jul 19, 2005
- Therma-Wave, Inc.
- Hanyou Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CD metrology analysis using green's function
- Patent number 6,867,866
- Issue date Mar 15, 2005
- Therma-Wave, Inc.
- Yia Chung Chang
- G01 - MEASURING TESTING
Information Patent Grant
Spatial averaging technique for ellipsometry and reflectometry
- Patent number 6,856,385
- Issue date Feb 15, 2005
- Therma-Wave, Inc.
- Lanhua Wei
- G01 - MEASURING TESTING
Information Patent Grant
Real time analysis of periodic structures on semiconductors
- Patent number 6,778,911
- Issue date Aug 17, 2004
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20210193444
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR
- Publication number 20200043710
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SENSOR FOR PHASE DETERMINATION
- Publication number 20190056320
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G01 - MEASURING TESTING
Information Patent Application
SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...
- Publication number 20150124250
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Junwei BAO
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...
- Publication number 20140024143
- Publication date Jan 23, 2014
- TOKYO ELECTRON LIMITED
- Shifang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NUMERICAL APERTURE INTEGRATION FOR OPTICAL CRITICAL DIMENSION (OCD)...
- Publication number 20130211760
- Publication date Aug 15, 2013
- Hanyou CHU
- G01 - MEASURING TESTING
Information Patent Application
TECHNIQUES FOR OPTIMIZED SCATTEROMETRY
- Publication number 20130158948
- Publication date Jun 20, 2013
- Jonathan Iloreta
- G01 - MEASURING TESTING
Information Patent Application
RATIONAL APPROXIMATION AND CONTINUED-FRACTION APPROXIMATION APPROAC...
- Publication number 20100145655
- Publication date Jun 10, 2010
- Hanyou Chu
- G01 - MEASURING TESTING
Information Patent Application
COMPUTATION EFFICIENCY BY DIFFRACTION ORDER TRUNCATION
- Publication number 20100042388
- Publication date Feb 18, 2010
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
AUTOMATED PROCESS CONTROL OF A FABRICATION TOOL USING A DISPERSION...
- Publication number 20090082993
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G01 - MEASURING TESTING
Information Patent Application
DETERMINING PROFILE PARAMETERS OF A STRUCTURE FORMED ON A SEMICONDU...
- Publication number 20090083013
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING SIMULATED DIFFRACTION SIGNAL USING A DISPERSION FUNCTION...
- Publication number 20090076782
- Publication date Mar 19, 2009
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G01 - MEASURING TESTING
Information Patent Application
Automated process control using optical metrology with a photonic n...
- Publication number 20080231863
- Publication date Sep 25, 2008
- TOKYO ELECTRON LIMITED
- Zhigang Chen
- G01 - MEASURING TESTING
Information Patent Application
MEASURING A PROCESS PARAMETER OF A SEMICONDUCTOR FABRICATION PROCES...
- Publication number 20080212080
- Publication date Sep 4, 2008
- TOKYO ELECTRON LIMITED
- Hanyou Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Determining transmittance of a photomask using optical metrology
- Publication number 20080144919
- Publication date Jun 19, 2008
- TOKYO ELECTRON LIMITED
- Sanjay Yedur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Global shape definition method for scatterometry
- Publication number 20070040852
- Publication date Feb 22, 2007
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Real time analysis of periodic structures on semiconductors
- Publication number 20050251350
- Publication date Nov 10, 2005
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
CD metrology analysis using a finite difference method
- Publication number 20050231737
- Publication date Oct 20, 2005
- Hanyou Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CD metrology analysis using green's function
- Publication number 20050137809
- Publication date Jun 23, 2005
- Yia Chung Chang
- G01 - MEASURING TESTING
Information Patent Application
Real time analysis of periodic structures on semiconductors
- Publication number 20040233462
- Publication date Nov 25, 2004
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Global shape definition method for scatterometry
- Publication number 20040210402
- Publication date Oct 21, 2004
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Scatterometry for samples with non-uniform edges
- Publication number 20040201836
- Publication date Oct 14, 2004
- Yia-Chung Chang
- G01 - MEASURING TESTING
Information Patent Application
Real time analysis of periodic structures on semiconductors
- Publication number 20040122599
- Publication date Jun 24, 2004
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
CD metrology analysis using a finite difference method
- Publication number 20040008353
- Publication date Jan 15, 2004
- Hanyou Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spatial averaging technique for ellipsometry and reflectometry
- Publication number 20030214654
- Publication date Nov 20, 2003
- Lanhua Wei
- G01 - MEASURING TESTING
Information Patent Application
Real time analysis of periodic structures on semiconductors
- Publication number 20030204326
- Publication date Oct 30, 2003
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Spatial averaging technique for ellipsometry and reflectometry
- Publication number 20020045284
- Publication date Apr 18, 2002
- Lanhua Wei
- G01 - MEASURING TESTING
Information Patent Application
Spatial averaging technique for ellipsometry and reflectometry
- Publication number 20020012123
- Publication date Jan 31, 2002
- Lanhua Wei
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Normal-incidence in-situ process monitor sensor

Normal-incident in-situ process monitor sensor

Optical sensor for phase determination

Spatially resolved optical emission spectroscopy (OES) in plasma pr...

Computation efficiency by diffraction order truncation

Techniques for optimized scatterometry

System for in-situ film stack measurement during etching and etch c...

Numerical aperture integration for optical critical dimension (OCD)...

Numerical aperture integration for optical critical dimension (OCD)...

Rational approximation and continued-fraction approximation approac...

Generating simulated diffraction signal using a dispersion function...

Determining profile parameters of a structure formed on a semicondu...

Automated process control using optical metrology with a photonic n...

Determining transmittance of a photomask using optical metrology

Automated process control of a fabrication tool using a dispersion...

Global shape definition method for scatterometry

Measuring a process parameter of a semiconductor fabrication proces...

Optical metrology using a photonic nanojet

Measuring a process parameter of a semiconductor fabrication proces...

Scatterometry for samples with non-uniform edges

Global shape definition method for scatterometry

CD metrology analysis using a finite difference method

CD metrology analysis using green's function

Real time analysis of periodic structures on semiconductors

Real time analysis of periodic structures on semiconductors

Real time analysis of periodic structures on semiconductors

CD metrology analysis using a finite difference method

CD metrology analysis using green's function

Spatial averaging technique for ellipsometry and reflectometry

Real time analysis of periodic structures on semiconductors

Patents Applicationslast 30 patents

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR

OPTICAL SENSOR FOR PHASE DETERMINATION

SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...

SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...

NUMERICAL APERTURE INTEGRATION FOR OPTICAL CRITICAL DIMENSION (OCD)...

TECHNIQUES FOR OPTIMIZED SCATTEROMETRY

RATIONAL APPROXIMATION AND CONTINUED-FRACTION APPROXIMATION APPROAC...

COMPUTATION EFFICIENCY BY DIFFRACTION ORDER TRUNCATION

AUTOMATED PROCESS CONTROL OF A FABRICATION TOOL USING A DISPERSION...

DETERMINING PROFILE PARAMETERS OF A STRUCTURE FORMED ON A SEMICONDU...

GENERATING SIMULATED DIFFRACTION SIGNAL USING A DISPERSION FUNCTION...

Automated process control using optical metrology with a photonic n...

MEASURING A PROCESS PARAMETER OF A SEMICONDUCTOR FABRICATION PROCES...

Determining transmittance of a photomask using optical metrology

Global shape definition method for scatterometry

Real time analysis of periodic structures on semiconductors

CD metrology analysis using a finite difference method

CD metrology analysis using green's function

Real time analysis of periodic structures on semiconductors

Global shape definition method for scatterometry

Scatterometry for samples with non-uniform edges

Real time analysis of periodic structures on semiconductors

CD metrology analysis using a finite difference method

Spatial averaging technique for ellipsometry and reflectometry

Real time analysis of periodic structures on semiconductors

Spatial averaging technique for ellipsometry and reflectometry

Spatial averaging technique for ellipsometry and reflectometry