Haoran SHI

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Goleta, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Successive ionic layer adsorption and reaction process for depositi...
- Patent number 8,957,427
- Issue date Feb 17, 2015
- Seoul Semiconductor Co., Ltd.
- Jacob J. Richardson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Successive ionic layer adsorption and reaction process for depositi...
- Patent number 8,796,693
- Issue date Aug 5, 2014
- Seoul Semiconductor Co., Ltd.
- Jacob J. Richardson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUCCESSIVE IONIC LAYER ADSORPTION AND REACTION PROCESS FOR DEPOSITI...
- Publication number 20140306236
- Publication date Oct 16, 2014
- Jacob J. RICHARDSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUCCESSIVE IONIC LAYER ADSORPTION AND REACTION PROCESS FOR DEPOSITI...
- Publication number 20140175452
- Publication date Jun 26, 2014
- SEOUL SEMICONDUCTOR CO., LTD.
- Jacob J. RICHARDSON
- H01 - BASIC ELECTRIC ELEMENTS