Harm-Jan Voorma

Person

Zaltbommel, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation source
- Patent number 10,222,702
- Issue date Mar 5, 2019
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G02 - OPTICS
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 8,598,550
- Issue date Dec 3, 2013
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 8,134,136
- Issue date Mar 13, 2012
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Grant
Method of preparing components, prepared component, lithographic ap...
- Patent number 8,077,287
- Issue date Dec 13, 2011
- ASML Netherlands B.V.
- Johannes Adrianus Antonius Theodorus Dams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system, lithographic apparatus, mirror, method of remo...
- Patent number 7,875,863
- Issue date Jan 25, 2011
- ASML Netherlands B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 7,767,989
- Issue date Aug 3, 2010
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Grant
Lithographic apparatus, device manufacturing method and radiation c...
- Patent number 7,470,916
- Issue date Dec 30, 2008
- ASML Netherlands B.V.
- Wilhelmus Josephus Box
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Lithographic apparatus, device manufacturing method and variable at...
- Patent number 7,145,640
- Issue date Dec 5, 2006
- ASML Netherlands B.V.
- Harm-Jan Voorma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 7,098,994
- Issue date Aug 29, 2006
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,023,524
- Issue date Apr 4, 2006
- ASML Netherlands B.V.
- Antonius Johannes Josephus Van Dijsseldonk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Radiation Source
- Publication number 20180031979
- Publication date Feb 1, 2018
- ASML NETHERLANDS B.V.
- Arno Jan BLEEKER
- G02 - OPTICS
Information Patent Application
EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT
- Publication number 20120140196
- Publication date Jun 7, 2012
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- B08 - CLEANING
Information Patent Application
EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT
- Publication number 20100290015
- Publication date Nov 18, 2010
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- B08 - CLEANING
Information Patent Application
Removal of deposition on an element of a lithographic apparatus
- Publication number 20080218709
- Publication date Sep 11, 2008
- ASML NETHERLANDS B.V.
- Roland Edward Van Vliet
- B08 - CLEANING
Information Patent Application
Illumination system, lithographic apparatus, mirror, method of remo...
- Publication number 20080149854
- Publication date Jun 26, 2008
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus, device manufacturing method and radiation c...
- Publication number 20070084461
- Publication date Apr 19, 2007
- ASML NETHERLANDS B.V.
- Wilhelmus Josephus Box
- F24 - HEATING RANGES VENTILATING
Information Patent Application
Ex-situ removal of deposition on an optical element
- Publication number 20070069162
- Publication date Mar 29, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Application
Lithographic apparatus, device manufacturing method and variable at...
- Publication number 20050206869
- Publication date Sep 22, 2005
- ASML NETHERLANDS B.V.
- Harm-Jan Voorma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20050157284
- Publication date Jul 21, 2005
- ASML NETHERLANDS B.V.
- Johannes Hubertus Josephina Moors
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for exposing a substrate, patterning device, and lithographi...
- Publication number 20050134820
- Publication date Jun 23, 2005
- ASML NETHERLANDS B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050134818
- Publication date Jun 23, 2005
- ASML NETHERLANDS B.V.
- Antonius Johannes Josephus Van Dijsseldonk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of preparing components, prepared component, lithographic ap...
- Publication number 20050008978
- Publication date Jan 13, 2005
- ASML NETHERLANDS B.V.
- Johannes Adrianus Antonius Theodorus Dams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Harm-Jan Voorma

Person

Patents Grantslast 30 patents

Radiation source

Ex-situ removal of deposition on an optical element

Ex-situ removal of deposition on an optical element

Method of preparing components, prepared component, lithographic ap...

Illumination system, lithographic apparatus, mirror, method of remo...

Ex-situ removal of deposition on an optical element

Lithographic apparatus, device manufacturing method and radiation c...

Lithographic apparatus, device manufacturing method and variable at...

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

Radiation Source

EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT

EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT

Removal of deposition on an element of a lithographic apparatus

Illumination system, lithographic apparatus, mirror, method of remo...

Lithographic apparatus, device manufacturing method and radiation c...

Ex-situ removal of deposition on an optical element

Lithographic apparatus, device manufacturing method and variable at...

Lithographic apparatus, device manufacturing method, and device man...

Method for exposing a substrate, patterning device, and lithographi...

Lithographic apparatus and device manufacturing method

Method of preparing components, prepared component, lithographic ap...