Harmen Klaas VAN DER SCHOOT

Person

Vught, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus
- Patent number 10,747,127
- Issue date Aug 18, 2020
- ASML Netherlands B.V.
- Frits Van Der Meulen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graphene spectral purity filter
- Patent number 10,481,510
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Sensor system, substrate handling system and lithographic apparatus
- Patent number 10,007,197
- Issue date Jun 26, 2018
- ASML Netherlands B.V.
- Joeri Lof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,989,844
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,494,869
- Issue date Nov 15, 2016
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,482,960
- Issue date Nov 1, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and method
- Patent number 9,395,630
- Issue date Jul 19, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and method for correcting a position of a st...
- Patent number 8,781,775
- Issue date Jul 15, 2014
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method utilizing a...
- Patent number 8,411,252
- Issue date Apr 2, 2013
- ASML Netherlands B.V.
- Hernes Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method for clamping...
- Patent number 8,264,670
- Issue date Sep 11, 2012
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate handler, lithographic apparatus and device manufacturing...
- Patent number 8,174,680
- Issue date May 8, 2012
- ASML Netherlands B.V.
- Harmen Klaas Van Der Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,760,324
- Issue date Jul 20, 2010
- ASML Netherlands B.V.
- Jozef Petrus Henricus Benschop
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus configured to position a workpiece
- Patent number 7,679,720
- Issue date Mar 16, 2010
- ASML Netherlands B.V.
- Michel Pieter Dansberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and stage apparatus
- Patent number 7,667,822
- Issue date Feb 23, 2010
- ASML Netherlands B.V.
- Fransicus Mathijs Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,656,502
- Issue date Feb 2, 2010
- ASML Netherlands B.V.
- Harmen Klaus Van Der Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method utilizing a...
- Patent number 7,656,506
- Issue date Feb 2, 2010
- ASML Netherlands B.V.
- Hernes Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized correction of wafer thermal deformations in a lithographi...
- Patent number 7,595,496
- Issue date Sep 29, 2009
- ASML Netherlands B.V.
- Joost Jeroen Ottens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate handler, lithographic apparatus and device manufacturing...
- Patent number 7,576,835
- Issue date Aug 18, 2009
- ASML Netherlands B.V.
- Harmen Klaas Van Der Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method utilizing a...
- Patent number 7,538,857
- Issue date May 26, 2009
- ASML Netherlands B.V.
- Hernes Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,492,440
- Issue date Feb 17, 2009
- ASML Netherlands B.V.
- Koen Jacobus Johannes Maria Zaal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Displacement measurement system, lithographic apparatus, displaceme...
- Patent number 7,483,120
- Issue date Jan 27, 2009
- ASML Netherlands B.V.
- Bernardus Antonius Johannes Luttikhuis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and substrate...
- Patent number 7,440,081
- Issue date Oct 21, 2008
- ASML Netherlands B.V.
- Cheng-Qun Gui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method utilizing a...
- Patent number 7,408,617
- Issue date Aug 5, 2008
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,359,032
- Issue date Apr 15, 2008
- ASML Netherlands B.V.
- Michel Pieter Dansberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,352,438
- Issue date Apr 1, 2008
- ASML Netherlands B.V.
- Bernardus Antonius Johannes Luttikhuis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positioning device having two object holders
- Patent number RE40043
- Issue date Feb 5, 2008
- ASML Netherlands B.V.
- Yim-Bun Patrick Kwan
- 355 - Photocopying
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,310,132
- Issue date Dec 18, 2007
- ASML Netherlands B.V.
- Harmen Klaas Van Der Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method utilizing su...
- Patent number 7,292,317
- Issue date Nov 6, 2007
- ASML Netherlands B.V.
- Henrikus Herman Marie Cox
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,256,866
- Issue date Aug 14, 2007
- ASML Netherlands B.V.
- Henrikus Herman Marie Cox
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,256,867
- Issue date Aug 14, 2007
- ASML Netherlands B.V.
- Bernardus Antonius Johannes Luttikhuis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Lithographic Apparatus
- Publication number 20190227445
- Publication date Jul 25, 2019
- ASML NETHERLANDS B.V.
- Frits VAN DER MEULEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20180259846
- Publication date Sep 13, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20170017150
- Publication date Jan 19, 2017
- ASML Netherlands B.V.
- Andrei Mikhailovich YAKUNIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SENSOR SYSTEM, SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20160370716
- Publication date Dec 22, 2016
- ASML NETHERLANDS B.V.
- Joeri LOF
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140340666
- Publication date Nov 20, 2014
- ASML NETHERLANDS B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARAT...
- Publication number 20140192337
- Publication date Jul 10, 2014
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20140160452
- Publication date Jun 12, 2014
- ASML NETHERLANDS B.V.
- Pieter Willem Herman De Jager
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20130088699
- Publication date Apr 11, 2013
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A ST...
- Publication number 20110208459
- Publication date Aug 25, 2011
- ASML NETHERLANDS B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100165319
- Publication date Jul 1, 2010
- ASML NETHERLANDS B.V.
- Hernes Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method Utilizing a...
- Publication number 20100085553
- Publication date Apr 8, 2010
- ASML NETHERLANDS B.V.
- Hernes Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate Handler, Lithographic Apparatus and Device Manufacturing...
- Publication number 20090284730
- Publication date Nov 19, 2009
- ASML NETHERLANDS B.V.
- Harmen Klaas VAN DER SCHOOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus configured to position a workpiece
- Publication number 20080174750
- Publication date Jul 24, 2008
- ASML NETHERLANDS B.V.
- Michel Pieter Dansberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080073602
- Publication date Mar 27, 2008
- ASML NETHERLANDS B.V.
- Hernes Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Displacement measurement system, lithographic apparatus, displaceme...
- Publication number 20070263197
- Publication date Nov 15, 2007
- ASML Nethlerlands B.V.
- Bernardus Antonius Johannes Luttikhuis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070216882
- Publication date Sep 20, 2007
- ASML NETHERLANDS B.V.
- Jozef Petrus Henricus Benschop
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070216881
- Publication date Sep 20, 2007
- ASML NETHERLANDS B.V.
- Harmen Klaas Van Der Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate handler, lithographic apparatus and device manufacturing...
- Publication number 20070008512
- Publication date Jan 11, 2007
- ASML NETHERLANDS B.V.
- Harmen Klaas Van Der Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method utilizing a...
- Publication number 20060290914
- Publication date Dec 28, 2006
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method utilizing su...
- Publication number 20060279716
- Publication date Dec 14, 2006
- ASML NETHERLANDS B.V.
- Henrikus Herman Marie Cox
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method utilizing a...
- Publication number 20060158634
- Publication date Jul 20, 2006
- ASML NETHERLANDS B.V.
- Hernes Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method utilizing a...
- Publication number 20060139616
- Publication date Jun 29, 2006
- ASML Netherlands B.V.
- Hernes Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060132734
- Publication date Jun 22, 2006
- ASML NETHERLANDS B.V.
- Bernardus Antonius Johannes Luttikhuis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and substrate...
- Publication number 20060098176
- Publication date May 11, 2006
- ASML NETHERLANDS B.V.
- Cheng-Qun Gui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060077364
- Publication date Apr 13, 2006
- ASML NETHERLANDS B.V.
- Henrikus Herman Marie Cox
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050269525
- Publication date Dec 8, 2005
- ASML NETHERLANDS B.V.
- Martinus Arnoldus Henricus Terken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050151945
- Publication date Jul 14, 2005
- ASML NETHERLANDS B.V.
- Harmen Klaas Van Der Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized correction of wafer thermal deformations in a lithographi...
- Publication number 20050136346
- Publication date Jun 23, 2005
- ASML NETHERLANDS B.V.
- Joost Jeroen Ottens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050083496
- Publication date Apr 21, 2005
- ASML NETHERLANDS B.V.
- Michel Pieter Dansberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20040263000
- Publication date Dec 30, 2004
- ASML NETHERLANDS B.V.
- Patricia Vreugdewater
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Harmen Klaas VAN DER SCHOOT

Person

Patents Grantslast 30 patents

Lithographic apparatus

Graphene spectral purity filter

Sensor system, substrate handling system and lithographic apparatus

Pellicle for reticle and multilayer mirror

Lithographic apparatus and device manufacturing method

Pellicle for reticle and multilayer mirror

Lithographic apparatus and method

Lithographic apparatus and method for correcting a position of a st...

Lithographic apparatus and device manufacturing method utilizing a...

Lithographic apparatus and device manufacturing method for clamping...

Substrate handler, lithographic apparatus and device manufacturing...

Lithographic apparatus and device manufacturing method

Apparatus configured to position a workpiece

Lithographic apparatus and stage apparatus

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method utilizing a...

Optimized correction of wafer thermal deformations in a lithographi...

Substrate handler, lithographic apparatus and device manufacturing...

Lithographic apparatus and device manufacturing method utilizing a...

Lithographic apparatus and device manufacturing method

Displacement measurement system, lithographic apparatus, displaceme...

Lithographic apparatus, device manufacturing method, and substrate...

Lithographic apparatus and device manufacturing method utilizing a...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Positioning device having two object holders

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method utilizing su...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

Lithographic Apparatus

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

SENSOR SYSTEM, SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARAT...

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

LITHOGRAPHIC APPARATUS AND METHOD

LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A ST...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic Apparatus and Device Manufacturing Method Utilizing a...

Substrate Handler, Lithographic Apparatus and Device Manufacturing...

Apparatus configured to position a workpiece

Lithographic apparatus and device manufacturing method

Displacement measurement system, lithographic apparatus, displaceme...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Substrate handler, lithographic apparatus and device manufacturing...

Lithographic apparatus and device manufacturing method utilizing a...

Lithographic apparatus and device manufacturing method utilizing su...

Lithographic apparatus and device manufacturing method utilizing a...

Lithographic apparatus and device manufacturing method utilizing a...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, and substrate...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Optimized correction of wafer thermal deformations in a lithographi...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method