Harold M. Persing

Person

Rockport, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Pulsed plasma to affect conformal processing
- Patent number 8,877,654
- Issue date Nov 4, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Helen Maynard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed loop process control of plasma processed materials
- Patent number 8,728,587
- Issue date May 20, 2014
- Varian Semiconductor Equipment Associates, Inc.
- George Papasouliotis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile adjustment in plasma ion implanter
- Patent number 7,687,787
- Issue date Mar 30, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Local pressure sensing in a plasma processing system
- Patent number 7,638,781
- Issue date Dec 29, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Outgassing rate detection
- Patent number 7,615,748
- Issue date Nov 10, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile adjustment in plasma ion implanter
- Patent number 7,528,389
- Issue date May 5, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for boron implantation
- Patent number 7,397,048
- Issue date Jul 8, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faraday dose and uniformity monitor for plasma based ion implantation
- Patent number 7,132,672
- Issue date Nov 7, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CLOSED LOOP PROCESS CONTROL OF PLASMA PROCESSED MATERIALS
- Publication number 20120328771
- Publication date Dec 27, 2012
- Varian Semiconductor Equipment Associates, Inc.
- George Papasouliotis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulsed Plasma to Affect Conformal Processing
- Publication number 20110256732
- Publication date Oct 20, 2011
- Varian Semiconductor Equipment Associates
- Helen Maynard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCAL PRESSURE SENSING IN A PLASMA PROCESSING SYSTEM
- Publication number 20090101848
- Publication date Apr 23, 2009
- VARIAN SEMICONDUCTOR EQUPMENT ASSOCIATES, INC.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping System with In-Situ Chamber Condition Monitoring
- Publication number 20090104719
- Publication date Apr 23, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OUTGASSING RATE DETECTION
- Publication number 20090078871
- Publication date Mar 26, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE ADJUSTMENT IN PLASMA ION IMPLANTER
- Publication number 20090061605
- Publication date Mar 5, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ION IMPLANTATION PROCESS CONTROL USING REFLECTOMETRY
- Publication number 20080318345
- Publication date Dec 25, 2008
- Harold M. Persing
- G01 - MEASURING TESTING
Information Patent Application
Plasma Source with Liner for Reducing Metal Contamination
- Publication number 20080169183
- Publication date Jul 17, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Richard J. Hertel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR USING AN IMPROVED SHIELD RING IN PLASMA-BASED ION IMP...
- Publication number 20080160170
- Publication date Jul 3, 2008
- Varian Semiconductor Equipment Assoicates, Inc.
- Timothy Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Immersion Ion Source With Low Effective Antenna Voltage
- Publication number 20070170867
- Publication date Jul 26, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Harold M. Persing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR ATOMIC LAYER DEPOSITION
- Publication number 20070087581
- Publication date Apr 19, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Vikram SINGH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DOPING APPARATUS AND METHOD
- Publication number 20070084564
- Publication date Apr 19, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for atomic layer deposition
- Publication number 20070065576
- Publication date Mar 22, 2007
- Vikram Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Profile adjustment in plasma ion implanter
- Publication number 20060289799
- Publication date Dec 28, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for boron implantation
- Publication number 20060063360
- Publication date Mar 23, 2006
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter having enhanced low energy ion beam transport
- Publication number 20060043316
- Publication date Mar 2, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch and deposition control for plasma implantation
- Publication number 20050287307
- Publication date Dec 29, 2005
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ process chamber preparation methods for plasma ion implanta...
- Publication number 20050260354
- Publication date Nov 24, 2005
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Faraday dose and uniformity monitor for plasma based ion implantation
- Publication number 20050223991
- Publication date Oct 13, 2005
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantion apparatus and method
- Publication number 20050205211
- Publication date Sep 22, 2005
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Plasma Source With Conductive Top Section
- Publication number 20050205212
- Publication date Sep 22, 2005
- VARIAN SEMICONDUCTOR EQUIPMENT
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS

Harold M. Persing

Person

Patents Grantslast 30 patents

Pulsed plasma to affect conformal processing

Closed loop process control of plasma processed materials

Profile adjustment in plasma ion implanter

Local pressure sensing in a plasma processing system

Outgassing rate detection

Profile adjustment in plasma ion implanter

Technique for boron implantation

Faraday dose and uniformity monitor for plasma based ion implantation

Patents Applicationslast 30 patents

CLOSED LOOP PROCESS CONTROL OF PLASMA PROCESSED MATERIALS

Pulsed Plasma to Affect Conformal Processing

LOCAL PRESSURE SENSING IN A PLASMA PROCESSING SYSTEM

Plasma Doping System with In-Situ Chamber Condition Monitoring

OUTGASSING RATE DETECTION

PROFILE ADJUSTMENT IN PLASMA ION IMPLANTER

PLASMA ION IMPLANTATION PROCESS CONTROL USING REFLECTOMETRY

Plasma Source with Liner for Reducing Metal Contamination

TECHNIQUE FOR USING AN IMPROVED SHIELD RING IN PLASMA-BASED ION IMP...

Plasma Immersion Ion Source With Low Effective Antenna Voltage

TECHNIQUE FOR ATOMIC LAYER DEPOSITION

CONFORMAL DOPING APPARATUS AND METHOD

Technique for atomic layer deposition

Profile adjustment in plasma ion implanter

Technique for boron implantation

Ion implanter having enhanced low energy ion beam transport

Etch and deposition control for plasma implantation

In-situ process chamber preparation methods for plasma ion implanta...

Faraday dose and uniformity monitor for plasma based ion implantation

Plasma immersion ion implantion apparatus and method

RF Plasma Source With Conductive Top Section