Harold Robert Zable

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,886,166
- Issue date Jan 30, 2024
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,604,451
- Issue date Mar 14, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 11,592,802
- Issue date Feb 28, 2023
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Bias correction for lithography
- Patent number 11,126,085
- Issue date Sep 21, 2021
- D2S, Inc.
- Harold Robert Zable
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of reducing charged particle beam write time
- Patent number 10,884,395
- Issue date Jan 5, 2021
- D2S, Inc.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias correction for lithography
- Patent number 10,725,383
- Issue date Jul 28, 2020
- D25, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Shaped beam lithography including temperature effects
- Patent number 10,460,071
- Issue date Oct 29, 2019
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Bias correction for lithography
- Patent number 10,444,629
- Issue date Oct 15, 2019
- D2S, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,625,809
- Issue date Apr 18, 2017
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,372,391
- Issue date Jun 21, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming a pattern using charged particle beam...
- Patent number 8,895,212
- Issue date Nov 25, 2014
- D2S, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for forming a pattern using charged particle beam...
- Patent number 8,883,375
- Issue date Nov 11, 2014
- D2S, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for forming a pattern using charged particle beam...
- Patent number 8,771,906
- Issue date Jul 8, 2014
- D2S, Inc.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for design and manufacture of patterns with variable shaped...
- Patent number 8,592,108
- Issue date Nov 26, 2013
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for fracturing a pattern using lithography with m...
- Patent number 8,492,055
- Issue date Jul 23, 2013
- D2S, Inc.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for design and manufacture of diagonal patterns with variabl...
- Patent number 8,329,365
- Issue date Dec 11, 2012
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for fracturing a pattern using charged particle b...
- Patent number 8,221,939
- Issue date Jul 17, 2012
- D2S, Inc.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for fracturing a pattern using charged particle b...
- Patent number 8,221,940
- Issue date Jul 17, 2012
- D2S, Inc.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for fracturing a pattern using charged particle b...
- Patent number 8,137,871
- Issue date Mar 20, 2012
- D2S, Inc.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for design and manufacture of a reticle using a two-dimensio...
- Patent number 8,062,813
- Issue date Nov 22, 2011
- D2S, Inc.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for design and manufacture of a reticle using a two-dimensio...
- Patent number 8,017,286
- Issue date Sep 13, 2011
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for fracturing a pattern for writing with a shaped charged p...
- Patent number 7,985,514
- Issue date Jul 26, 2011
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Cylindrical wrapping using shader hardware
- Patent number 7,663,621
- Issue date Feb 16, 2010
- NVIDIA Corporation
- Roger L. Allen
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20230205177
- Publication date Jun 29, 2023
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20210208569
- Publication date Jul 8, 2021
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20210116884
- Publication date Apr 22, 2021
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20200341380
- Publication date Oct 29, 2020
- D2S, INC.
- Harold Robert Zable
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME
- Publication number 20200201286
- Publication date Jun 25, 2020
- D2S, INC.
- Akira Fujimura
- G05 - CONTROLLING REGULATING
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20200012195
- Publication date Jan 9, 2020
- D2S, INC.
- Harold Robert Zable
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20180374675
- Publication date Dec 27, 2018
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20170371246
- Publication date Dec 28, 2017
- D2S, INC.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and System for Forming Patterns Using Charged Particle Beam...
- Publication number 20170213698
- Publication date Jul 27, 2017
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING SHAPED BEAM LITHOGRAPH...
- Publication number 20170124247
- Publication date May 4, 2017
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and System for Forming Patterns Using Charged Particle Beam...
- Publication number 20160299422
- Publication date Oct 13, 2016
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20150331991
- Publication date Nov 19, 2015
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...
- Publication number 20130309608
- Publication date Nov 21, 2013
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...
- Publication number 20130309610
- Publication date Nov 21, 2013
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...
- Publication number 20130309609
- Publication date Nov 21, 2013
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR DESIGN AND MANUFACTURE OF PATTERNS WITH VARIABLE SHAPED...
- Publication number 20130101941
- Publication date Apr 25, 2013
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING SHAPED CHARGED...
- Publication number 20130022929
- Publication date Jan 24, 2013
- JEOL, LTD
- Takashi Komagata
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FRACTURING A PATTERN USING CHARGED PARTICLE B...
- Publication number 20120281191
- Publication date Nov 8, 2012
- D2S, INC.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20120217421
- Publication date Aug 30, 2012
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20120219886
- Publication date Aug 30, 2012
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Matching of Patterns
- Publication number 20120128228
- Publication date May 24, 2012
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DESIGN AND MANUFACTURE OF DIAGONAL PATTERNS WITH VARIABL...
- Publication number 20120064440
- Publication date Mar 15, 2012
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR FRACTURING A PATTERN USING CHARGED PARTICLE B...
- Publication number 20110159436
- Publication date Jun 30, 2011
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FRACTURING A PATTERN USING CHARGED PARTICLE B...
- Publication number 20110159434
- Publication date Jun 30, 2011
- D2S, INC.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR FRACTURING A PATTERN USING CHARGED PARTICLE B...
- Publication number 20110159435
- Publication date Jun 30, 2011
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for Fracturing a Pattern for Writing with a Shaped Charged P...
- Publication number 20110089344
- Publication date Apr 21, 2011
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY

Harold Robert Zable

Person

Patents Grantslast 30 patents

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system of reducing charged particle beam write time

Bias correction for lithography

Method and system for determining a charged particle beam exposure...

Method and system of reducing charged particle beam write time

Method and system for determining a charged particle beam exposure...

Bias correction for lithography

Shaped beam lithography including temperature effects

Bias correction for lithography

Method and system for forming patterns using charged particle beam...

Method and system for forming patterns using charged particle beam...

Method and system for forming a pattern using charged particle beam...

Method and system for forming a pattern using charged particle beam...

Method and system for forming a pattern using charged particle beam...

Method for design and manufacture of patterns with variable shaped...

Method and system for fracturing a pattern using lithography with m...

Method for design and manufacture of diagonal patterns with variabl...

Method and system for fracturing a pattern using charged particle b...

Method and system for fracturing a pattern using charged particle b...

Method and system for fracturing a pattern using charged particle b...

Method for design and manufacture of a reticle using a two-dimensio...

Method for design and manufacture of a reticle using a two-dimensio...

Method for fracturing a pattern for writing with a shaped charged p...

Cylindrical wrapping using shader hardware

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

BIAS CORRECTION FOR LITHOGRAPHY

METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME

BIAS CORRECTION FOR LITHOGRAPHY

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

BIAS CORRECTION FOR LITHOGRAPHY

Method and System for Forming Patterns Using Charged Particle Beam...

METHOD AND SYSTEM FOR FORMING PATTERNS USING SHAPED BEAM LITHOGRAPH...

Method and System for Forming Patterns Using Charged Particle Beam...

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...

METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...

METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...

METHOD FOR DESIGN AND MANUFACTURE OF PATTERNS WITH VARIABLE SHAPED...

METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING SHAPED CHARGED...

METHOD AND SYSTEM FOR FRACTURING A PATTERN USING CHARGED PARTICLE B...

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

Method for Matching of Patterns

METHOD FOR DESIGN AND MANUFACTURE OF DIAGONAL PATTERNS WITH VARIABL...

METHOD AND SYSTEM FOR FRACTURING A PATTERN USING CHARGED PARTICLE B...

METHOD AND SYSTEM FOR FRACTURING A PATTERN USING CHARGED PARTICLE B...

METHOD AND SYSTEM FOR FRACTURING A PATTERN USING CHARGED PARTICLE B...

Method for Fracturing a Pattern for Writing with a Shaped Charged P...