Harry CHUANG

Person

Austin, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,410,993
- Issue date Aug 9, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure of a semiconductor device and method of making
- Patent number 11,380,775
- Issue date Jul 5, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method of a metal gate structure
- Patent number 10,840,149
- Issue date Nov 17, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure of a semiconductor device
- Patent number 10,553,699
- Issue date Feb 4, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 10,553,580
- Issue date Feb 4, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Embedded nonvolatile memory and forming method thereof
- Patent number 10,510,763
- Issue date Dec 17, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Ming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuit incorporating multiple gate stack compositions
- Patent number 10,418,361
- Issue date Sep 17, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Nien Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having protective structure over shallow trenc...
- Patent number 10,332,882
- Issue date Jun 25, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with metal gate memory device and metal gate l...
- Patent number 10,050,050
- Issue date Aug 14, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming gate structure of a semiconductor device
- Patent number 9,978,853
- Issue date May 22, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for a vertical tunneling field-effect transistor...
- Patent number 9,865,716
- Issue date Jan 9, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing
- Patent number 9,721,947
- Issue date Aug 1, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit and method of making the same
- Patent number 9,691,969
- Issue date Jun 27, 2017
- Taiwan Semiconductor Manufacturing Company Ltd.
- Harry Hak-Lay Chuang
- G11 - INFORMATION STORAGE
Information Patent Grant
Embedded nonvolatile memory and forming method thereof
- Patent number 9,673,205
- Issue date Jun 6, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Ming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating hybrid impact-ionization semiconductor device
- Patent number 9,525,040
- Issue date Dec 20, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate structure of a CMOS semiconductor device
- Patent number 9,508,721
- Issue date Nov 29, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP fabrication solution for split gate memory embedded in HK-MG pr...
- Patent number 9,496,276
- Issue date Nov 15, 2016
- Taiwan Semiconductor Manufacturing Co., Ltd
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating multiple gate stack compositions
- Patent number 9,378,961
- Issue date Jun 28, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Nien Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Revising layout design through OPC to reduce corner rounding effect
- Patent number 9,355,209
- Issue date May 31, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay Chuang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 9,202,817
- Issue date Dec 1, 2015
- Taiwan Semiconductorr Manufacturing Co., Ltd.
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced substrate coupling for inductors in semiconductor devices
- Patent number 9,196,611
- Issue date Nov 24, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a post feature and method of manufactur...
- Patent number 9,190,326
- Issue date Nov 17, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and fabricating method thereof
- Patent number 9,082,630
- Issue date Jul 14, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate structure of a CMOS semiconductor device and method of f...
- Patent number 9,070,784
- Issue date Jun 30, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating multiple gate stack compositions
- Patent number 9,048,335
- Issue date Jun 2, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Nien Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrating the formation of I/O and core MOS devices with MOS capa...
- Patent number 8,728,900
- Issue date May 20, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for protecting a gate structure during contact formation
- Patent number 8,648,446
- Issue date Feb 11, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hong-Dyi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer shape engineering for void-free gap-filling process
- Patent number 8,461,654
- Issue date Jun 11, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Yuan Wu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GATE STRUCTURE OF A SEMICONDUCTOR DEVICE AND METHOD OF MAKING
- Publication number 20200168721
- Publication date May 28, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20200168603
- Publication date May 28, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE OF A SEMICONDUCTOR DEVICE
- Publication number 20180277654
- Publication date Sep 27, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20170323886
- Publication date Nov 9, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBEDDED NONVOLATILE MEMORY AND FORMING METHOD THEREOF
- Publication number 20170263616
- Publication date Sep 14, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Ming WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING GATE STRUCTURE OF A SEMICONDUCTOR DEVICE
- Publication number 20170186853
- Publication date Jun 29, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INTEGRATED CIRCUIT AND METHOD OF MAKING THE SAME
- Publication number 20170092845
- Publication date Mar 30, 2017
- Taiwan Semiconductor Manufacturing company Ltd.
- HARRY HAK-LAY CHUANG
- G11 - INFORMATION STORAGE
Information Patent Application
FABRICATION METHOD OF A METAL GATE STRUCTURE
- Publication number 20170069546
- Publication date Mar 9, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUIT INCORPORATING MULTIPLE GATE STACK COMPOSITIONS
- Publication number 20160372462
- Publication date Dec 22, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Nien CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBEDDED NONVOLATILE MEMORY AND FORMING METHOD THEREOF
- Publication number 20150364482
- Publication date Dec 17, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Ming WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Controlling Gate Formation for High Density Cell Layout
- Publication number 20150318367
- Publication date Nov 5, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBEDDED NONVOLATILE MEMORY
- Publication number 20150280004
- Publication date Oct 1, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Ming WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE STRUCTURE OF A CMOS SEMICONDUCTOR DEVICE
- Publication number 20150270269
- Publication date Sep 24, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FABRICATING MULTIPLE GATE STACK COMPOSITIONS
- Publication number 20150262825
- Publication date Sep 17, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Nien Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING
- Publication number 20150228645
- Publication date Aug 13, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20150206891
- Publication date Jul 23, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Harry Hak-Lay CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF
- Publication number 20150187783
- Publication date Jul 2, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Harry Hak-Lay CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP FABRICATION SOLUTION FOR SPLIT GATE MEMORY EMBEDDED IN HK-MG PR...
- Publication number 20150145022
- Publication date May 28, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Harry Hak-Lay CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20150129952
- Publication date May 14, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Harry Hak-Lay CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF
- Publication number 20150129969
- Publication date May 14, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Harry Hak-Lay CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REVISING LAYOUT DESIGN THROUGH OPC TO REDUCE CORNER ROUNDING EFFECT
- Publication number 20140317581
- Publication date Oct 23, 2014
- Harry Hak-Lay Chuang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Circuit Incorporating Multiple Gate Stack Compositions
- Publication number 20140246732
- Publication date Sep 4, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Nien Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduced Substrate Coupling for Inductors in Semiconductor Devices
- Publication number 20140203375
- Publication date Jul 24, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
N/P Boundary Effect Reduction for Metal Gate Transistors
- Publication number 20140203374
- Publication date Jul 24, 2014
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING HYBRID IMPACT-IONIZATION SEMICONDUCTOR DEVICE
- Publication number 20140170820
- Publication date Jun 19, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for a Vertical Tunneling Field-Effect Transistor...
- Publication number 20140054711
- Publication date Feb 27, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Protecting a Gate Structure During Contact Formation
- Publication number 20130299921
- Publication date Nov 14, 2013
- Hong-Dyi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHODS FOR HIGH-K AND METAL GATE STACKS
- Publication number 20130285151
- Publication date Oct 31, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei Cheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrating the Formation of I/O and Core MOS Devices with MOS Capa...
- Publication number 20130034946
- Publication date Feb 7, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE STRUCTURE OF A CMOS SEMICONDUCTOR DEVICE AND METHOD OF F...
- Publication number 20130020651
- Publication date Jan 24, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming ZHU
- H01 - BASIC ELECTRIC ELEMENTS

Harry CHUANG

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Gate structure of a semiconductor device and method of making

Fabrication method of a metal gate structure

Gate structure of a semiconductor device

Method of manufacturing semiconductor device

Embedded nonvolatile memory and forming method thereof

Circuit incorporating multiple gate stack compositions

Semiconductor device having protective structure over shallow trenc...

Semiconductor device with metal gate memory device and metal gate l...

Method of forming gate structure of a semiconductor device

System and method for a vertical tunneling field-effect transistor...

Semiconductor device and method of manufacturing

Semiconductor integrated circuit and method of making the same

Embedded nonvolatile memory and forming method thereof

Method of fabricating hybrid impact-ionization semiconductor device

Metal gate structure of a CMOS semiconductor device

CMP fabrication solution for split gate memory embedded in HK-MG pr...

Methods of fabricating multiple gate stack compositions

Revising layout design through OPC to reduce corner rounding effect

Semiconductor device and method for manufacturing the same

Reduced substrate coupling for inductors in semiconductor devices

Semiconductor device having a post feature and method of manufactur...

Semiconductor device and fabricating method thereof

Metal gate structure of a CMOS semiconductor device and method of f...

Method of fabricating multiple gate stack compositions

Integrating the formation of I/O and core MOS devices with MOS capa...

Method for protecting a gate structure during contact formation

Spacer shape engineering for void-free gap-filling process

Patents Applicationslast 30 patents

GATE STRUCTURE OF A SEMICONDUCTOR DEVICE AND METHOD OF MAKING

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

GATE STRUCTURE OF A SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

EMBEDDED NONVOLATILE MEMORY AND FORMING METHOD THEREOF

METHOD OF FORMING GATE STRUCTURE OF A SEMICONDUCTOR DEVICE

SEMICONDUCTOR INTEGRATED CIRCUIT AND METHOD OF MAKING THE SAME

FABRICATION METHOD OF A METAL GATE STRUCTURE

CIRCUIT INCORPORATING MULTIPLE GATE STACK COMPOSITIONS

EMBEDDED NONVOLATILE MEMORY AND FORMING METHOD THEREOF

Controlling Gate Formation for High Density Cell Layout

EMBEDDED NONVOLATILE MEMORY

METAL GATE STRUCTURE OF A CMOS SEMICONDUCTOR DEVICE

METHODS OF FABRICATING MULTIPLE GATE STACK COMPOSITIONS

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF

CMP FABRICATION SOLUTION FOR SPLIT GATE MEMORY EMBEDDED IN HK-MG PR...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF

REVISING LAYOUT DESIGN THROUGH OPC TO REDUCE CORNER ROUNDING EFFECT

Circuit Incorporating Multiple Gate Stack Compositions

Reduced Substrate Coupling for Inductors in Semiconductor Devices

N/P Boundary Effect Reduction for Metal Gate Transistors

METHOD OF FABRICATING HYBRID IMPACT-IONIZATION SEMICONDUCTOR DEVICE

System and Method for a Vertical Tunneling Field-Effect Transistor...

Method for Protecting a Gate Structure During Contact Formation

DEVICE AND METHODS FOR HIGH-K AND METAL GATE STACKS

Integrating the Formation of I/O and Core MOS Devices with MOS Capa...

METAL GATE STRUCTURE OF A CMOS SEMICONDUCTOR DEVICE AND METHOD OF F...